JPS6079351A - Manufacture of stamper - Google Patents

Manufacture of stamper

Info

Publication number
JPS6079351A
JPS6079351A JP18692383A JP18692383A JPS6079351A JP S6079351 A JPS6079351 A JP S6079351A JP 18692383 A JP18692383 A JP 18692383A JP 18692383 A JP18692383 A JP 18692383A JP S6079351 A JPS6079351 A JP S6079351A
Authority
JP
Japan
Prior art keywords
photoresist
film
stamper
thin film
glass substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18692383A
Other languages
Japanese (ja)
Inventor
Hideki Segawa
秀樹 瀬川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Priority to JP18692383A priority Critical patent/JPS6079351A/en
Publication of JPS6079351A publication Critical patent/JPS6079351A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00Methods for coating glass
    • C03C2218/30Aspects of methods for coating glass not covered above
    • C03C2218/355Temporary coating

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Surface Treatment Of Glass (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE:To maintain the planenss of a glass substrate and to manufacture a stamper with high transfer accuracy at a low cost while almost preventing the sticking of dust by applying a photoresist to a metallic thin film formed on the glass substrate, making the surface of the photoresist uneven, depositing a metal, and removing the photoresist. CONSTITUTION:A metallic thin film 8 of nickel or the like is formed on a glass substrate 1 by sputtering, vacuum deposition or other method, and a photoresist 2 is applied to the film 8 to a larger thickness than the depth of pits with a spinner or the like. The photoresist 2 is exposed to laser light modulated with an information signal, and it is developed to form projections corresponding to the information signal on the film 8. A metallic thin film 9 having a thickness equal to the necessary depth of pits is formed on the uneven surface by sputtering, vacuum deposition or other method. The film 9 is made of the same metal as the film 8. The photoresist 2 is then removed. Only the film 9 deposited in the recesses remains on the film 8, and a stamper is manufactured.

Description

【発明の詳細な説明】 技術分野 本発明は情報記録媒体の製造に使用されるスタンパの作
製法に関する。さらに詳しくは、本発明は光ディスク用
プレグルーブ付き基板作製のための2P用スタン、aに
関する。
DETAILED DESCRIPTION OF THE INVENTION Technical Field The present invention relates to a method for manufacturing a stamper used for manufacturing information recording media. More specifically, the present invention relates to a 2P stand, a, for producing a pregrooved substrate for an optical disc.

従来技術 従来の光デイスク基板は第1図〜第6図に示すような手
順で製造されている。まずガラス基板1上にフォトレジ
スト膜2(40〜130 nm ) ’を塗布し、レー
ザによシバ光し現像してピットま九はプレグルーブ2′
(幅0.5〜1.0μm)を形成する(第1図)。次に
、これにスパッタリング法または真空蒸着法によって銀
またはニッケルを付着させて導電膜3とする(第2図)
。この導電膜3を陰極としてニッケル板4を電鋳によ多
形成する(第3図)。電鋳板4を導電膜3と一緒にガラ
ス基板上 2を除去してスタンパ(マスター)とする(第4図)。
Prior Art Conventional optical disk substrates are manufactured by the procedure shown in FIGS. 1 to 6. First, a photoresist film 2 (40 to 130 nm)' is coated on a glass substrate 1, exposed to laser light and developed to form pits and pregrooves 2'.
(width 0.5 to 1.0 μm) (Fig. 1). Next, silver or nickel is deposited on this by sputtering or vacuum evaporation to form a conductive film 3 (Figure 2).
. Using this conductive film 3 as a cathode, a nickel plate 4 is formed by electroforming (FIG. 3). A stamper (master) is obtained by removing the glass substrate 2 from the electroforming plate 4 together with the conductive film 3 (FIG. 4).

このようにして作製したスタンパとアクリル基板50間
に紫外線硬化樹脂6を入れ圧着し紫外線硬化樹脂6にピ
ットやプレグルーブの形状を転写しアクリル基板5側か
ら紫外線7を照射して硬化させる(第5図)。これをス
タンパから剥離して基板とする(第6図)。このように
射出成形のような高温高圧をスタンパへ作用させずに紫
外線硬化樹脂を用いて基板を作製する方法を2P法と称
する。かかる従来の方法では、スタンパをガラス基板か
ら剥離□する過程で平面度が悪くなる、スタンパ作製の
工程が多いためその間にゴミが付着したシ転写精度が悪
(なるまた製作コストも高くなるという問題があった。
An ultraviolet curing resin 6 is placed between the thus produced stamper and the acrylic substrate 50, and the shapes of the pits and pregrooves are transferred to the ultraviolet curing resin 6, and the ultraviolet rays 7 are irradiated from the side of the acrylic substrate 5 to cure it. Figure 5). This is peeled off from the stamper to form a substrate (FIG. 6). This method of manufacturing a substrate using an ultraviolet curing resin without applying high temperature and high pressure to a stamper as in injection molding is called a 2P method. In such conventional methods, flatness deteriorates during the process of peeling off the stamper from the glass substrate, and since there are many stamper manufacturing steps, dust may adhere during the process, resulting in poor transfer accuracy (and high production costs). was there.

