JPS61221392A - Stamper - Google Patents

Stamper

Info

Publication number
JPS61221392A
JPS61221392A JP6183285A JP6183285A JPS61221392A JP S61221392 A JPS61221392 A JP S61221392A JP 6183285 A JP6183285 A JP 6183285A JP 6183285 A JP6183285 A JP 6183285A JP S61221392 A JPS61221392 A JP S61221392A
Authority
JP
Japan
Prior art keywords
stamper
film
electroforming
thickness
master
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6183285A
Other languages
Japanese (ja)
Inventor
Osamu Sasaki
修 佐々木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP6183285A priority Critical patent/JPS61221392A/en
Publication of JPS61221392A publication Critical patent/JPS61221392A/en
Pending legal-status Critical Current

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  • Moulds For Moulding Plastics Or The Like (AREA)

Abstract

PURPOSE:To provide a stamper which has excellent durability in the stage of reproduction and permits easy working by forming the 1st electroforming Ni film having a specific thickness on a substrate by using an insoluble electrode then forming the 2nd electroforming Ni film having a prescribed thickness thereon by using a soluble electrode. CONSTITUTION:The electroforming Ni film is formed on the master disk having a fine pattern by using the insoluble electrode in an Ni bath and is stripped to form a mother stamper. The surface of the mother stamper is subjected to a treatment for accelerating stripping and thereafter the 1st electroforming Ni film is formed thereon to 1-10mum thickness by an electroforming device for which the insoluble electrode is used. The 2nd electroforming Ni film is then formed thereon to about 250mum thickness by an electroforming device for which the soluble electrode made of granular Ni is used. The film is stripped from the mother stamper and a stamper for forming an optical disk, etc. is obtd. The durability of the stamper is improved and the drawing property is improved by the formation of two layers of the Ni films.

Description

【発明の詳細な説明】 〔発明の技術分野〕 本発明は、原盤に記録された微細パターンを転写して原
盤の複製を製作する際に用いるスタンパ−に関する。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a stamper used when producing a copy of a master by transferring a fine pattern recorded on the master.

〔発明の技術的背景とその問題点〕[Technical background of the invention and its problems]

従来より例えばレコード盤の製造工程において、スタン
パ−と呼ばれる薄型円盤状金属板が用−られることはよ
く知られている。このようなスタンパ−は次のような工
程で作られている。
It is well known that a thin disc-shaped metal plate called a stamper is used in the manufacturing process of, for example, record discs. Such a stamper is made by the following process.

まずう、カー板に針を用いて溝状にパターンを刻設して
原盤をつくる。次にこの原盤に銀鏡反応等によシ導電層
を設けた後、厚さ200〜300μmoニッケルめっき
を施し、剥離したニッケルatマスタースタンパ−とす
る。このマスタースタンパ−を用いて複製ヲ製作しても
良いが、原盤からこのマスタースタンパ−は1枚しかと
れず、そのため1cli1作される複製の数が限られて
しまう。よって通常は、このマスター表面に剥離始f!
!!を施した上でニッケルめっきを施し、それから剥離
したニッケル膜よりなるマザースタンパーラ複数作製し
、さらにこのマザースタンパ−表面に剥離処理を施した
後ニッケルめっきを施して、これよう得られたニッケル
膜を複製の製作の念めのスタンパ−としていた。
First, a master disc is created by carving a pattern in the form of grooves on a car board using a needle. Next, a conductive layer is provided on this master by silver mirror reaction or the like, and then nickel plating is applied to a thickness of 200 to 300 μm to form a peeled nickel at master stamper. Although it is possible to make copies using this master stamper, only one copy of this master stamper can be taken from the master, which limits the number of copies that can be made in one climat. Therefore, peeling usually begins on this master surface f!
! ! Then, a plurality of mother stampers made of the peeled nickel film were prepared, and the surface of the mother stamper was subjected to peeling treatment, and then nickel plating was applied to the nickel film thus obtained. was used as a stamper to make a copy.

