JPS6357776B2 - - Google Patents

Info

Publication number
JPS6357776B2
JPS6357776B2 JP18821281A JP18821281A JPS6357776B2 JP S6357776 B2 JPS6357776 B2 JP S6357776B2 JP 18821281 A JP18821281 A JP 18821281A JP 18821281 A JP18821281 A JP 18821281A JP S6357776 B2 JPS6357776 B2 JP S6357776B2
Authority
JP
Japan
Prior art keywords
layout
image
document
output
positional information
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP18821281A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5890642A (ja
Inventor
Kazuya Kitagawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Priority to JP56188212A priority Critical patent/JPS5890642A/ja
Publication of JPS5890642A publication Critical patent/JPS5890642A/ja
Publication of JPS6357776B2 publication Critical patent/JPS6357776B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/90Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared by montage processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Editing Of Facsimile Originals (AREA)
JP56188212A 1981-11-24 1981-11-24 画像処理方法 Granted JPS5890642A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56188212A JPS5890642A (ja) 1981-11-24 1981-11-24 画像処理方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56188212A JPS5890642A (ja) 1981-11-24 1981-11-24 画像処理方法

Publications (2)

Publication Number Publication Date
JPS5890642A JPS5890642A (ja) 1983-05-30
JPS6357776B2 true JPS6357776B2 (US20110009641A1-20110113-C00185.png) 1988-11-14

Family

ID=16219724

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56188212A Granted JPS5890642A (ja) 1981-11-24 1981-11-24 画像処理方法

Country Status (1)

Country Link
JP (1) JPS5890642A (US20110009641A1-20110113-C00185.png)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5958430A (ja) * 1982-09-29 1984-04-04 Dainippon Printing Co Ltd 印刷製版における自動トリミングレイアウト方法
JPS60135746U (ja) * 1984-02-22 1985-09-09 大日本印刷株式会社 トリミングスキヤナ
JPS60198543A (ja) * 1984-03-21 1985-10-08 Dainippon Printing Co Ltd 印刷製版の自動トリミングレイアウト方法
JPS61265963A (ja) * 1985-05-21 1986-11-25 Dainippon Screen Mfg Co Ltd レイアウトスキヤナにおける画像のレイアウト方法
JPH01166050A (ja) * 1987-12-22 1989-06-29 Tsunenobu Nakamura 写真製版プロセスにおける原版フィルムの製造方法
JPH02217850A (ja) * 1989-12-22 1990-08-30 Dainippon Printing Co Ltd スキャナ用原稿貼付シートの作成方法及び装置

Also Published As

Publication number Publication date
JPS5890642A (ja) 1983-05-30

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