JPS6342049A - Manufacture of stamper - Google Patents
Manufacture of stamperInfo
- Publication number
- JPS6342049A JPS6342049A JP18556286A JP18556286A JPS6342049A JP S6342049 A JPS6342049 A JP S6342049A JP 18556286 A JP18556286 A JP 18556286A JP 18556286 A JP18556286 A JP 18556286A JP S6342049 A JPS6342049 A JP S6342049A
- Authority
- JP
- Japan
- Prior art keywords
- stamper
- glass master
- glass original
- nickel
- chromium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 239000011521 glass Substances 0.000 claims abstract description 51
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract description 42
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims abstract description 34
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 27
- 239000011651 chromium Substances 0.000 claims abstract description 27
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 20
- 238000005323 electroforming Methods 0.000 claims abstract description 17
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 17
- 239000004020 conductor Substances 0.000 claims abstract description 5
- 239000006087 Silane Coupling Agent Substances 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 8
- 239000011248 coating agent Substances 0.000 claims description 3
- 238000000576 coating method Methods 0.000 claims description 3
- 238000001755 magnetron sputter deposition Methods 0.000 abstract description 9
- 238000003698 laser cutting Methods 0.000 abstract description 6
- 238000009835 boiling Methods 0.000 abstract description 4
- 238000006243 chemical reaction Methods 0.000 abstract description 3
- 238000011161 development Methods 0.000 abstract description 3
- 238000004381 surface treatment Methods 0.000 abstract description 3
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 abstract 2
- 239000002253 acid Substances 0.000 abstract 1
- 230000002093 peripheral effect Effects 0.000 abstract 1
- FDDDEECHVMSUSB-UHFFFAOYSA-N sulfanilamide Chemical compound NC1=CC=C(S(N)(=O)=O)C=C1 FDDDEECHVMSUSB-UHFFFAOYSA-N 0.000 abstract 1
- 229940124530 sulfonamide Drugs 0.000 abstract 1
- 230000003287 optical effect Effects 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 5
- 239000010408 film Substances 0.000 description 4
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 206010040844 Skin exfoliation Diseases 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 description 2
- KERTUBUCQCSNJU-UHFFFAOYSA-L nickel(2+);disulfamate Chemical compound [Ni+2].NS([O-])(=O)=O.NS([O-])(=O)=O KERTUBUCQCSNJU-UHFFFAOYSA-L 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- QIVUCLWGARAQIO-OLIXTKCUSA-N (3s)-n-[(3s,5s,6r)-6-methyl-2-oxo-1-(2,2,2-trifluoroethyl)-5-(2,3,6-trifluorophenyl)piperidin-3-yl]-2-oxospiro[1h-pyrrolo[2,3-b]pyridine-3,6'-5,7-dihydrocyclopenta[b]pyridine]-3'-carboxamide Chemical compound C1([C@H]2[C@H](N(C(=O)[C@@H](NC(=O)C=3C=C4C[C@]5(CC4=NC=3)C3=CC=CN=C3NC5=O)C2)CC(F)(F)F)C)=C(F)C=CC(F)=C1F QIVUCLWGARAQIO-OLIXTKCUSA-N 0.000 description 1
- 101100056837 Aspergillus flavus (strain ATCC 200026 / FGSC A1120 / IAM 13836 / NRRL 3357 / JCM 12722 / SRRC 167) asaE gene Proteins 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000008186 active pharmaceutical agent Substances 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 150000004687 hexahydrates Chemical class 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- LAIZPRYFQUWUBN-UHFFFAOYSA-L nickel chloride hexahydrate Chemical compound O.O.O.O.O.O.[Cl-].[Cl-].[Ni+2] LAIZPRYFQUWUBN-UHFFFAOYSA-L 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- TXRHHNYLWVQULI-UHFFFAOYSA-L nickel(2+);disulfamate;tetrahydrate Chemical compound O.O.O.O.[Ni+2].NS([O-])(=O)=O.NS([O-])(=O)=O TXRHHNYLWVQULI-UHFFFAOYSA-L 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 239000008262 pumice Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 150000004685 tetrahydrates Chemical class 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Landscapes
- Manufacturing Optical Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は光記録媒体、光磁気記録媒体等の光情報記録媒
体用のスタンパの製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for manufacturing a stamper for optical information recording media such as optical recording media and magneto-optical recording media.