目 的 本発明は上記問題に鑑みてなされたものであって、その
目的はガラス基板の平面度を保ち、製作工程数が少なく
、ゴミの付着する機会が少なく、転写精度も良くしかも
製作コストも安価なスタンパの作製法を提供することで
ある。
Purpose The present invention was made in view of the above-mentioned problems, and its purpose is to maintain the flatness of the glass substrate, reduce the number of manufacturing steps, reduce the chance of dust adhesion, improve transfer accuracy, and reduce manufacturing costs. An object of the present invention is to provide a method for manufacturing an inexpensive stamper.

構成 本発明によるスタンパの作製法は、ガラス基板上に金属
薄膜を形成し、この金属薄膜の上にフォトレジストを適
用し、このフォトレジストを露光し現像して凹凸を形成
させた後金属を付着させ次にフォトレジストを除去する
ことからなるものである。また、本発明の別法によれば
上述のようにして凹凸を形成させた後金属を付着させる
代りに金属薄膜上の7オトレジストをマスクとして前記
金属薄膜をエツチングし次いでフォトレジストを除去し
てスタンパを作製することができる。ここで「凹凸」と
は情報信号と対応するピットやプレグルーブを意味する
Structure The method for manufacturing a stamper according to the present invention involves forming a metal thin film on a glass substrate, applying a photoresist on the metal thin film, exposing and developing the photoresist to form irregularities, and then attaching metal. and then removing the photoresist. According to another method of the present invention, instead of forming the unevenness as described above and then attaching the metal, the metal thin film is etched using the photoresist on the metal thin film as a mask, and then the photoresist is removed and the stamper is etched. can be created. Here, "unevenness" means pits or pregrooves that correspond to information signals.

以下添付図面を参照して本発明のスタンパ作製法の一実
施例について詳細に説明する。
An embodiment of the stamper manufacturing method of the present invention will be described in detail below with reference to the accompanying drawings.

第7図に示すように、ガラス基板1の上にスパッタリン
グ法または真・空蒸着法などによってニッケル等の金属
薄膜8を形成し次にこの上にスピナー等によυピット深
さよシ厚いフォトレジスト2を形成する。次に、情報信
号によって変調されたレーザを照射して露光し次いで現
像処理を行なって金属薄膜の上に情報信号と対応した凹
凸(ピット2′)を形成する(第8図)。
As shown in FIG. 7, a thin metal film 8 of nickel or the like is formed on the glass substrate 1 by sputtering or vacuum vapor deposition, and then a photoresist film as thick as the υ pit depth is deposited on this using a spinner or the like. form 2. Next, the metal thin film is irradiated with a laser modulated by the information signal, exposed, and then developed to form irregularities (pits 2') corresponding to the information signals on the metal thin film (FIG. 8).

次に、第9図に示すように凹凸(ピット、グループ)の
上に金属薄膜8の形成に使用したと同じ金属をスパッタ
リング法または真空蒸着法などによって必要なピット深
さと等しい膜厚の金属薄膜9を形成する。次いで、第9
図で2で示すフォトレジストを除去すると第10図に示
すように溝内に付着された金属薄膜9だけが金属薄膜8
上に残って本発明のスタンパが作製される。
Next, as shown in FIG. 9, the same metal used to form the metal thin film 8 is deposited on the unevenness (pits, groups) by sputtering or vacuum evaporation to form a metal thin film with a film thickness equal to the required pit depth. form 9. Then the 9th
When the photoresist shown at 2 in the figure is removed, only the metal thin film 9 attached in the groove is left as shown in FIG.
The stamper of the present invention is produced by remaining on top.

また、本発明の別の実施例ではガラス基板1の上に金属
薄膜の膜厚をピット深さと等しくする以外には上述した
と同様にして金属薄膜8を形成した後フォトレジスト2
を形成する(第8図)。次に、この金属薄膜8上のフォ
トレジスト2をマスクとしてエツチングし第11図に示
すようにピット2′を形成する。次に、フォトレジスト
2を除去するとガラス基板1上に金属薄膜8が残存して
第12図に示すようなスタンパが作製される。
In another embodiment of the present invention, a metal thin film 8 is formed on a glass substrate 1 in the same manner as described above except that the thickness of the metal thin film is made equal to the pit depth, and then a photoresist 2 is formed on the glass substrate 1.
(Figure 8). Next, using the photoresist 2 on the metal thin film 8 as a mask, etching is performed to form pits 2' as shown in FIG. Next, when the photoresist 2 is removed, a metal thin film 8 remains on the glass substrate 1, and a stamper as shown in FIG. 12 is manufactured.

