JPS6354236B2 - - Google Patents
Info
- Publication number
- JPS6354236B2 JPS6354236B2 JP58085886A JP8588683A JPS6354236B2 JP S6354236 B2 JPS6354236 B2 JP S6354236B2 JP 58085886 A JP58085886 A JP 58085886A JP 8588683 A JP8588683 A JP 8588683A JP S6354236 B2 JPS6354236 B2 JP S6354236B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- optical waveguide
- temperature
- diffraction grating
- active layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000003287 optical effect Effects 0.000 claims description 18
- 238000000034 method Methods 0.000 claims description 13
- 239000000758 substrate Substances 0.000 claims description 12
- 238000004519 manufacturing process Methods 0.000 claims description 9
- 239000004065 semiconductor Substances 0.000 claims description 9
- 239000000203 mixture Substances 0.000 claims description 4
- 239000013078 crystal Substances 0.000 description 6
- 230000010355 oscillation Effects 0.000 description 6
- 238000005253 cladding Methods 0.000 description 3
- 238000010494 dissociation reaction Methods 0.000 description 2
- 230000005593 dissociations Effects 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000003776 cleavage reaction Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000005424 photoluminescence Methods 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/11—Comprising a photonic bandgap structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/12—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
- H01S5/1231—Grating growth or overgrowth details
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
- Semiconductor Lasers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58085886A JPS59213190A (ja) | 1983-05-18 | 1983-05-18 | 半導体レ−ザの製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58085886A JPS59213190A (ja) | 1983-05-18 | 1983-05-18 | 半導体レ−ザの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59213190A JPS59213190A (ja) | 1984-12-03 |
| JPS6354236B2 true JPS6354236B2 (enrdf_load_stackoverflow) | 1988-10-27 |
Family
ID=13871387
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58085886A Granted JPS59213190A (ja) | 1983-05-18 | 1983-05-18 | 半導体レ−ザの製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59213190A (enrdf_load_stackoverflow) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60206132A (ja) * | 1984-03-30 | 1985-10-17 | Nec Corp | 結晶成長方法 |
| JPH0567848A (ja) * | 1991-09-05 | 1993-03-19 | Fujitsu Ltd | 光半導体装置の製造方法 |
-
1983
- 1983-05-18 JP JP58085886A patent/JPS59213190A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59213190A (ja) | 1984-12-03 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4994143A (en) | Method for manufacturing a buried heterostructure laser diode | |
| US4073676A (en) | GaAs-GaAlAs semiconductor having a periodic corrugation at an interface | |
| JPS6354236B2 (enrdf_load_stackoverflow) | ||
| US4734387A (en) | Growth of semiconductors on a shaped semiconductor substrate | |
| JP4629687B2 (ja) | 光半導体素子、及びその製造方法 | |
| JPS6355232B2 (enrdf_load_stackoverflow) | ||
| JPS633477B2 (enrdf_load_stackoverflow) | ||
| JP2003158074A (ja) | 半導体多層基板および半導体多層膜の製造方法 | |
| JPH0334489A (ja) | 半導体レーザ装置およびその製造方法 | |
| KR100324203B1 (ko) | 순수 이득결합 분포 궤환형 반도체 레이저 및 그 제조방법 | |
| JPH071816B2 (ja) | 分布帰還型半導体レ−ザ | |
| JPS60164380A (ja) | 半導体レ−ザの製造方法 | |
| JPS59165478A (ja) | 分布帰還型半導体レ−ザ | |
| JPS6351558B2 (enrdf_load_stackoverflow) | ||
| JPS61244083A (ja) | 半導体レ−ザの製造方法 | |
| JPS59188187A (ja) | 半導体レ−ザダイオ−ド及びその製造方法 | |
| JPH08172216A (ja) | 歪量子井戸型半導体発光装置の製造方法 | |
| JP2708750B2 (ja) | 半導体装置の製造方法 | |
| JPH0529708A (ja) | 半導体レーザ装置及びその製造方法 | |
| JPS6034064A (ja) | 半導体レ−ザの製造方法 | |
| JPH0410486A (ja) | 半導体レーザの製造方法 | |
| JPS63152189A (ja) | 分布帰還型半導体レ−ザの製造方法 | |
| JPS61187388A (ja) | 半導体レ−ザの製造方法 | |
| JPH10117039A (ja) | 半導体レーザの製造方法 | |
| JPH04240788A (ja) | 半導体レーザ |