近年、大容量メモリの一つとして、光メモリの研究が活
発である。In recent years, optical memory has been actively researched as a type of large-capacity memory.
腋光メモリ用ディスク原盤の製造プロセスは、マスタリ
ングプロセスと呼ばれ、日経メカニカル１９８４年４月
３日ＭＰ、７３〜あるいはＮａｔｉｏｎａｌＴｅｃｈｎ
ｉｃａｌ Ｒｅｐｏｒｔ ＶＯｌ、 ２９４５ ａｃ
ｔ、 １９８３ Ｐ、１０６〜に詳述されている。The manufacturing process for master disks for optical memory is called the mastering process, and is described in Nikkei Mechanical April 3, 1984 MP, 73~ or National Techn.
ical Report VOl, 2945 ac
T, 1983 P, 106~.
その基本プロセスは、ガラス原盤の研磨、レジスト塗布
、レーザカッティング、現像、導体化処理、ニッケル電
鋳の工程を軽石ものである。なお前記文献中では、マス
ター盤を剥離処理した後、電鋳し凹凸の反転したマザー
盤を得、更にこのマザー盤を剥離処理して再度ｉｔ ｇ
することによりスタンパとする記述ｂ″−されているが
、マスター盤をそのままスタンパとして使用し、プラス
チック盤の穴形を行なえば、原盤上の情報信号がそのま
まプラスチック円盤上に再生されろ為、ここではマスタ
ー盤をスタンパとすることで説明する。The basic process is polishing the glass master, resist coating, laser cutting, development, conductor treatment, and nickel electroforming using pumice. In the above-mentioned document, after a master disk is subjected to peeling treatment, electroforming is performed to obtain a mother disk with reversed unevenness, and this mother disk is further subjected to peeling treatment and then it
This is described as a stamper, but if you use the master disc as it is as a stamper and shape the holes on the plastic disc, the information signal on the master disc will be reproduced as is on the plastic disc, so here Let's explain by using the master disc as a stamper.
しかし前述の従来技術では、ガラス原盤と７オトレジス
トの密着性が不充分であり、この為高温（５０〜６０℃
）酸性浴中での電鋳工朽で７オトレジスト膜が剥離した
り、一部浮きが発生する。その結果、スタンパにシミや
キズ等の欠陥を生じ良品が得られないという問題点を有
する。However, in the above-mentioned conventional technology, the adhesion between the glass master and the 7-hole resist is insufficient, and therefore
) During electroforming in an acidic bath, the 7-otoresist film may peel off or some parts may be lifted. As a result, there is a problem in that defects such as stains and scratches occur on the stamper, making it impossible to obtain non-defective products.
そこで本発明け、このような問題点を解決するものでそ
の目的とするところは、フォトレジストとガラス原盤の
密着性を向上し、最終的にはシミやキズ等の無いスタン
パ及びそのｌｌ！ｎ方法を提供することにある。Therefore, the present invention is intended to solve these problems, and its purpose is to improve the adhesion between the photoresist and the glass master, and ultimately to create a stamper and stamper that is free from stains and scratches! The objective is to provide n methods.
本発明は、鏡面研磨され次ガラス原盤を、シランカップ
リング剤で表面処理し、フォトレジストを塗布した後、
信号としての凹凸パターンをレーザ光の照射により形成
し、次いで導体化処理を行なっｔ後、ニッケル電鋳を行
なうスタンパの製造において、Ｖガラス原盤をシランカ
ップリング剤で表面処理した後、該レーザ光の非Ｉｆ躬
部にクロムを部分的にスパνりし、次いでフォトレジス
トを塗布してレーザ光により凹凸パターンを形咬する際
に、該クロム層を表面に露出せしめ、導体化処理を行な
りｔ後ニッケル’！ＩＥ鋳を行なう事を特徴とする。In the present invention, a mirror-polished glass master is surface-treated with a silane coupling agent, and then a photoresist is applied.