またこれに対し記録をよシ高密度化させる目的で、例え
ば硝子板に塗布した感光性樹脂膜に光学的エツチングを
施すことによシ微細パターンを刻設した原盤が知られて
いる。この原盤からも、上述したのと同様にしてスタン
パ−が得られる。
On the other hand, for the purpose of increasing the recording density, master discs are known in which fine patterns are engraved by optically etching a photosensitive resin film coated on a glass plate, for example. A stamper can also be obtained from this master in the same manner as described above.

そしてこのようにして得られたスタンパ−を金型にして
、インジェクション成形あるいはコンプレ、ジョン成形
によシ原盤に記録された微細パターンが表面に転写され
た複製を製作していた。
The stamper thus obtained was used as a mold to produce a replica in which the fine pattern recorded on the master was transferred onto the surface by injection molding, compression molding, or John molding.

このような従来の電鋳によるスタンパ−の製造過程では
、電鋳を施す際に陽極に溶解溶極を用いていたため、得
られるスタンパ−の表面硬度が約20 QHv  と低
く、高い耐久性が望めず、少数の複製しか製作できなか
った。
In the conventional manufacturing process of stampers using electroforming, a molten electrode was used as an anode during electroforming, so the surface hardness of the resulting stamper was as low as about 20 QHv, and high durability was expected. However, only a small number of copies were made.

このために例えばレコード盤の複製に用いられるスタン
パ−では、表面にクロムめっきを施すことにより表面硬
度を上げることが行なわれてきたが、この方法も、光学
ディスク等のように信号パターンが微細になった場合等
では、そのスタンパ−表面に施されたクロムめっきによ
りパターンが損なわれるという問題点を有していた。
For this reason, for example, in stampers used for copying records, the surface hardness has been increased by applying chromium plating to the surface, but this method also applies when the signal pattern is fine, such as on optical discs. In such cases, there is a problem in that the pattern is damaged by the chromium plating applied to the surface of the stamper.

またこうした問題に対して特公昭 58−157984
号においては、陽極に不溶解陽極を用いてめっきを施す
ことによシスタンパ−の表面硬度を約500Hvにする
ことができる旨の開示がなされている。しかしながらこ
の方法により形成されたスタンパ−は、複製の製作時に
なされる絞り加工等によりフォーミングして使用する場
合の加工が困難であバこの加工時にスタンパ−にき裂が
生じやすいという新たな問題が発生した。
In addition, in response to these issues,
No. 6, No. 2003-11-103, discloses that the surface hardness of the cis-stamper can be made approximately 500 Hv by plating the anode using an insoluble anode. However, the stamper formed by this method is difficult to form when used by drawing, etc., which is performed during the production of copies, and a new problem arises in that the stamper is prone to cracking during stamping. Occurred.

〔発明の目的〕[Purpose of the invention]

本発明の目的は、複製時の耐久性に優れ、かつ外形加工
が容易なスタンパ−を提供することにある。
An object of the present invention is to provide a stamper that has excellent durability during duplication and is easy to shape.

〔発明の概要〕[Summary of the invention]

本発明に係るスタンパ−は、まずニッケル浴中で不溶解
陽極を用いて形成された原盤に1μm 以上10μm未
満の厚さの第1の1!鋳ニッケル膜と、ついでニッケル
溶中で溶解陽極を用いて前記第1の電鋳ニッケル膜上に
形成された第2の電鋳ニッケル膜を有することを特徴と
している。
The stamper according to the present invention first has a first stamper having a thickness of 1 μm or more and less than 10 μm on a master formed using an insoluble anode in a nickel bath. It is characterized by having a cast nickel film and a second electroformed nickel film formed on the first electroformed nickel film using a molten anode in a nickel melt.

