JPS6346837U - - Google Patents
Info
- Publication number
- JPS6346837U JPS6346837U JP14085586U JP14085586U JPS6346837U JP S6346837 U JPS6346837 U JP S6346837U JP 14085586 U JP14085586 U JP 14085586U JP 14085586 U JP14085586 U JP 14085586U JP S6346837 U JPS6346837 U JP S6346837U
- Authority
- JP
- Japan
- Prior art keywords
- susceptors
- induction coil
- electromagnetic induction
- reaction tube
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14085586U JPS6346837U (enExample) | 1986-09-12 | 1986-09-12 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14085586U JPS6346837U (enExample) | 1986-09-12 | 1986-09-12 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6346837U true JPS6346837U (enExample) | 1988-03-30 |
Family
ID=31048095
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14085586U Pending JPS6346837U (enExample) | 1986-09-12 | 1986-09-12 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6346837U (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0271787U (enExample) * | 1988-11-18 | 1990-05-31 | ||
| JP2003100643A (ja) * | 2001-09-26 | 2003-04-04 | Daiichi Kiden:Kk | 高温ｃｖｄ装置 |
| JP4759572B2 (ja) * | 2004-12-24 | 2011-08-31 | アイクストロン、アーゲー | Ｒｆ−加熱されるプロセス室を備えたｃｖｄ反応装置 |
-
1986
- 1986-09-12 JP JP14085586U patent/JPS6346837U/ja active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0271787U (enExample) * | 1988-11-18 | 1990-05-31 | ||
| JP2003100643A (ja) * | 2001-09-26 | 2003-04-04 | Daiichi Kiden:Kk | 高温ｃｖｄ装置 |
| JP4759572B2 (ja) * | 2004-12-24 | 2011-08-31 | アイクストロン、アーゲー | Ｒｆ−加熱されるプロセス室を備えたｃｖｄ反応装置 |