In the production of a stamper in which a concavo-convex pattern as a signal is formed by irradiation with laser light, and then conductive treatment is performed, nickel electroforming is performed.After surface-treating the V glass master disk with a silane coupling agent, the laser beam is applied. Chromium is partially spat on the non-If portions of the substrate, and then photoresist is applied and a concavo-convex pattern is formed using a laser beam, exposing the chromium layer to the surface and making it conductive. Nickel after t! It is characterized by IE casting.
以下実施例に基づき本発明について具体的て説明する。 The present invention will be specifically described below based on Examples.
実施例−１
鋳面研磨した直径２００１１１、内径１０Ｑ、厚さ６目
ｍのガラス原盤をＨＭＤＳ（へ千すメチルジシラサザン
）のボイリング蒸気中にさらし乾燥して表面処理し九後
、マグネトロンスパッタ装置中にセットし、該ガラス原
盤の内周上面で、内径１０〜４０鶴の範囲に、第１図に
示すマスクを使用し、クロムを直流スパνりする。この
時のクロム膜厚け、およそ７０〜８０人である。Example-1 A polished glass master disk with a diameter of 200111, an inner diameter of 10Q, and a thickness of 6 meters was exposed to the boiling steam of HMDS (Hesensu Methyl Disilasasan), dried and surface-treated, and then subjected to magnetron sputtering. The glass master was set in the apparatus, and chromium was applied by direct current spacing on the upper surface of the inner periphery of the glass master, using the mask shown in FIG. The thickness of the chrome film at this time was about 70 to 80 people.
次に、ポジ型７オトレジス） ＡＺ−１３５０（米国シ
ラプレー社製）をスピンコータで７００にの厚すにコー
トし、レーザカッティングマシンによってレーザ光を照
射し、巾１８μｍ、ピッチ２．５＃ｌでスパイラル状だ
感光させ九後現像して、深さ７００に、巾［１８μｍ、
ピッチ２．５μ倶の溝を有するガラス原盤とする。なお
この時前記クロム層上のレジストも除去し、クロム１を
表面に露出させる。Next, a positive type 7 Otoregis) AZ-1350 (manufactured by Silapray, USA) was coated with a spin coater to a thickness of 700 mm, and a laser beam was irradiated with a laser cutting machine to form a spiral with a width of 18 μm and a pitch of 2.5 #l. The shape was exposed to light and then developed to a depth of 700 mm and a width of 18 μm.
A glass master disk having grooves with a pitch of 2.5μ is used. At this time, the resist on the chromium layer is also removed to expose chromium 1 on the surface.
該ガラス原盤をマグネトロンスパッタ装置にセットし、
ニッケルを７００ Ｋ直流スパッタする。Set the glass master disk in a magnetron sputtering device,
Nickel is sputtered at 700 K DC.
かかる導体化処理を施したガラス原盤を、スル７アミノ
酸ニツケル浴中で電鋳を行なう。The glass master disk that has been subjected to the conductive treatment is subjected to electroforming in a 7-amino acid nickel bath.
第２図はこの時のガラス原盤のセクト状況を示す断面図
で、１けガラス、２けクロム層、３けフォトレジスト、
４はニッケル層、５け電極治具、６はガラス原盤の中心
線である。Figure 2 is a cross-sectional view showing the section status of the glass master disk at this time, with 1 layer of glass, 2 layers of chrome, 3 layers of photoresist,
4 is a nickel layer, a 5-piece electrode jig, and 6 is a center line of a glass master disk.
浴温け６０℃、ニッケル濃Ｉｆけ５５０９／ｌ、通電電
流ｉｆ ０． Ｉ Ａ／ｄｍ”からスタートし、４０分
後に４０λ／ｄｍ”になる様直線的に増加させ比。Bath temperature: 60°C, nickel concentration: 5509/l, current: 0. The ratio starts from "IA/dm" and increases linearly to 40 λ/dm" after 40 minutes.
およそ２時間で厚さ［Ｌ３ｍのスタンパｂ：得られ得、
られ九スタンパは電鋳工糧での膜浮きもなくシミ％キズ
の無い啄めて良好な品質であった。Stamper b of thickness [L3m: can be obtained in about 2 hours,
The nine stampers were of good quality, with no film lifting caused by electroforming, no stains, and no scratches.