第1図に本発明に係るスタンパ−の−例の断面模式図を
示した。図で、1は不溶解陽極を用いて形成した第1の
電鋳ニッケル膜であう、2は溶解陽極を用いて形成した
第2の電鋳ニッケル膜である。また、3はスタンパ−表
面に形成された微細パターンである。このように本発明
に係るスタンパ−はそれぞれが異なる特性全有した膜を
有しており、これら二層の膜の相乗効果で耐久性及び加
工性を有したスタンパ−としている。
FIG. 1 shows a schematic cross-sectional view of an example of a stamper according to the present invention. In the figure, 1 is a first electroformed nickel film formed using an insoluble anode, and 2 is a second electroformed nickel film formed using a molten anode. Further, 3 is a fine pattern formed on the surface of the stamper. As described above, the stamper according to the present invention has films each having different characteristics, and the synergistic effect of these two layers of films provides a stamper with durability and workability.

ここで用いられる不溶解陽極の一例としてはニッケル板
に金あるいは白金を被覆したものやチタン板に金あるい
は白金を被覆したもの等があげられる。また溶解陽極の
一例としては粒状のニッケルあるいは板状のニッケル等
があげられる。さらにニッケル溶としては、応力が少な
い膜を析出させることができるスルファミン酸ニッケル
溶を選択することが望ましい。
Examples of insoluble anodes used here include a nickel plate coated with gold or platinum, and a titanium plate coated with gold or platinum. Examples of the melted anode include granular nickel or plate-shaped nickel. Further, as the nickel solution, it is desirable to select a nickel sulfamate solution that can deposit a film with low stress.

また本発明において、不溶解陽極を用いて形成した第1
の電鋳ニッケル膜の厚さを1μm以上10μm未満と規
定したのは次の理由による。すなわち第1の電鋳ニッケ
ル膜の厚さとスタンパ−の耐久性の指標となるスタンパ
−ライフ(複製可能な回数)との関係を表わした第2図
の特性図に示したように、第1の電鋳ニッケル膜の厚さ
が1μm未満の場合では、表面硬度が低くなシ、スタン
パ−の耐久性の向上の効果が充分に得られないからであ
る。
In addition, in the present invention, the first
The reason why the thickness of the electroformed nickel film was defined as 1 μm or more and less than 10 μm is as follows. That is, as shown in the characteristic diagram of Fig. 2, which shows the relationship between the thickness of the first electroformed nickel film and the stamper life (the number of times it can be replicated), which is an index of the durability of the stamper, This is because if the thickness of the electroformed nickel film is less than 1 μm, the surface hardness will be low and the effect of improving the durability of the stamper will not be sufficiently achieved.

そして第1の電鋳ニッケル膜の厚さが10μm以上の場
合では、絞シ加工性が問題となるからである。
This is because when the thickness of the first electroformed nickel film is 10 μm or more, drawing workability becomes a problem.

以下に実施例を示して、本発明をさらに詳細に説明する
EXAMPLES The present invention will be explained in more detail with reference to Examples below.

〔発明の実施例〕[Embodiments of the invention]

ガラス板に塗布した感光性樹脂膜に光学的工、チングを
施して微細パターンを刻設した原盤に、真空スバ、り装
置により300A乃至600Aの銀層を形成して、原盤
のパターン面に導電性を付与した。ついで、陽極として
チタン板に白金を被覆した不溶解陽極を用いた1!鋳装
置の回転陰極に、この原盤をパターン面t−11出面と
するように取付けた。この原盤をニッケル浴中で約10
ORP Mで回転させながら、約250μmの厚さまで
ニッケル電鋳膜を形成した後、原盤から剥離することに
よ飢表面に銀を付着した電鋳ニッケル膜が、光学ディス
ク形成用マスク・スタンバ−として得られた。
A 300A to 600A silver layer is formed on the master disk using a vacuum polishing device to form a conductive layer on the patterned surface of the master disk. gave gender. Next, an insoluble anode consisting of a titanium plate coated with platinum was used as an anode. This master disk was attached to the rotating cathode of a casting device so that the pattern surface t-11 was the exit surface. This master was placed in a nickel bath for about 10 minutes.
While rotating with the ORP M, an electroformed nickel film is formed to a thickness of about 250 μm, and then peeled off from the master, and the electroformed nickel film with silver attached to the surface is used as a mask/stambar for forming optical discs. Obtained.

