JPS6360548B2 - - Google Patents

Info

Publication number
JPS6360548B2
JPS6360548B2 JP55081450A JP8145080A JPS6360548B2 JP S6360548 B2 JPS6360548 B2 JP S6360548B2 JP 55081450 A JP55081450 A JP 55081450A JP 8145080 A JP8145080 A JP 8145080A JP S6360548 B2 JPS6360548 B2 JP S6360548B2
Authority
JP
Japan
Prior art keywords
output
mosfet
channel
mosfetq
well region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55081450A
Other languages
English (en)
Japanese (ja)
Other versions
JPS577957A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP8145080A priority Critical patent/JPS577957A/ja
Publication of JPS577957A publication Critical patent/JPS577957A/ja
Publication of JPS6360548B2 publication Critical patent/JPS6360548B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/80Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
    • H10D84/82Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
    • H10D84/83Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
    • H10D84/85Complementary IGFETs, e.g. CMOS

Landscapes

  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Logic Circuits (AREA)
JP8145080A 1980-06-18 1980-06-18 Cmos integrated circuit device Granted JPS577957A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8145080A JPS577957A (en) 1980-06-18 1980-06-18 Cmos integrated circuit device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8145080A JPS577957A (en) 1980-06-18 1980-06-18 Cmos integrated circuit device

Publications (2)

Publication Number Publication Date
JPS577957A JPS577957A (en) 1982-01-16
JPS6360548B2 true JPS6360548B2 (enrdf_load_stackoverflow) 1988-11-24

Family

ID=13746732

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8145080A Granted JPS577957A (en) 1980-06-18 1980-06-18 Cmos integrated circuit device

Country Status (1)

Country Link
JP (1) JPS577957A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS577957A (en) 1982-01-16

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