JPS59213190A - 半導体レ−ザの製造方法 - Google Patents
半導体レ−ザの製造方法Info
- Publication number
- JPS59213190A JPS59213190A JP58085886A JP8588683A JPS59213190A JP S59213190 A JPS59213190 A JP S59213190A JP 58085886 A JP58085886 A JP 58085886A JP 8588683 A JP8588683 A JP 8588683A JP S59213190 A JPS59213190 A JP S59213190A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- grown
- temperature
- active layer
- optical waveguide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 239000004065 semiconductor Substances 0.000 title claims description 8
- 230000003287 optical effect Effects 0.000 claims abstract description 16
- 238000000034 method Methods 0.000 claims abstract description 12
- 239000000758 substrate Substances 0.000 claims abstract description 10
- 239000000203 mixture Substances 0.000 claims description 3
- 230000010355 oscillation Effects 0.000 description 6
- 239000013078 crystal Substances 0.000 description 5
- 238000005253 cladding Methods 0.000 description 3
- 238000010494 dissociation reaction Methods 0.000 description 2
- 230000005593 dissociations Effects 0.000 description 2
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 description 1
- UBQYURCVBFRUQT-UHFFFAOYSA-N N-benzoyl-Ferrioxamine B Chemical compound CC(=O)N(O)CCCCCNC(=O)CCC(=O)N(O)CCCCCNC(=O)CCC(=O)N(O)CCCCCN UBQYURCVBFRUQT-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000005424 photoluminescence Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/11—Comprising a photonic bandgap structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/12—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
- H01S5/1231—Grating growth or overgrowth details
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
- Semiconductor Lasers (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58085886A JPS59213190A (ja) | 1983-05-18 | 1983-05-18 | 半導体レ−ザの製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58085886A JPS59213190A (ja) | 1983-05-18 | 1983-05-18 | 半導体レ−ザの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59213190A true JPS59213190A (ja) | 1984-12-03 |
JPS6354236B2 JPS6354236B2 (enrdf_load_stackoverflow) | 1988-10-27 |
Family
ID=13871387
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58085886A Granted JPS59213190A (ja) | 1983-05-18 | 1983-05-18 | 半導体レ−ザの製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59213190A (enrdf_load_stackoverflow) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60206132A (ja) * | 1984-03-30 | 1985-10-17 | Nec Corp | 結晶成長方法 |
US5327450A (en) * | 1991-09-05 | 1994-07-05 | Fujitsu Limited | Optical semiconductor device and process of prodcuing same |
-
1983
- 1983-05-18 JP JP58085886A patent/JPS59213190A/ja active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60206132A (ja) * | 1984-03-30 | 1985-10-17 | Nec Corp | 結晶成長方法 |
US5327450A (en) * | 1991-09-05 | 1994-07-05 | Fujitsu Limited | Optical semiconductor device and process of prodcuing same |
Also Published As
Publication number | Publication date |
---|---|
JPS6354236B2 (enrdf_load_stackoverflow) | 1988-10-27 |
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