ついでこのマスク・スタンバ−の表面を重クロム酸カリ
ウム溶液(5wt%)で剥離促進処理した後、該表面に
前記と同様にして電鋳ニッケル膜を形成し、その後マス
ク・スタンバ−から剥離してマザー・スタンバ−を形成
した。
Next, the surface of this mask/stambar was treated with a potassium dichromate solution (5 wt%) to promote peeling, and then an electroformed nickel film was formed on the surface in the same manner as above, and then it was peeled off from the mask/stambar. Formed a mother stanbar.

次にマザー・スタンバ−の表面に重クロム酸カリウム溶
液(5wt%)で剥離促進処理を施した後、前記と同様
にして、不溶解陽極を用いた電鋳装置で約5μmの厚さ
まで第1の電鋳ニッケル膜を形成した。
Next, the surface of the mother stanbar was treated with a potassium dichromate solution (5 wt%) to promote peeling, and then the same process as described above was performed using an electroforming machine using an insoluble anode to form the first layer to a thickness of approximately 5 μm. An electroformed nickel film was formed.

ついで粒状ニッケル製の溶解陽極を用いた[鋳装置で約
250μmの厚さまで第2のt鋳ニッケル膜を形成し、
マザー・スタンバ−より剥離して、光学ディスク形成用
スタンバ−を得な。
Next, a second cast nickel film was formed to a thickness of about 250 μm in a casting device using a molten anode made of granular nickel,
Peel it off from the mother stanbar to obtain a stanbar for forming an optical disc.

ここで用いたニッケル溶は、スルファミン酸ニッケル6
001/11 、ホウ酸40P/λとビット防止剤ナイ
スター806 (上材工業■製:商品名) 1m1./
it  とから構成されている。
The nickel solution used here was nickel sulfamate 6
001/11, boric acid 40P/λ and bit inhibitor Nystar 806 (manufactured by Uezai Kogyo ■: trade name) 1m1. /
It is composed of.

このスタンバ−を用いて、アクリル樹脂(三菱レーヨン
■製の5−35を用いた)をインジェクション成形して
複製を作製し、これに反射膜としてアルミを微細パター
ン転写面に蒸着して光学式ビデオディスクを作製したそ
の時のスタンバ−の表面硬度、スタンバ−ライフとスタ
ンバ−の絞り加工性を表に示した。また比較例1として
実施例と同様にして作製したマザー・スタンバ−に、重
りoA酸カリウムで剥離促進処理を施し、溶解陽極を用
いた1!鋳装鴬て約250μmの厚さまで第2の電鋳ニ
ッケル膜だけを形成し、マザー・スタンバ−よシ剥離し
てスタンバ−を得た。さらに比較例2として比較例1の
溶解陽極にかえ、不溶解陽極を用いた電鋳装置によシ第
1の電鋳ニッケル膜だけからなるスタンバ−を同様に評
価し次表に示した。
Using this stanbar, we made a replica by injection molding acrylic resin (using 5-35 manufactured by Mitsubishi Rayon ■), and deposited aluminum as a reflective film on the fine pattern transfer surface to create an optical video. The table shows the surface hardness, stambar life, and drawability of the stambar at the time the disk was manufactured. In addition, as Comparative Example 1, a mother stanbar prepared in the same manner as in the example was treated with a weight of potassium oA acid to promote peeling, and a dissolving anode was used. After casting, only the second electroformed nickel film was formed to a thickness of about 250 μm, and then peeled off from the mother stanbar to obtain a stanbar. Furthermore, as Comparative Example 2, a stand bar made of only the first electroformed nickel film was similarly evaluated using an electroforming apparatus using an insoluble anode instead of the molten anode of Comparative Example 1, and the results are shown in the following table.

