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Sekisui Chemical Co Ltd
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Sekisui Chemical Co Ltd
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Application filed by Sekisui Chemical Co LtdfiledCriticalSekisui Chemical Co Ltd
Priority to JP58133296ApriorityCriticalpatent/JPS6025225A/ja
Publication of JPS6025225ApublicationCriticalpatent/JPS6025225A/ja
Publication of JPS6367330B2publicationCriticalpatent/JPS6367330B2/ja
Process for the formation of a silicon-containing semiconductor thin film by chemically reacting active hydrogen atoms with liquefied film-forming raw material gas on the surface of a substrate