JPS59218646A - Production of mold - Google Patents
Production of moldInfo
- Publication number
- JPS59218646A JPS59218646A JP9351283A JP9351283A JPS59218646A JP S59218646 A JPS59218646 A JP S59218646A JP 9351283 A JP9351283 A JP 9351283A JP 9351283 A JP9351283 A JP 9351283A JP S59218646 A JPS59218646 A JP S59218646A
- Authority
- JP
- Japan
- Prior art keywords
- mold
- layer
- electrode layer
- metal
- master
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 14
- 239000011347 resin Substances 0.000 claims abstract description 13
- 229920005989 resin Polymers 0.000 claims abstract description 13
- 238000000034 method Methods 0.000 claims abstract description 10
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 6
- 239000001301 oxygen Substances 0.000 claims abstract description 6
- 229910052751 metal Inorganic materials 0.000 claims description 27
- 239000002184 metal Substances 0.000 claims description 27
- 238000007747 plating Methods 0.000 claims description 12
- 238000009832 plasma treatment Methods 0.000 claims description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 abstract description 26
- 239000000758 substrate Substances 0.000 abstract description 18
- 230000003287 optical effect Effects 0.000 abstract description 16
- 229910052759 nickel Inorganic materials 0.000 abstract description 13
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 abstract description 11
- 239000000463 material Substances 0.000 abstract description 9
- 239000011521 glass Substances 0.000 abstract description 4
- 238000007740 vapor deposition Methods 0.000 abstract description 4
- 229920002120 photoresistant polymer Polymers 0.000 abstract description 3
- 238000013518 transcription Methods 0.000 abstract 1
- 230000035897 transcription Effects 0.000 abstract 1
- 239000011159 matrix material Substances 0.000 description 5
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B23/00—Record carriers not specific to the method of recording or reproducing; Accessories, e.g. containers, specially adapted for co-operation with the recording or reproducing apparatus ; Intermediate mediums; Apparatus or processes specially adapted for their manufacture
- G11B23/0057—Intermediate mediums, i.e. mediums provided with an information structure not specific to the method of reproducing or duplication such as matrixes for mechanical pressing of an information structure ; record carriers having a relief information structure provided with or included in layers not specific for a single reproducing method; apparatus or processes specially adapted for their manufacture
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
Abstract
Description
【発明の詳細な説明】
（Ａ） 発明の技術分野
本発明は、一般に光ディスクと称せられる光記録媒体の
基板の製造に使用する金属母型の製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION (A) Technical Field of the Invention The present invention relates to a method for manufacturing a metal master mold used for manufacturing a substrate for an optical recording medium generally referred to as an optical disk.
（Ｂ） 技術の背景
前記光記録媒体は、基本的にはアクリル樹脂等の透明な
基板上にテルルあるいはビスマス等の熱溶融性の記録材
料層を蒸着あるいはスパッタリングによって形成したも
のであるが、通常、前記基の上に情報の書込みをおこな
うため、前記透明基を情報の書込み・読取シ用のサーボ
トラックとして利用するとともに、その溝部分の記録材
料層に情報の書込みをおこなっている。(B) Background of the Technology The above-mentioned optical recording medium is basically a layer of heat-melting recording material such as tellurium or bismuth formed on a transparent substrate such as acrylic resin by vapor deposition or sputtering. In order to write information on the base, the transparent base is used as a servo track for writing and reading information, and information is written on the recording material layer in the groove portion.
前記プリグループを設けた光記録媒体用基板は一般に金
属母型をスタンパとして用い、射出成形法・圧縮成形法
あるいは光硬化性樹脂による成形法等によって製造され
ている。The optical recording medium substrate provided with the pre-groups is generally manufactured by injection molding, compression molding, or molding with a photocurable resin using a metal master mold as a stamper.
（０従来技術と問題点
前記光記録媒体用基板の製造に用いる母型は、従来、次
のような方法で製造されている。(0) Prior Art and Problems The matrix used for manufacturing the optical recording medium substrate has conventionally been manufactured by the following method.
（イ）ガラス基板上に塗布した感光性樹脂（ホトレジス
ト）を露光現像してプリグループを設けた原盤を製造す
る。(a) A photosensitive resin (photoresist) coated on a glass substrate is exposed and developed to produce a master disc provided with pre-groups.
（ロ）前記原盤にニッケルおよびクロームの２層の電極
層を形成する。(b) Two electrode layers of nickel and chromium are formed on the master.