表 この表よシ、比較例1に比べて実施例では表面硬度が約
3倍増加しておシ、そのためスタンバ−ライフも3倍以
上に増加していることが判る。また絞り加工性も比較例
2に比べ改善されていることが判る。
This table shows that the surface hardness of the Example is increased by about 3 times compared to Comparative Example 1, and therefore the stand-bar life is also increased by more than 3 times. It can also be seen that the drawability is improved compared to Comparative Example 2.

〔発明の効果〕〔Effect of the invention〕

以上のように本発明のスタンバ−は、二層のそれぞれ異
なった第1及び第2の電鋳二。
As described above, the stambar of the present invention has two different electroformed layers, the first and second layers.

ケル膜を有することにより、スタンバ−の耐久性の向上
がはかれかつ絞り加工性を改善することができる。
By having the Kel film, the durability of the stambar can be improved and the drawability can be improved.

【図面の簡単な説明】 第1図は本発明のスタンバ−の断面模式図第2図は本発
明のスタンバ−の第1のt@ニッケル膜の厚さとスタン
バ−ライフとの関係を表わした特性図である。 1・・・ 不溶解陽極を用いて形成された第1の電鋳ニ
ッケル膜 2・・・ 溶解陽極を用いて形成された第2の電鋳ニッ
ケル膜 3・・ 微細パターン
[Brief Description of the Drawings] Figure 1 is a schematic cross-sectional view of the stubber of the present invention. Figure 2 is a characteristic showing the relationship between the thickness of the first t@nickel film and the stubber life of the stubber of the present invention. It is a diagram. 1... First electroformed nickel film formed using an insoluble anode 2... Second electroformed nickel film 3 formed using a molten anode... Fine pattern

Claims (1)

【特許請求の範囲】 原盤に記録された微細パターンを転写して複製を製作す
る際に用いるスタンパーにおいて、ニッケル溶中で不溶
解陽極を用いて1μm以上10μm未満の厚さに形成さ
れた第1の電鋳ニッケル膜と、 前記第1の電鋳ニッケル膜上に溶解陽極を用いて形成さ
れた第2の電鋳ニッケル膜とを有することを特徴とする
スタンパー。
[Claims] In a stamper used to transfer a fine pattern recorded on a master to produce a copy, the first stamper is formed to have a thickness of 1 μm or more and less than 10 μm using an insoluble anode in nickel melt. A stamper comprising: an electroformed nickel film; and a second electroformed nickel film formed on the first electroformed nickel film using a melting anode.
JP6183285A 1985-03-28 1985-03-28 Stamper Pending JPS61221392A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6183285A JPS61221392A (en) 1985-03-28 1985-03-28 Stamper

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6183285A JPS61221392A (en) 1985-03-28 1985-03-28 Stamper

Publications (1)

Publication Number Publication Date
JPS61221392A true JPS61221392A (en) 1986-10-01

Family

ID=13182460

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6183285A Pending JPS61221392A (en) 1985-03-28 1985-03-28 Stamper

Country Status (1)

Country Link
JP (1) JPS61221392A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5071597A (en) * 1989-06-02 1991-12-10 American Bank Note Holographics, Inc. Plastic molding of articles including a hologram or other microstructure
US5227897A (en) * 1990-05-04 1993-07-13 Fohrman Scott R Reproduction of holograms
JP2008028368A (en) * 2006-07-18 2008-02-07 Samsung Electro-Mechanics Co Ltd Production method of printed circuit board

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5071597A (en) * 1989-06-02 1991-12-10 American Bank Note Holographics, Inc. Plastic molding of articles including a hologram or other microstructure
US5227897A (en) * 1990-05-04 1993-07-13 Fohrman Scott R Reproduction of holograms
JP2008028368A (en) * 2006-07-18 2008-02-07 Samsung Electro-Mechanics Co Ltd Production method of printed circuit board
US7653990B2 (en) 2006-07-18 2010-02-02 Samsung Electro-Mechanics Co., Ltd. Manufacturing method of printed circuit board using an ink jet
JP4486660B2 (en) * 2006-07-18 2010-06-23 サムソン エレクトロ−メカニックス カンパニーリミテッド. Method for manufacturing printed circuit board

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