JPS6350122U - - Google Patents

Info

Publication number
JPS6350122U
JPS6350122U JP14482586U JP14482586U JPS6350122U JP S6350122 U JPS6350122 U JP S6350122U JP 14482586 U JP14482586 U JP 14482586U JP 14482586 U JP14482586 U JP 14482586U JP S6350122 U JPS6350122 U JP S6350122U
Authority
JP
Japan
Prior art keywords
crucible
vapor deposition
deposition material
thin film
mounting mechanism
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14482586U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP14482586U priority Critical patent/JPS6350122U/ja
Publication of JPS6350122U publication Critical patent/JPS6350122U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
JP14482586U 1986-09-19 1986-09-19 Pending JPS6350122U (enrdf_load_stackoverflow)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14482586U JPS6350122U (enrdf_load_stackoverflow) 1986-09-19 1986-09-19

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14482586U JPS6350122U (enrdf_load_stackoverflow) 1986-09-19 1986-09-19

Publications (1)

Publication Number Publication Date
JPS6350122U true JPS6350122U (enrdf_load_stackoverflow) 1988-04-05

Family

ID=31055790

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14482586U Pending JPS6350122U (enrdf_load_stackoverflow) 1986-09-19 1986-09-19

Country Status (1)

Country Link
JP (1) JPS6350122U (enrdf_load_stackoverflow)

Similar Documents

Publication Publication Date Title
FR2393079B1 (fr) Procede de vaporisation de materiaux dans une installation de depot par evaporation sous vide
JPS6350122U (enrdf_load_stackoverflow)
UST988002I4 (en) Apparatus for forming a vacuum evaporating layer on a substrate
JPH0251259U (enrdf_load_stackoverflow)
JPS5770273A (en) Method for fixing mask for vapor deposition
JPH05230627A (ja) 真空蒸着装置
JPS6389964U (enrdf_load_stackoverflow)
JPH0217550U (enrdf_load_stackoverflow)
JPS6342135Y2 (enrdf_load_stackoverflow)
JPS6389962U (enrdf_load_stackoverflow)
JPH0399762U (enrdf_load_stackoverflow)
JPH0399776U (enrdf_load_stackoverflow)
JPS6163757U (enrdf_load_stackoverflow)
JPS63224321A (ja) 分子線エピタキシ−装置
JPS63224320A (ja) 分子線エピタキシ−装置
JPS60127354U (ja) 蒸着装置
JPS63115062U (enrdf_load_stackoverflow)
JPH0214359U (enrdf_load_stackoverflow)
JPS6260253U (enrdf_load_stackoverflow)
JPH0290664U (enrdf_load_stackoverflow)
JPH0415831U (enrdf_load_stackoverflow)
JPS5980467U (ja) 蒸着装置
JPS6237082U (enrdf_load_stackoverflow)
JPH0444361U (enrdf_load_stackoverflow)
JPS62199766A (ja) イオンプレ−テイング装置