JPS6358831A - 異形基板のレジスト剥離方法および装置 - Google Patents
異形基板のレジスト剥離方法および装置Info
- Publication number
- JPS6358831A JPS6358831A JP20150986A JP20150986A JPS6358831A JP S6358831 A JPS6358831 A JP S6358831A JP 20150986 A JP20150986 A JP 20150986A JP 20150986 A JP20150986 A JP 20150986A JP S6358831 A JPS6358831 A JP S6358831A
- Authority
- JP
- Japan
- Prior art keywords
- resist
- substrate
- stripping liquid
- gas
- jet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20150986A JPS6358831A (ja) | 1986-08-29 | 1986-08-29 | 異形基板のレジスト剥離方法および装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20150986A JPS6358831A (ja) | 1986-08-29 | 1986-08-29 | 異形基板のレジスト剥離方法および装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6358831A true JPS6358831A (ja) | 1988-03-14 |
| JPH0226372B2 JPH0226372B2 (enrdf_load_stackoverflow) | 1990-06-08 |
Family
ID=16442227
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20150986A Granted JPS6358831A (ja) | 1986-08-29 | 1986-08-29 | 異形基板のレジスト剥離方法および装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6358831A (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4115510A1 (de) * | 1990-05-21 | 1991-11-28 | Hamatech Halbleiter Maschinenb | Vorrichtung zur randentlackung einer substrats |
| US5443942A (en) * | 1990-11-28 | 1995-08-22 | Canon Kabushiki Kaisha | Process for removing resist |
-
1986
- 1986-08-29 JP JP20150986A patent/JPS6358831A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4115510A1 (de) * | 1990-05-21 | 1991-11-28 | Hamatech Halbleiter Maschinenb | Vorrichtung zur randentlackung einer substrats |
| US5443942A (en) * | 1990-11-28 | 1995-08-22 | Canon Kabushiki Kaisha | Process for removing resist |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0226372B2 (enrdf_load_stackoverflow) | 1990-06-08 |
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