実施例−２
鏡直研磨し几直径２００鴎、内径１０＆ｌ、厚さ６目の
ガラス原盤をＢＳＡ（ビス７セト７シド）のボイリング
蒸気中にさちし乾燥して表面処理し定径、マグネトロン
スパッタ装置中にセットし、該ガラス原盤の内周上面で
、内径１０〜４０鶴の範囲だ、第３図に示すマスクを使
用し、クロムを直流スパークする。この時のクロム膜厚
Ｖｉ３０〜４０λである。Example-2 A glass master disk with a diameter of 200 mm, an inner diameter of 10 mm, and a thickness of 6 mm was directly polished by mirror, placed in boiling steam of BSA (Bis 7 Set 7 Sid), dried, surface treated, fixed diameter, and magnetron sputtered. It is set in the apparatus, and chromium is sparked with direct current on the upper surface of the inner periphery of the glass master using a mask shown in FIG. 3 with an inner diameter in the range of 10 to 40 mm. At this time, the chromium film thickness Vi is 30 to 40λ.
次に、ポジ型フォトレジストＡＺ−１３５０（米国シラ
プレー社製）をスピンコータで８５０大の厚さにコート
シ、レーザカッティングマシンによって、レーザ光を照
射し、巾α８Ｒ、ピッチ１６μｍでスパイラル状に感光
させｔ後現像して深さ８５０人、巾０．８μｍ、ピッチ
１．６μｍの溝を有するガラス原盤とする。なおこの時
前記クロム層上のレジストも除去し、クロム層を表面に
露出させろ。Next, a positive photoresist AZ-1350 (manufactured by Silapray, Inc., USA) was coated with a spin coater to a thickness of 850mm, and a laser beam was irradiated with a laser cutting machine to expose it in a spiral shape with a width α8R and a pitch 16μm. After development, a glass master disk having grooves with a depth of 850 mm, a width of 0.8 μm, and a pitch of 1.6 μm is obtained. At this time, also remove the resist on the chromium layer to expose the chromium layer to the surface.
該ガラス原盤をマグネトロンスパッタ装置にセヅトし、
ニッケルを１０００￥直流スパヴタする。The glass master disk is placed in a magnetron sputtering device,
1000 yen DC spavta of nickel.
かかる導体化処理を施したガラス原盤を、１５重４ｔ％
のスルファミン酸溶液で処理した後、スルファミン酸ニ
ッケル（四水和物） ａｓａＥ／ｌ 、 塩化ニッケル
（六水和物）５１１／ｌ、はう酸４０ ｇ／ｌ、ビット
防止剤ｏ、 ５ ｊｉｌｌ からなる浴中に、電解ニッ
ケルペレットを添加１．電鋳を行な５゜
ガラス原盤のセットは実施例１と同様に行ない浴温け５
０℃、通電電流け（Ｌ １ ｋ／ｄｍ”からスタートし
、１０分後に１ｏ Ａ／ｄｍ２．２０分後に２０ Ａ／
ｄｍ”、３０分後に４０ ｋ／ｄｍ”になる様直線的に
増加させ念。The glass master disk that has been subjected to such conductive treatment is
After treatment with a sulfamic acid solution of nickel sulfamate (tetrahydrate) asaE/l, nickel chloride (hexahydrate) 511/l, oxalic acid 40 g/l, bit inhibitor o, 5 jill. 1. Add electrolytic nickel pellets to the bath. Perform electroforming and set the 5° glass master in the same manner as in Example 1.
Start at 0℃, current applied (L 1 k/dm), 1o A/dm2 after 10 minutes, 20 A/dm after 20 minutes.
dm", increase linearly to 40 k/dm after 30 minutes.
約１．５時間で厚さα３鶴のスタンパｈｔ得られシシ、
キズの無い槙めて良好な品質であっ次。In about 1.5 hours, a stamper with a thickness of α3 was obtained.
It is of good quality with no scratches.
