JPS6360282A - プラズマ蒸着式基体表面被覆方法 - Google Patents
プラズマ蒸着式基体表面被覆方法Info
- Publication number
- JPS6360282A JPS6360282A JP20294386A JP20294386A JPS6360282A JP S6360282 A JPS6360282 A JP S6360282A JP 20294386 A JP20294386 A JP 20294386A JP 20294386 A JP20294386 A JP 20294386A JP S6360282 A JPS6360282 A JP S6360282A
- Authority
- JP
- Japan
- Prior art keywords
- reaction vessel
- substrate
- plasma
- metals
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 36
- 238000000576 coating method Methods 0.000 title claims description 36
- 239000011248 coating agent Substances 0.000 title claims description 32
- 238000000034 method Methods 0.000 title claims description 17
- 238000007740 vapor deposition Methods 0.000 title 1
- 238000006243 chemical reaction Methods 0.000 claims abstract description 43
- 229910052751 metal Inorganic materials 0.000 claims abstract description 11
- 239000002184 metal Substances 0.000 claims abstract description 11
- 150000002739 metals Chemical class 0.000 claims abstract description 9
- 230000000737 periodic effect Effects 0.000 claims abstract description 8
- 238000010438 heat treatment Methods 0.000 claims abstract description 6
- 239000007789 gas Substances 0.000 claims description 25
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 18
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 16
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 16
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 8
- 229910052757 nitrogen Inorganic materials 0.000 claims description 8
- 229910021529 ammonia Inorganic materials 0.000 claims description 7
- 239000001569 carbon dioxide Substances 0.000 claims description 7
- 150000001875 compounds Chemical class 0.000 claims description 6
- 230000008021 deposition Effects 0.000 claims description 6
- 229910002091 carbon monoxide Inorganic materials 0.000 claims description 5
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 claims description 4
- 239000001257 hydrogen Substances 0.000 claims description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims description 4
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 1
- 239000000463 material Substances 0.000 abstract description 4
- 239000000853 adhesive Substances 0.000 abstract description 2
- 230000001070 adhesive effect Effects 0.000 abstract description 2
- 239000000919 ceramic Substances 0.000 abstract description 2
- 239000000203 mixture Substances 0.000 abstract 1
- 239000004071 soot Substances 0.000 description 7
- 238000005240 physical vapour deposition Methods 0.000 description 6
- 239000004215 Carbon black (E152) Substances 0.000 description 5
- 238000005229 chemical vapour deposition Methods 0.000 description 5
- 238000000151 deposition Methods 0.000 description 5
- 229930195733 hydrocarbon Natural products 0.000 description 5
- 150000002430 hydrocarbons Chemical class 0.000 description 5
- 230000008018 melting Effects 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- 229910002090 carbon oxide Inorganic materials 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 229910000069 nitrogen hydride Inorganic materials 0.000 description 2
- 238000009832 plasma treatment Methods 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 229910003074 TiCl4 Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910001315 Tool steel Inorganic materials 0.000 description 1
- QUWBSOKSBWAQER-UHFFFAOYSA-N [C].O=C=O Chemical compound [C].O=C=O QUWBSOKSBWAQER-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 108010011222 cyclo(Arg-Pro) Proteins 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 238000005121 nitriding Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000005496 tempering Methods 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20294386A JPS6360282A (ja) | 1986-08-29 | 1986-08-29 | プラズマ蒸着式基体表面被覆方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20294386A JPS6360282A (ja) | 1986-08-29 | 1986-08-29 | プラズマ蒸着式基体表面被覆方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6360282A true JPS6360282A (ja) | 1988-03-16 |
| JPH0119469B2 JPH0119469B2 (enrdf_load_stackoverflow) | 1989-04-11 |
Family
ID=16465729
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20294386A Granted JPS6360282A (ja) | 1986-08-29 | 1986-08-29 | プラズマ蒸着式基体表面被覆方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6360282A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7264668B2 (en) * | 2001-10-16 | 2007-09-04 | The Chinese University Of Hong Kong | Decorative hard coating and method for manufacture |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5389804A (en) * | 1977-01-19 | 1978-08-08 | Mitsubishi Metal Corp | Covered supethard alloy product and its preparation |
| JPS6036665A (ja) * | 1984-04-13 | 1985-02-25 | Mitsubishi Metal Corp | 金属窒化物による基体表面被覆方法 |
-
1986
- 1986-08-29 JP JP20294386A patent/JPS6360282A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5389804A (en) * | 1977-01-19 | 1978-08-08 | Mitsubishi Metal Corp | Covered supethard alloy product and its preparation |
| JPS6036665A (ja) * | 1984-04-13 | 1985-02-25 | Mitsubishi Metal Corp | 金属窒化物による基体表面被覆方法 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7264668B2 (en) * | 2001-10-16 | 2007-09-04 | The Chinese University Of Hong Kong | Decorative hard coating and method for manufacture |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0119469B2 (enrdf_load_stackoverflow) | 1989-04-11 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5302422A (en) | Deposition process of a ceramic coating on a metallic substrate | |
| US4803127A (en) | Vapor deposition of metal compound coating utilizing metal sub-halides and coated metal article | |
| US3771976A (en) | Metal carbonitride-coated article and method of producing same | |
| US3368914A (en) | Process for adherently depositing a metal carbide on a metal substrate | |
| JP2002538308A5 (enrdf_load_stackoverflow) | ||
| EP0064884A1 (en) | Method and apparatus for coating by glow discharge | |
| Rie et al. | Plasma-assisted chemical vapour deposition of hard coatings with metallo-organic compounds | |
| JPH02213474A (ja) | 薄い硫化モリブデンフイルムの製法、硫化モリブデンフイルムおよび自己潤滑性層、電気光学的層および化学触媒作用性層の製法 | |
| JPH03240959A (ja) | 窒化炭素薄膜の合成方法 | |
| JPS6360282A (ja) | プラズマ蒸着式基体表面被覆方法 | |
| JPH0119468B2 (enrdf_load_stackoverflow) | ||
| JPS6242029B2 (enrdf_load_stackoverflow) | ||
| JPS6340800A (ja) | 高硬度窒化ホウ素の合成法 | |
| JP2569423B2 (ja) | 窒化ホウ素の気相合成法 | |
| Manory | Some principles for understanding surface modification of metals by glow discharge processes | |
| JPH03267361A (ja) | 硬質被膜とその製造方法 | |
| JPS5915983B2 (ja) | ホウ素被膜の形成方法 | |
| JPH07150337A (ja) | 窒化膜の製造方法 | |
| JPS6240376A (ja) | 立方晶窒化ホウ素の合成方法 | |
| JPH05132778A (ja) | 金属窒化物被膜の形成方法 | |
| JPS6369973A (ja) | 立方晶系窒化ホウ素膜の製造方法 | |
| JPH0532489A (ja) | プラズマを用いるダイヤモンドの合成法 | |
| JP2761431B2 (ja) | 被膜形成方法及びその装置 | |
| JPH0527707B2 (enrdf_load_stackoverflow) | ||
| Bliznakovsk et al. | PACVI]) of TIN |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| LAPS | Cancellation because of no payment of annual fees |