（ハ）前記電極層の上にニッケルメッキを形成する。(c) Forming nickel plating on the electrode layer.
に）前記原盤上に形成したニッケルおよびクロームの２
層の電極層と、その上に形成したニッケルメッキ層とを
一体化１〜だま＼剥離する。2) nickel and chromium formed on the master disc
The electrode layer and the nickel plating layer formed thereon are integrated and peeled off.
ところが、このようにして製造した金属母型は、これを
スタンバとして光記録媒体用基板の製造に用いるとき、
光記録媒体用基板の材料となる樹脂との離型性が優れず
、したがって製品の歩出りが悪いという欠点があった。However, when the metal master mold manufactured in this way is used as a standber in the manufacture of optical recording medium substrates,
The problem was that the mold releasability from the resin used as the material for the substrate for optical recording media was not excellent, and therefore the yield of the product was poor.
（ハ）発明の目的
本発明の目的は、光記録媒体用基板の材料となる樹脂と
、感光性樹脂製の原盤から金属メッキ法によって製造し
光記録媒体用基板の製造に使用する金属母型との離型性
を向上することにある。(C) Purpose of the Invention The object of the present invention is to produce a resin that is a material for a substrate for an optical recording medium and a metal master mold that is manufactured by a metal plating method from a photosensitive resin master and used for manufacturing the substrate for an optical recording medium. The objective is to improve mold release properties.
（ト）発明の構成
本発明になる母型の製造方法は、感光性樹脂製の原盤上
に金属電極層を形成し該金属電極層上に金属メッキを施
したのち前記原盤から前記金属電極層を剥離して金属電
極層と金属メッキ層との一体化された金属母型を得る母
型の製造方法において、前記剥離後の金属母型の型面に
酸素プラズマ処理を施すものである。(G) Structure of the Invention The method for manufacturing a matrix according to the present invention includes forming a metal electrode layer on a master made of photosensitive resin, applying metal plating on the metal electrode layer, and then transferring the metal electrode layer from the master. In the method for manufacturing a mother mold in which a metal mother mold in which a metal electrode layer and a metal plating layer are integrated is obtained by peeling off a metal electrode layer and a metal plating layer, the mold surface of the metal mother mold after the peeling is subjected to an oxygen plasma treatment.
Ｃ）発明の実施例
以下に本発明の要旨を実施例によって具体的に説明する
。C) Examples of the Invention The gist of the present invention will be specifically explained below with reference to Examples.
第１図ないし第５図は本発明による母型の製造方法の一
実施例を断面図によって順序に示したものであり、１は
ガラス基板、２は原盤、３はクローム電極層、４はニッ
ケル電極層、５はニッケルメッキ層を示す。1 to 5 are cross-sectional views showing an embodiment of the method for manufacturing a matrix according to the present invention, in which 1 is a glass substrate, 2 is a master plate, 3 is a chrome electrode layer, and 4 is a nickel plate. The electrode layer 5 indicates a nickel plating layer.
すなわち、屯初に第４図に示すようにガラス基板１の上
にホトレジストによって形成した原盤２の上に蒸着法に
よって厚さａｏｏｉのクローム電極層３を形成する。That is, first, as shown in FIG. 4, a chrome electrode layer 3 having a thickness of aooi is formed on a master 2 formed by photoresist on a glass substrate 1 by a vapor deposition method.
次に第２図に示すようにクローム電極層３の上に蒸着法
によって厚さ３００Ａのニッケル電極層４を形成する。Next, as shown in FIG. 2, a nickel electrode layer 4 having a thickness of 300 Å is formed on the chrome electrode layer 3 by vapor deposition.
次に第３図に示すようにニッケル電極層４の上３−
にメッキによって厚さ３００μｍのニッケルメッキ層５
を形成する。Next, as shown in FIG.
form.
次に第４図に示すように原盤２からクローム電極層３を
剥離して、クローム電極層３とニッケル電極層４とニッ
ケルメッキ層５との一体化された金属母型を得る。Next, as shown in FIG. 4, the chrome electrode layer 3 is peeled off from the master 2 to obtain a metal matrix in which the chrome electrode layer 3, the nickel electrode layer 4, and the nickel plating layer 5 are integrated.