実施例−３
鏡面研磨した直径２００ ｕｇ、内径１０＋＋＊、厚さ
６Ｉのガラス原盤をＨＭＤＳ（へ千すメチルジシラナザ
ン）の雰囲気中にさらして乾燥し表面処理した後、マグ
ネトロンスパッタ装置中にセットし、該ガラス原盤の外
周上面で周縁から約５０の範囲に第４図に示すマスクを
使用し、クロムを直流スバνりする。この時のクロム嘆
厚は１００〜１２０λである。Example 3 A mirror-polished glass master disk with a diameter of 200 ug, an inner diameter of 10++*, and a thickness of 6I was exposed to an atmosphere of HMDS (Hesensu methyldisilanazan), dried, and surface-treated, and then placed in a magnetron sputtering device. Then, using the mask shown in FIG. 4, chromium was applied by direct current coating on the upper surface of the outer periphery of the glass master disk in a range of about 50 mm from the periphery. The thickness of the chrome at this time is 100 to 120λ.
次に１ポジ型フォトレジストＡＺ−１３５０（米国シラ
プレー社製）をスピンコータで７００人の厚さにコート
シ、レーザカッティングマシンニヨって、レーザ光を照
射し、巾Ｑ、８μｍ、ピッチ２４５μｍでスパイラル状
に感光させｔ後現偉して、深さ７００λ、巾０．８μｍ
、ピッチ２．５Ｒの溝を有するガラス原盤とする。なお
この時前記クロム層上のレジストも除去し、クロム層を
表面に露出させる。Next, a 1-positive type photoresist AZ-1350 (manufactured by Silaplay, Inc., USA) was coated with a spin coater to a thickness of 700 mm, and a laser beam was irradiated with a laser cutting machine to form a spiral shape with a width Q of 8 μm and a pitch of 245 μm. After exposing it to light, it was exposed to a depth of 700λ and a width of 0.8μm.
, a glass master disk having grooves with a pitch of 2.5R. At this time, the resist on the chromium layer is also removed to expose the chromium layer on the surface.
該ガラス原盤をマグネトロンスパッタ装置にセットし、
ニッケルを７００λ直流スパツタする。Set the glass master disk in a magnetron sputtering device,
Sputter nickel at 700λ DC.
かかる導体化処理を施したガラス原盤を、スルファミン
酸ニッケル浴中で電鋳を行なう。The glass master disk that has been subjected to the conductive treatment is subjected to electroforming in a nickel sulfamate bath.
第５図はこの時のガラス原盤のセット状況を示すｉ！ｌ
Ｉｆ図で、１１けガラス、１２けクロム層、１３はフォ
トレジスト、１４けニッケル層、１５は１翫治具、１６
Ｆｉガラス原盤の中心線である。Figure 5 shows the setting status of the glass master disc at this time. l
In the If diagram, 11 is glass, 12 is chromium layer, 13 is photoresist, 14 is nickel layer, 15 is 1 rod jig, 16 is
This is the center line of the Fi glass master disc.
浴温け５５℃、ニッケル濃ｆは５００．ｊ７／ｌ、通電
電流はαＩ Ａ ／ ｄｍ”からスタートし、２０分後
に、２０ Ａ／ｄｍ”、３０分後型Ｃ４０ｋ／ｄｍ”に
なる様直線的に増加させ念。Bath temperature: 55℃, nickel concentration f: 500. j7/l, the current to be applied starts from αI A/dm", increases linearly to 20 A/dm" after 20 minutes, and to C40k/dm" after 30 minutes.
約１．５時間で厚さ０．３ｍのスタンパが得られ、電鋳
工種における嗅浮きもなく、シミ、キズ等の無い良好な
品質であっ之。A stamper with a thickness of 0.3 m was obtained in about 1.5 hours, and was of good quality with no odor and no stains or scratches in the electroformed type.
実施例−４
伸直研磨した直径２００ｗ５．内径１０報、厚さ６１の
ガラス原盤をＢＳｊ（ビス７セトアシド）のボイリング
蒸気中にさらし乾燥して′ｆＩ面処理した後、マグネト
ロンスパッタ装置中にセットし、第６図に示すマスクを
使用し、該ガラス原盤の外周上面で周縁から５鶴の範囲
に、クロムを直流スパッタする。この時のクロム１厚は
８０〜１００λである。Example-4 Straight polished diameter 200w5. A glass master disk with an inner diameter of 10 mm and a thickness of 61 mm was exposed to boiling steam of BSj (bis 7 setacid), dried, and subjected to 'fI surface treatment, and then set in a magnetron sputtering device, using the mask shown in Fig. 6. , Direct-current sputtering of chromium is performed on the upper surface of the outer periphery of the glass master disk within a range of five points from the periphery. The thickness of chromium 1 at this time is 80 to 100λ.
