JPS6357775B2 - - Google Patents

Info

Publication number
JPS6357775B2
JPS6357775B2 JP17817081A JP17817081A JPS6357775B2 JP S6357775 B2 JPS6357775 B2 JP S6357775B2 JP 17817081 A JP17817081 A JP 17817081A JP 17817081 A JP17817081 A JP 17817081A JP S6357775 B2 JPS6357775 B2 JP S6357775B2
Authority
JP
Japan
Prior art keywords
layout
document
image
information
original
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP17817081A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5890641A (ja
Inventor
Kazuya Kitagawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Priority to JP56178170A priority Critical patent/JPS5890641A/ja
Publication of JPS5890641A publication Critical patent/JPS5890641A/ja
Publication of JPS6357775B2 publication Critical patent/JPS6357775B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/90—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared by montage processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Editing Of Facsimile Originals (AREA)
JP56178170A 1981-11-06 1981-11-06 画像処理方法 Granted JPS5890641A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56178170A JPS5890641A (ja) 1981-11-06 1981-11-06 画像処理方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56178170A JPS5890641A (ja) 1981-11-06 1981-11-06 画像処理方法

Publications (2)

Publication Number Publication Date
JPS5890641A JPS5890641A (ja) 1983-05-30
JPS6357775B2 true JPS6357775B2 (fr) 1988-11-14

Family

ID=16043830

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56178170A Granted JPS5890641A (ja) 1981-11-06 1981-11-06 画像処理方法

Country Status (1)

Country Link
JP (1) JPS5890641A (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0169967A3 (fr) * 1984-08-01 1989-02-22 Dai Nippon Insatsu Kabushiki Kaisha Dispositif de positionnement angulaire d'un original pour dispositif d'analyse
JPS61265963A (ja) * 1985-05-21 1986-11-25 Dainippon Screen Mfg Co Ltd レイアウトスキヤナにおける画像のレイアウト方法

Also Published As

Publication number Publication date
JPS5890641A (ja) 1983-05-30

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