なお、上述した実施例は本発明の例示のために掲げたも
のであって本発明の要旨の範囲内で種々変形実施できる
ことはもちろんである。
It should be noted that the above-mentioned embodiments are given for illustrating the present invention, and it goes without saying that various modifications can be made within the scope of the gist of the present invention.

効果 本発明の方法によれば以下の効果を得ることができる。effect According to the method of the present invention, the following effects can be obtained.

a)平面度の良いガラス基板がそのままスタンパの基板
として使用されるので、従来のスタンパに比べ非常に平
面度がよい。
a) Since a glass substrate with good flatness is used as it is as a stamper substrate, the flatness is much better than that of conventional stampers.

b)工程数が少ないので、ゴミの付着する機会が少な(
転写精度もよく、製作コストも安い。
b) Since the number of steps is small, there is less opportunity for dust to adhere (
The transfer accuracy is good and the production cost is low.

C)メッキ工程がないので、メッキ液の処理等の環境汚
染を生じることがない。
C) Since there is no plating process, there is no environmental pollution caused by processing of plating solution.

d)紫外線硬化性樹脂を使用する場合は射出成形と異な
シ熱や圧力が殆ど作用しないので、本発明のガラス基板
でも充分に使用に耐える。
d) When using an ultraviolet curable resin, unlike injection molding, heat and pressure are hardly applied, so the glass substrate of the present invention can be used satisfactorily.

【図面の簡単な説明】[Brief explanation of drawings]

第1図〜第6図は従来のスタンパの製作工程を説明する
部分断面図でありそして第7図〜第12図は本発明のス
タンパの製作工程を説明する部分断面図である。 1・・・ガラス基板、2・・・フォトレジスト、2′・
・・ピットまたはプレグルーブ、3・・・導電膜、4・
・・ニッケル電鋳板、5・・・アクリル板、6・・・紫
外線硬化樹脂、7・・・紫外線、8,9・・・金属薄膜
。 特許出願人 株式会社 リ コ − 第7図
1 to 6 are partial sectional views illustrating the manufacturing process of a conventional stamper, and FIGS. 7 to 12 are partial sectional views illustrating the manufacturing process of the stamper of the present invention. 1...Glass substrate, 2...Photoresist, 2'.
... pit or pregroove, 3... conductive film, 4.
...Nickel electroformed plate, 5...Acrylic plate, 6...Ultraviolet curing resin, 7...Ultraviolet light, 8,9...Metal thin film. Patent applicant Rico Co., Ltd. - Figure 7

Claims (1)

【特許請求の範囲】 1)ガラス基板、上に金属薄膜を形成し、この金属薄膜
の上に7オトレジストを適用し、このフォトレジストを
露光し現像して凹凸を形成させた後金属を付着させ次に
フォトレジストを除去することを特徴とする、スタンパ
ノ作製法。 2)ガラス基板上に金属薄膜を形成し、この金属薄膜の
上に7オトレジストを適用し、このフォトレジストを露
光し現像して凹凸を形成させた後、前記金属薄膜上のフ
ォトレジストをマスクとして前記金属薄膜をエツチング
し次にフォトレジストを除去することを特徴とする、ス
タンパの作製法。
[Claims] 1) A thin metal film is formed on a glass substrate, a photoresist is applied on the thin metal film, the photoresist is exposed and developed to form irregularities, and then metal is attached. A method for manufacturing a stamp pano, which is characterized in that the photoresist is then removed. 2) Form a metal thin film on a glass substrate, apply 7 photoresist on this metal thin film, expose and develop this photoresist to form unevenness, and then use the photoresist on the metal thin film as a mask. A method for manufacturing a stamper, comprising etching the metal thin film and then removing the photoresist.
JP18692383A 1983-10-07 1983-10-07 Manufacture of stamper Pending JPS6079351A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18692383A JPS6079351A (en) 1983-10-07 1983-10-07 Manufacture of stamper

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18692383A JPS6079351A (en) 1983-10-07 1983-10-07 Manufacture of stamper

Publications (1)

Publication Number Publication Date
JPS6079351A true JPS6079351A (en) 1985-05-07

Family

ID=16197066

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18692383A Pending JPS6079351A (en) 1983-10-07 1983-10-07 Manufacture of stamper

Country Status (1)

Country Link
JP (1) JPS6079351A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02271934A (en) * 1989-04-11 1990-11-06 Nippon Sheet Glass Co Ltd Optical disk substrate
EP1564735A3 (en) * 2004-01-08 2007-01-10 Komag, Inc. Method and apparatus for making a stamper for patterning CDs and DVDs

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02271934A (en) * 1989-04-11 1990-11-06 Nippon Sheet Glass Co Ltd Optical disk substrate
EP1564735A3 (en) * 2004-01-08 2007-01-10 Komag, Inc. Method and apparatus for making a stamper for patterning CDs and DVDs

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