次に、ポジ型フォトレジストＡＺ−１３５０（米国シラ
プレー社製）をスピンコータで８５０１の厚すテコート
シ、レーザカッティングマシンだよって、レーザ光を照
射し、巾１８μｍ１ ピッチ１６μｍでスパイラル状に
感光させｔ後現像して、深さａｓｏ Ｘ、巾［１８μ常
、ピッチｔ６μｍの溝を有するガラス原盤とする。なお
この時前記クロム層上のレジストも除去し、クロム層を
表面に露出させる。Next, a positive photoresist AZ-1350 (manufactured by Silapray, Inc., USA) was coated with a spin coater to a thickness of 8501, and then exposed to a spiral pattern with a width of 18 μm and a pitch of 16 μm using a laser cutting machine, and then developed. A glass master disk having grooves with a depth aso At this time, the resist on the chromium layer is also removed to expose the chromium layer on the surface.
絞ガラス原盤なマグネトロンスパッタ装置にセットし、
ニッケルを７００１直流スパヴタする。Set it on a magnetron sputtering device that is a squeezed glass master,
Nickel is passed through a 7001 DC spavter.
かかる導体化処理を施し之ガラス原盤を、２０重号係の
スルファミン酸溶液で処理し几後、スルファミン酸ニッ
ケル（四水和物）５００ ｇ／ｌ、塩化ニッケル（六水
和物） ７ ｊｉｌｌ 、はう酸４０１／ｌ、ピット防
止剤１５ ｊｉｌｌからなる浴中に、電解ニッケルペレ
ットを添加し電鋳を行なう。The glass master disk subjected to such a conductive treatment was treated with a sulfamic acid solution of No. 20, and after cooling, 500 g/l of nickel sulfamate (tetrahydrate), 7 g/l of nickel chloride (hexahydrate), Electrolytic nickel pellets were added to a bath consisting of 40 l/l of phosphoric acid and 15 g/l of a pit inhibitor, and electroforming was performed.
ガラス原盤のセットは実施例３と同様に行ない浴温け６
０℃、通電電流けαＩ ＡＪ’ｄｍ”からスタートし、
１０分後型 １０ ｐｖ’ｄｍ”、２０分後に２０ ｋ
／ｄｍ”、４０分後に４０ ｐ、／ｄｍ２になる様直線
的に増加させ念。The glass master was set in the same manner as in Example 3, and heated in the bath 6.
Starting from 0°C and current flow αI AJ'dm,
Type 10 pv'dm” after 10 minutes, 20 k after 20 minutes
/dm", increase linearly to 40 p, /dm2 after 40 minutes.
約２時間で厚さＱ、３ｗｓのスタンパが得られ、シミ、
キズの無い極めて良好な品質であっ之。A stamper with a thickness of Q and 3ws was obtained in about 2 hours, and the stains and
It is of extremely good quality with no scratches.
かくして得られ比、前記スタンパを直径１５０ｕ、厚さ
ｔ２鶴のポリカーボネート樹脂のディスクの射出成形に
使用し友ところ、実施例１〜４のいずれのスタンパも５
００シヨツト目と５０００シ１ット目のディスクに卦い
て、薄膜段差計の測定による有為
意ｆ＠は殆んど見られず、置市状態も良好でもつ次。The thus obtained stamper was used for injection molding of a polycarbonate resin disk with a diameter of 150 u and a thickness of t2.
Regarding the disks at the 00th shot and the 1st shot at the 5000th shot, there was hardly any significant f@ as measured by the thin film level difference meter, and the condition of the discs was good.