続いて金属母型の型面す々わちクローム電極層３の表面
に付着した原盤２の材料すなわち感光性樹脂をエタノー
ル及びメチルエチルケトンによって溶解除去したのち、
第５図に示すように、酸素圧力を２ Ｘ １０ Ｔｏ
ｒｒ、 ｆた高周波電、力を２００Ｗとして、クローム
電極層３の表面に対し２０分間の酸素プラズマ（ＯＰ）
処理を施す。Subsequently, the material of the master 2, that is, the photosensitive resin adhering to the mold surface of the metal matrix, that is, the surface of the chrome electrode layer 3, was dissolved and removed using ethanol and methyl ethyl ketone.
As shown in Figure 5, the oxygen pressure is 2 x 10 To
Oxygen plasma (OP) was applied to the surface of the chrome electrode layer 3 for 20 minutes using high-frequency electricity and a power of 200 W.
Apply processing.
以上のようにして製造した金属母型は、型面と光記録媒
体用基板の材料となる樹脂との離型性が極めて優れ、し
たがって、これをスタンバとして用い転写による光記録
媒体用基板の製造において製品歩止りを向上することが
できる。The metal master mold manufactured as described above has extremely excellent mold releasability between the mold surface and the resin that is the material of the substrate for optical recording media, and therefore, it is used as a standby to manufacture substrates for optical recording media by transfer. Product yield can be improved.
（Ｇ） 発明の詳細
な説明したように、本発明によれば光記録媒４一
体用基板の材料となる樹脂と、感光性樹脂製の原盤から
金属メッキ法によって製造し光記録媒体用基板の製造に
使用する母型との離型性を向上し、したがって光記録媒
体用基板の製造において製品歩止りを向上することがで
きる。(G) As described in detail, according to the present invention, the optical recording medium substrate is manufactured by metal plating from a resin that is the material of the optical recording medium 4 integrated substrate and a photosensitive resin master disk. It is possible to improve the mold releasability from the mother mold used in manufacturing, and therefore improve the product yield in manufacturing substrates for optical recording media.
第１図・第２図・第３図・第４図および第５図は本発明
一実施例の説明図である。また図中、２は原盤、３はク
ローム軍、極層、４はニッケル電極層、５はニッケルメ
ッキ層である。FIG. 1, FIG. 2, FIG. 3, FIG. 4, and FIG. 5 are explanatory diagrams of one embodiment of the present invention. Further, in the figure, 2 is a master disk, 3 is a chrome layer, a polar layer, 4 is a nickel electrode layer, and 5 is a nickel plating layer.
Claims (1)
層上に金属メッキを施したのち前記原盤から前記金属電
極層を剥離して金属電極層と金属メッキ層との一体化さ
れた金属母型を得る母型の製造方法において、前記剥離
後の金属母型の型面に酸素プラズマ処理を施すことを特
徴とする母型の製造方法。A metal electrode layer is formed on a photosensitive resin master, metal plating is applied on the metal electrode layer, and then the metal electrode layer is peeled off from the master to integrate the metal electrode layer and the metal plating layer. A method for manufacturing a mother mold for obtaining a metal mother mold, characterized in that the mold surface of the metal mother mold after peeling is subjected to oxygen plasma treatment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9351283A JPH07106606B2 (en) | 1983-05-27 | 1983-05-27 | Mold manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9351283A JPH07106606B2 (en) | 1983-05-27 | 1983-05-27 | Mold manufacturing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59218646A true JPS59218646A (en) | 1984-12-08 |
| JPH07106606B2 JPH07106606B2 (en) | 1995-11-15 |
Family
ID=14084398
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9351283A Expired - Lifetime JPH07106606B2 (en) | 1983-05-27 | 1983-05-27 | Mold manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH07106606B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010036556A (en) * | 2008-08-08 | 2010-02-18 | Konica Minolta Opto Inc | Optical film, method for forming the same, polarizing plate using optical film, and display device |
| US8026046B2 (en) * | 2000-10-03 | 2011-09-27 | Panasonic Corporation | Method for producing multi-layer optical disk |
-
1983
- 1983-05-27 JP JP9351283A patent/JPH07106606B2/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8026046B2 (en) * | 2000-10-03 | 2011-09-27 | Panasonic Corporation | Method for producing multi-layer optical disk |
| JP2010036556A (en) * | 2008-08-08 | 2010-02-18 | Konica Minolta Opto Inc | Optical film, method for forming the same, polarizing plate using optical film, and display device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH07106606B2 (en) | 1995-11-15 |
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