JPH0336421B2 - - Google Patents

Info

Publication number
JPH0336421B2
JPH0336421B2 JP58185597A JP18559783A JPH0336421B2 JP H0336421 B2 JPH0336421 B2 JP H0336421B2 JP 58185597 A JP58185597 A JP 58185597A JP 18559783 A JP18559783 A JP 18559783A JP H0336421 B2 JPH0336421 B2 JP H0336421B2
Authority
JP
Japan
Prior art keywords
photocurable resin
resin composition
merocyanine
photopolymerization initiator
present
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58185597A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6076735A (ja
Inventor
Kunihiro Ichimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP18559783A priority Critical patent/JPS6076735A/ja
Publication of JPS6076735A publication Critical patent/JPS6076735A/ja
Publication of JPH0336421B2 publication Critical patent/JPH0336421B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
JP18559783A 1983-10-04 1983-10-04 光硬化樹脂組成物 Granted JPS6076735A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18559783A JPS6076735A (ja) 1983-10-04 1983-10-04 光硬化樹脂組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18559783A JPS6076735A (ja) 1983-10-04 1983-10-04 光硬化樹脂組成物

Publications (2)

Publication Number Publication Date
JPS6076735A JPS6076735A (ja) 1985-05-01
JPH0336421B2 true JPH0336421B2 (enrdf_load_stackoverflow) 1991-05-31

Family

ID=16173581

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18559783A Granted JPS6076735A (ja) 1983-10-04 1983-10-04 光硬化樹脂組成物

Country Status (1)

Country Link
JP (1) JPS6076735A (enrdf_load_stackoverflow)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2565331B2 (ja) * 1987-04-20 1996-12-18 富士写真フイルム株式会社 感光性組成物
JPH07103171B2 (ja) * 1988-05-13 1995-11-08 日本ペイント株式会社 光重合性組成物
JP2677457B2 (ja) * 1991-01-22 1997-11-17 日本ペイント株式会社 光重合性組成物
JPH05107758A (ja) * 1991-10-14 1993-04-30 Fuji Photo Film Co Ltd 光重合性組成物
JP7311013B2 (ja) 2021-12-17 2023-07-19 大日本印刷株式会社 体積ホログラム積層体、体積ホログラム積層体の製造方法、体積ホログラム転写箔、体積ホログラムラベル、埋込用体積ホログラムシート、カードおよびホログラム貼付物品

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3925077A (en) * 1974-03-01 1975-12-09 Horizons Inc Photoresist for holography and laser recording with bleachout dyes
GB1539192A (en) * 1975-01-27 1979-01-31 Ici Ltd Photopolymerisable compositions
AU517415B2 (en) * 1976-07-09 1981-07-30 General Electric Company Curable polymer composition
JPS54151024A (en) * 1978-05-18 1979-11-27 Fuji Photo Film Co Ltd Photopolymerizable composition
US4341859A (en) * 1980-09-23 1982-07-27 General Electric Company Emulsion for making dry film resists

Also Published As

Publication number Publication date
JPS6076735A (ja) 1985-05-01

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