以上詳述した如く、本発明によれば、作間研磨されｔガ
ラス原盤を、シランカップリング剤で表置処理し、フォ
トレジストを塗布し念後、信号としての凹凸パターンを
レーザ光の照射により形成し１次いで導体化処理を行な
っｔ後、ニッケル電鋳を行なうスタンパの製造において
、該ガラス原盤をシランカップリング剤で表１面処理し
友後、該レーザ光の非照射部にクロムを部分的にスパッ
タし、次いでフォトレジストを塗布してレーザ光により
凹凸パターンを形成する際に、該クロム層を表面に露出
せしめ、導体化処理を行なつ７を後二・ノケル電鋳を行
なう事により、表面にシミやモズの無いスタンパが得ら
れ、光情報記録媒体用サブスト１ノートの品質向上に顕
著な効果を有する。As detailed above, according to the present invention, a polished T-glass master disk is subjected to surface treatment with a silane coupling agent, coated with a photoresist, and then a concavo-convex pattern as a signal is formed by irradiation with a laser beam. In the production of a stamper in which nickel electroforming is performed after forming and conducting a conductor treatment, the glass master is treated on one surface with a silane coupling agent, and then a portion of chromium is added to the non-irradiated area of the laser beam. Then, when applying photoresist and forming a concavo-convex pattern with a laser beam, the chromium layer is exposed on the surface and subjected to conductive treatment.After step 7, Nokel electroforming is performed. , a stamper without stains or moss on the surface can be obtained, which has a remarkable effect on improving the quality of subst 1 notes for optical information recording media.
なお本発明の基本的な主旨は、レーザ光の非照射部に部
分的にクロムをスパッタする工程にあり全面的にクロム
をスパッタすると、スタンパの剥離時にガラス原盤のガ
ラス材を同時に剥離することがあり、ガラス原盤が再利
用できない事がある為、実施例にあげ念外観形状のマス
クを利用してのスパッタｈ″−有効である。The basic gist of the present invention is a process in which chromium is sputtered partially on areas that are not irradiated with laser light.If chromium is sputtered over the entire surface, the glass material of the glass master disk can be peeled off at the same time as the stamper is peeled off. Since there are cases where the glass master cannot be reused, it is effective to sputter using a mask with a virtual external shape as shown in the embodiment.
なお実施例中では、シランカップリング剤として！（Ｍ
ＤＳ、 Ｂ Ｓ Ａの場合を例にあげて説明し７ｔが他
のシランカップリング剤でも可能であり、フォトレジス
トとしてはポジ型のＡ Ｚ −１３５０を例にあげて説
明し２ ｂＺ、他のポジ型フォトレジスト、あるいけネ
ガ型フォトレジストでも可能である。In the examples, it is used as a silane coupling agent! (M
The case of DS, BSA will be explained as an example, and 7t can also be used with other silane coupling agents, and as a photoresist, positive type AZ-1350 will be explained as an example. It is also possible to use a positive photoresist or a negative photoresist.
又、導体化処理の手段として、本実施例でａ＝ニッケル
スパッタする場合を例にあげて説明し九が参考文献中に
記述されている如く、無電解メツキあるいは銀鏡反応等
の手段でも可能であり、更にニッケル電鋳の条件は、本
実施例の浴組成、浴温通電条件以外でも充分その効果が
発揮され、良好なスタンパカー得られ比ゆIn addition, as a means of conductive treatment, methods such as electroless plating or silver mirror reaction can also be used, as described in the reference literature (9), using the case where a = nickel sputtering is used as an example in this embodiment. Moreover, the nickel electroforming conditions were sufficient even under the bath composition and bath temperature energization conditions of this example, and a good stamper could be obtained.
第１図は本発明の実施例におけるークロムスノ（ツタ用
マスクの外観図。
第２図は本発明の実施例における、導体化処理剤のガラ
ス原盤に電鋳を行なう時の、ガラス原盤のセット状況を
示す断面図。
第３図は本発明の他の実施例における、クロムスパッタ
用マスクの外観図。
第４図は本発明の更に他の実施例における、クロムスパ
ッタ用マスクの外観図。
第５図は本発明の更に他の実施例における、導体化処理
剤のガラス原盤に電鋳を行なう時の、ガラス原盤のセッ
ト状況を示す断面図。
第６図は本発明の別の実施例における、クロムスパッタ
用マスクの外観図である。
以 上Fig. 1 is an external view of a mask for chrome ivy in an embodiment of the present invention. Fig. 2 is a setting situation of a glass master when electroforming a conductive treatment agent on a glass master in an embodiment of the present invention. 3 is an external view of a chrome sputtering mask in another embodiment of the present invention. FIG. 4 is an external view of a chrome sputtering mask in still another embodiment of the present invention. The figure is a cross-sectional view showing the setting situation of the glass master disk when electroforming the glass master disk of the conductive treatment agent in still another embodiment of the present invention. This is an external view of a mask for chrome sputtering.
