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Priority to JP22105783ApriorityCriticalpatent/JPS60112802A/ja
Publication of JPS60112802ApublicationCriticalpatent/JPS60112802A/ja
Publication of JPS6365201B2publicationCriticalpatent/JPS6365201B2/ja
Photosensitive resin composition, and photosensitive element, resist pattern formation method and printed circuit board production method each utilizing same