JPS6347974A - ヘテロ接合バイポ−ラトランジスタ - Google Patents
ヘテロ接合バイポ−ラトランジスタInfo
- Publication number
- JPS6347974A JPS6347974A JP61192485A JP19248586A JPS6347974A JP S6347974 A JPS6347974 A JP S6347974A JP 61192485 A JP61192485 A JP 61192485A JP 19248586 A JP19248586 A JP 19248586A JP S6347974 A JPS6347974 A JP S6347974A
- Authority
- JP
- Japan
- Prior art keywords
- region
- layer
- emitter
- base
- collector
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Bipolar Transistors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61192485A JPS6347974A (ja) | 1986-08-18 | 1986-08-18 | ヘテロ接合バイポ−ラトランジスタ |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61192485A JPS6347974A (ja) | 1986-08-18 | 1986-08-18 | ヘテロ接合バイポ−ラトランジスタ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6347974A true JPS6347974A (ja) | 1988-02-29 |
| JPH0571172B2 JPH0571172B2 (cs) | 1993-10-06 |
Family
ID=16292080
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61192485A Granted JPS6347974A (ja) | 1986-08-18 | 1986-08-18 | ヘテロ接合バイポ−ラトランジスタ |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6347974A (cs) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5021841A (en) * | 1988-10-14 | 1991-06-04 | University Of Illinois | Semiconductor device with controlled negative differential resistance characteristic |
| US6037616A (en) * | 1996-12-12 | 2000-03-14 | Nec Corporation | Bipolar transistor having base contact layer in contact with lower surface of base layer |
-
1986
- 1986-08-18 JP JP61192485A patent/JPS6347974A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5021841A (en) * | 1988-10-14 | 1991-06-04 | University Of Illinois | Semiconductor device with controlled negative differential resistance characteristic |
| US6037616A (en) * | 1996-12-12 | 2000-03-14 | Nec Corporation | Bipolar transistor having base contact layer in contact with lower surface of base layer |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0571172B2 (cs) | 1993-10-06 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4119994A (en) | Heterojunction and process for fabricating same | |
| US5006912A (en) | Heterojunction bipolar transistor with SiGe | |
| US7135721B2 (en) | Heterojunction bipolar transistor having reduced driving voltage requirements | |
| US4794440A (en) | Heterojunction bipolar transistor | |
| KR100289473B1 (ko) | 다층 베이스 헤테로접합 장치 및 그 제조방법 | |
| JP2804095B2 (ja) | ヘテロ接合バイボーラトランジスタ | |
| US6423990B1 (en) | Vertical heterojunction bipolar transistor | |
| CN110581167B (zh) | 一种台面型AlGaN/GaN异质结双极晶体管器件及其制备方法 | |
| US5571732A (en) | Method for fabricating a bipolar transistor | |
| US5648666A (en) | Double-epitaxy heterojunction bipolar transistors for high speed performance | |
| US5814843A (en) | Heterojunction bipolar transistor having a graded-composition base region | |
| US5912481A (en) | Heterojunction bipolar transistor having wide bandgap, low interdiffusion base-emitter junction | |
| US3500141A (en) | Transistor structure | |
| JPS6347974A (ja) | ヘテロ接合バイポ−ラトランジスタ | |
| CN209804658U (zh) | 一种台面型AlGaN/GaN异质结双极晶体管器件 | |
| CN210110780U (zh) | PNP型肖特基集电区AlGaN/GaN HBT器件 | |
| JP4158683B2 (ja) | ヘテロ接合バイポーラトランジスタ用エピタキシャルウェハ | |
| Kimura et al. | Improvement of the electrical properties of MBE grown Ge layers and its application to collector-top n-GaAs/p-Ge/n-Ge HBTs | |
| US7923752B2 (en) | Thin-film crystal wafer having pn junction and method for fabricating the wafer | |
| JP3183882B2 (ja) | ヘテロ接合バイポーラトランジスタ | |
| JPH11121461A (ja) | ヘテロ接合バイポーラトランジスタ | |
| JPH05175225A (ja) | ヘテロ接合バイポーラトランジスタの製造方法 | |
| JP3228431B2 (ja) | コレクタアップ構造ヘテロ接合バイポーラトランジスタの製造方法 | |
| Shigematsu et al. | ALE/MOCVD grown InP/InGaAs HBTs with a highly-Be-doped base layer and suppressed diffusion | |
| JPH10308401A (ja) | ヘテロ接合バイポーラトランジスタ |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |