JPS6344164B2 - - Google Patents

Info

Publication number
JPS6344164B2
JPS6344164B2 JP56131921A JP13192181A JPS6344164B2 JP S6344164 B2 JPS6344164 B2 JP S6344164B2 JP 56131921 A JP56131921 A JP 56131921A JP 13192181 A JP13192181 A JP 13192181A JP S6344164 B2 JPS6344164 B2 JP S6344164B2
Authority
JP
Japan
Prior art keywords
paint layer
thickness
semi
change
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56131921A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5833106A (ja
Inventor
Zenichi Yasuda
Misao Morita
Koji Nakajima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Paint Co Ltd
Original Assignee
Nippon Paint Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Paint Co Ltd filed Critical Nippon Paint Co Ltd
Priority to JP56131921A priority Critical patent/JPS5833106A/ja
Priority to US06/326,675 priority patent/US4443106A/en
Publication of JPS5833106A publication Critical patent/JPS5833106A/ja
Publication of JPS6344164B2 publication Critical patent/JPS6344164B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0675—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating using interferometry

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
JP56131921A 1981-08-22 1981-08-22 塗料層の層厚変化量測定装置 Granted JPS5833106A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP56131921A JPS5833106A (ja) 1981-08-22 1981-08-22 塗料層の層厚変化量測定装置
US06/326,675 US4443106A (en) 1981-08-22 1981-12-01 Measuring device for measuring the amount of change in thickness of the paint layer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56131921A JPS5833106A (ja) 1981-08-22 1981-08-22 塗料層の層厚変化量測定装置

Publications (2)

Publication Number Publication Date
JPS5833106A JPS5833106A (ja) 1983-02-26
JPS6344164B2 true JPS6344164B2 (OSRAM) 1988-09-02

Family

ID=15069306

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56131921A Granted JPS5833106A (ja) 1981-08-22 1981-08-22 塗料層の層厚変化量測定装置

Country Status (2)

Country Link
US (1) US4443106A (OSRAM)
JP (1) JPS5833106A (OSRAM)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8328664D0 (en) * 1983-10-27 1983-11-30 Seetru Ltd Sight gauge for tall tank reservoirs
JPS60219744A (ja) * 1984-04-17 1985-11-02 Canon Inc 投影露光装置
US4679946A (en) * 1984-05-21 1987-07-14 Therma-Wave, Inc. Evaluating both thickness and compositional variables in a thin film sample
DE3435059A1 (de) * 1984-09-25 1986-03-27 Hoechst Ag, 6230 Frankfurt Verfahren und vorrichtung zur kontinuierlichen bestimmung der anisotropiezustaende von optisch aktiven materialien
US4632552A (en) * 1985-03-06 1986-12-30 At&T Bell Laboratories Cleaved-coupled-cavity-laser-driven system for measuring small signals
DE3600346A1 (de) * 1986-01-08 1987-07-09 Fraunhofer Ges Forschung Verfahren zur abbildenden laserinterferometrie und laserinterferometer zur durchfuehrung des verfahrens
US4747683A (en) * 1986-01-17 1988-05-31 Eye Research Institute Of Retina Foundation Method and device for in vivo wetting determinations
US4815856A (en) * 1986-06-05 1989-03-28 Storage Technology Partners Ii Method and apparatus for measuring the absolute thickness of dust defocus layers
US4770536A (en) * 1986-12-04 1988-09-13 Moshe Golberstein Reflective photometry instrument
FR2680414B1 (fr) * 1991-08-14 1995-05-24 Sofie Ensemble d'observation et de mesures interferometriques simultanees par laser, en particulier sur des structures a couches minces.
JPH05133712A (ja) * 1991-11-12 1993-05-28 Nikon Corp 表面位置測定装置
US5220405A (en) * 1991-12-20 1993-06-15 International Business Machines Corporation Interferometer for in situ measurement of thin film thickness changes
US5596409A (en) * 1995-03-22 1997-01-21 Eastman Kodak Company Associated dual interferometric measurement method for determining a physical property of an object
US5659392A (en) * 1995-03-22 1997-08-19 Eastman Kodak Company Associated dual interferometric measurement apparatus for determining a physical property of an object
US6297648B1 (en) 1996-08-16 2001-10-02 The Boeing Company Oscillating cavity paint meter
DE19926019A1 (de) * 1999-05-31 2000-12-21 Dieter Steinberg Verfahren und Schichtdickenmeßgerät zur in situ Überwachung wachsender Schichten
WO2009039466A1 (en) 2007-09-20 2009-03-26 Vanderbilt University Free solution measurement of molecular interactions by backscattering interferometry
WO2011156713A1 (en) * 2010-06-11 2011-12-15 Vanderbilt University Multiplexed interferometric detection system and method
US9562853B2 (en) 2011-02-22 2017-02-07 Vanderbilt University Nonaqueous backscattering interferometric methods
US9273949B2 (en) 2012-05-11 2016-03-01 Vanderbilt University Backscattering interferometric methods
EP3247988A4 (en) 2015-01-23 2018-12-19 Vanderbilt University A robust interferometer and methods of using same
EP3408649B1 (en) 2016-01-29 2023-06-14 Vanderbilt University Free-solution response function interferometry
JP7502328B2 (ja) * 2019-04-12 2024-06-18 ビーエーエスエフ コーティングス ゲゼルシャフト ミット ベシュレンクテル ハフツング プローブ表面のコーティングの検査方法
US20220406583A1 (en) * 2021-06-18 2022-12-22 Taiwan Semiconductor Manufacturing Co., Ltd. Deposition system and method

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2338129A (en) * 1941-12-19 1944-01-04 Howard R Moore Method of determining the rate of drying of coatings
US3974678A (en) * 1975-03-05 1976-08-17 Conchemco, Incorporated Automatic paint cure tester
JPS5292750U (OSRAM) * 1975-12-31 1977-07-11

Also Published As

Publication number Publication date
US4443106A (en) 1984-04-17
JPS5833106A (ja) 1983-02-26

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