Claims (1)
表面処理し、フォトレジストを塗布した後、信号として
の凹凸パターンをレーザ光の照射により形成し、次いで
導体化処理を行なった後、ニッケル電鋳を行なうスタン
パの製造方法において、該ガラス原盤をシランカップリ
ング剤で表面処理した後、該レーザ光の非照射部にクロ
ムを部分的にスパッタし、次いでフォトレジストを塗布
してレーザ光により凹凸パターンを形成する際に該クロ
ム層を表面に露出せしめ、導体化処理を行なった後ニッ
ケル電鋳を行なう事を特徴とするスタンパの製造方法。After surface-treating the mirror-polished glass master disc with a silane coupling agent and coating it with photoresist, a concavo-convex pattern as a signal is formed by irradiation with laser light, and then conductive treatment is performed, followed by nickel electroforming. In the method for manufacturing a stamper, the surface of the glass master is treated with a silane coupling agent, chromium is partially sputtered on the areas not irradiated with the laser beam, and then a photoresist is applied and a concavo-convex pattern is formed using the laser beam. 1. A method for manufacturing a stamper, which comprises exposing the chromium layer to the surface, performing conductor treatment, and then performing nickel electroforming.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18556286A JPS6342049A (en) | 1986-08-07 | 1986-08-07 | Manufacture of stamper |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18556286A JPS6342049A (en) | 1986-08-07 | 1986-08-07 | Manufacture of stamper |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6342049A true JPS6342049A (en) | 1988-02-23 |
Family
ID=16172979
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18556286A Pending JPS6342049A (en) | 1986-08-07 | 1986-08-07 | Manufacture of stamper |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6342049A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02120583U (en) * | 1989-03-08 | 1990-09-28 | ||
| JPH09177462A (en) * | 1995-12-28 | 1997-07-08 | Seiko Kogyo Kk | Method to drill sediment layer and bedrock and device to drill sediment layer and bedrock |
-
1986
- 1986-08-07 JP JP18556286A patent/JPS6342049A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02120583U (en) * | 1989-03-08 | 1990-09-28 | ||
| JPH09177462A (en) * | 1995-12-28 | 1997-07-08 | Seiko Kogyo Kk | Method to drill sediment layer and bedrock and device to drill sediment layer and bedrock |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH0533181A (en) | Master disk holder for tamper electrocasting device and electrocasting method | |
| CN1056937C (en) | A method of manufacturing a matrix for producing optical disks without the medium of a master | |
| JPS6342049A (en) | Manufacture of stamper | |
| JPS6364649A (en) | Manufacture of stamper | |
| JPH0337842A (en) | Production of stamper for information recording medium | |
| JPH0118996B2 (en) | ||
| JPS59193560A (en) | Stamper for rotary recording medium and its manufacture | |
| JPH052779A (en) | Production of stamper | |
| JPH10312585A (en) | Stamper for manufacturing optical recording medium, master for stamper and manufacture of optical recording medium | |
| JPH04259936A (en) | Production of stamper for producing information recording medium | |
| JPS6339162A (en) | Production of stamper | |
| JPS60182031A (en) | Information recording mother disk and its production | |
| JPH0250995A (en) | Production of stamper for duplicating optical disk | |
| JPH052778A (en) | Electrocasting device and production of stamper by using this device | |
| JPS63105986A (en) | Production of stamper for optical disk | |
| JPH0273987A (en) | Method for duplicating stamper | |
| JP2683118B2 (en) | Method for manufacturing stamper for optical disk duplication | |
| JPS63147577A (en) | Production of stamper | |
| JPS62214532A (en) | Production of stamper | |
| JPH03291392A (en) | Method for electroforming electroformed master disk and electroformed master disk | |
| JP2764457B2 (en) | Information recording stamper | |
| JPS61221392A (en) | Stamper | |
| JP2517161B2 (en) | Optical disc master and master stamper manufacturing method | |
| JPH036390A (en) | Production of stamper for forming information recording medium | |
| JPH02303819A (en) | Preparation of stamper for optical recording medium |