JPS6367328B2 - - Google Patents
Info
- Publication number
- JPS6367328B2 JPS6367328B2 JP55108195A JP10819580A JPS6367328B2 JP S6367328 B2 JPS6367328 B2 JP S6367328B2 JP 55108195 A JP55108195 A JP 55108195A JP 10819580 A JP10819580 A JP 10819580A JP S6367328 B2 JPS6367328 B2 JP S6367328B2
- Authority
- JP
- Japan
- Prior art keywords
- target
- substrate
- film
- bias voltage
- sputtering
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000005291 magnetic effect Effects 0.000 claims description 38
- 239000000758 substrate Substances 0.000 claims description 34
- 238000000034 method Methods 0.000 claims description 21
- 238000004544 sputter deposition Methods 0.000 claims description 18
- 238000004519 manufacturing process Methods 0.000 claims description 14
- 239000011651 chromium Substances 0.000 claims description 11
- 230000005684 electric field Effects 0.000 claims description 8
- 239000002245 particle Substances 0.000 claims description 7
- 229910052804 chromium Inorganic materials 0.000 claims description 4
- 229910017052 cobalt Inorganic materials 0.000 claims description 4
- 239000010941 cobalt Substances 0.000 claims description 4
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 3
- 239000010408 film Substances 0.000 description 51
- 230000015572 biosynthetic process Effects 0.000 description 19
- 229910000599 Cr alloy Inorganic materials 0.000 description 8
- 230000000694 effects Effects 0.000 description 7
- 230000005415 magnetization Effects 0.000 description 7
- 238000001755 magnetron sputter deposition Methods 0.000 description 5
- 238000011156 evaluation Methods 0.000 description 4
- 239000002131 composite material Substances 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000011017 operating method Methods 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 229910052772 Samarium Inorganic materials 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000003302 ferromagnetic material Substances 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 238000010849 ion bombardment Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000011031 large-scale manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 238000001552 radio frequency sputter deposition Methods 0.000 description 1
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
- H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Thin Magnetic Films (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10819580A JPS5734324A (en) | 1980-08-08 | 1980-08-08 | Manufacture of vertically magnetized film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10819580A JPS5734324A (en) | 1980-08-08 | 1980-08-08 | Manufacture of vertically magnetized film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5734324A JPS5734324A (en) | 1982-02-24 |
| JPS6367328B2 true JPS6367328B2 (nl) | 1988-12-26 |
Family
ID=14478413
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10819580A Granted JPS5734324A (en) | 1980-08-08 | 1980-08-08 | Manufacture of vertically magnetized film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5734324A (nl) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5968825A (ja) * | 1982-10-14 | 1984-04-18 | Teijin Ltd | 磁気記録媒体の製造法 |
| JPS62266731A (ja) * | 1986-05-15 | 1987-11-19 | Tohoku Metal Ind Ltd | 垂直磁気記録媒体の製造装置 |
| JPS6326827A (ja) * | 1986-07-21 | 1988-02-04 | Hitachi Ltd | 磁気記録媒体の製造方法 |
| JPH02289923A (ja) * | 1990-04-20 | 1990-11-29 | Seiko Epson Corp | 磁気記録媒体製造方法 |
| JPH05274644A (ja) * | 1992-01-29 | 1993-10-22 | Mitsubishi Kasei Corp | 磁気記録媒体及びその製造方法 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5451804A (en) * | 1977-09-30 | 1979-04-24 | Shiyunichi Iwasaki | Magnetic recording medium |
| JPS5512732A (en) * | 1978-07-14 | 1980-01-29 | Anelva Corp | Sputtering apparatus for making thin magnetic film |
-
1980
- 1980-08-08 JP JP10819580A patent/JPS5734324A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5451804A (en) * | 1977-09-30 | 1979-04-24 | Shiyunichi Iwasaki | Magnetic recording medium |
| JPS5512732A (en) * | 1978-07-14 | 1980-01-29 | Anelva Corp | Sputtering apparatus for making thin magnetic film |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5734324A (en) | 1982-02-24 |
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