JPH07106606B2 - Mold manufacturing method - Google Patents
Mold manufacturing methodInfo
- Publication number
- JPH07106606B2 JPH07106606B2 JP9351283A JP9351283A JPH07106606B2 JP H07106606 B2 JPH07106606 B2 JP H07106606B2 JP 9351283 A JP9351283 A JP 9351283A JP 9351283 A JP9351283 A JP 9351283A JP H07106606 B2 JPH07106606 B2 JP H07106606B2
- Authority
- JP
- Japan
- Prior art keywords
- master
- electrode layer
- metal
- substrate
- recording medium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 11
- 239000002184 metal Substances 0.000 claims description 26
- 229910052751 metal Inorganic materials 0.000 claims description 26
- 238000007747 plating Methods 0.000 claims description 12
- 239000011347 resin Substances 0.000 claims description 11
- 229920005989 resin Polymers 0.000 claims description 11
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 4
- 229910052760 oxygen Inorganic materials 0.000 claims description 4
- 239000001301 oxygen Substances 0.000 claims description 4
- 238000009832 plasma treatment Methods 0.000 claims description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 26
- 239000000758 substrate Substances 0.000 description 18
- 230000003287 optical effect Effects 0.000 description 14
- 229910052759 nickel Inorganic materials 0.000 description 13
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 10
- 238000000034 method Methods 0.000 description 8
- 239000000463 material Substances 0.000 description 7
- 239000011159 matrix material Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B23/00—Record carriers not specific to the method of recording or reproducing; Accessories, e.g. containers, specially adapted for co-operation with the recording or reproducing apparatus ; Intermediate mediums; Apparatus or processes specially adapted for their manufacture
- G11B23/0057—Intermediate mediums, i.e. mediums provided with an information structure not specific to the method of reproducing or duplication such as matrixes for mechanical pressing of an information structure ; record carriers having a relief information structure provided with or included in layers not specific for a single reproducing method; apparatus or processes specially adapted for their manufacture
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Manufacturing Optical Record Carriers (AREA)
Description
【発明の詳細な説明】 （Ａ）発明の技術分野 本発明は、一般に光ディスクと称せられる光記録媒体の
基板の製造に使用する金属母型の製造方法に関する。Description: (A) TECHNICAL FIELD OF THE INVENTION The present invention relates to a method for producing a metal master used for producing a substrate of an optical recording medium generally called an optical disk.
（Ｂ）技術の背景 前記光記録媒体は、基本的にはアクリル樹脂等の透明な
基板上にテルルあるいはビスマス等の熱溶融性の記録材
料層を蒸着あるいはスパッタリングによって形成したも
のであるが、通常、前記基板を円板状すなわちディスク
状とし、１ミクロンないし３ミクロンのピッチの同心円
あるいは螺旋の上に情報の書込みをおこなうため、前記
透明基板として予めプリグルーブと称せられる同心円状
あるいは螺旋状の溝を施したものを用い、この溝を情報
の書込み・読取り用のサーボトラックとして利用すると
ともに、その溝部分の記録材料層に情報の書込みをおこ
なっている。(B) Background of the Technology The optical recording medium is basically one in which a heat-meltable recording material layer such as tellurium or bismuth is formed on a transparent substrate such as acrylic resin by vapor deposition or sputtering. In order to write information on a concentric circle or a spiral having a pitch of 1 to 3 microns, the substrate is formed into a disk shape, that is, a disk shape, so that the transparent substrate is a concentric or spiral groove previously called a pre-groove. The groove is used as a servo track for writing / reading information, and information is written in the recording material layer in the groove.
前記プリグルーブを設けた光記録媒体用基板は一般に金
属母型をスタンパとして用い、射出成形法・圧縮成形法
あるいは光硬化性樹脂による成形法等によって製造され
ている。The optical recording medium substrate provided with the pre-groove is generally manufactured by using an injection molding method, a compression molding method, a molding method using a photocurable resin, or the like, using a metal matrix as a stamper.
（Ｃ）従来技術と問題点 前記光記録媒体用基板の製造に用いる母型は、従来、次
のような方法で製造されている。(C) Conventional Technology and Problems Conventionally, a mother die used for manufacturing the optical recording medium substrate has been manufactured by the following method.
（イ）ガラス基板上に塗布した感光性樹脂（ホトレジス
ト）を露光現像してプリグルーブを設けた原盤を製造す
る。(A) A photosensitive resin (photoresist) applied on a glass substrate is exposed and developed to produce a master having a pre-groove.
（ロ）前記原盤にニッケルおよびクロームの２層の電極
層を形成する。(B) Two electrode layers of nickel and chrome are formed on the master.
（ハ）前記電極層の上にニッケルメッキを形成する。(C) Nickel plating is formed on the electrode layer.
（ニ）前記原盤上に形成したニッケルおよびクロームの
２層の電極層と、その上に形成したニッケルメッキ層と
を一体化したまゝ剥離する。(D) The two electrode layers of nickel and chrome formed on the master plate and the nickel plating layer formed thereon are integrally peeled off.
ところが、このようにして製造した金属母型は、これを
スタンパとして光記録媒体用基板の製造に用いるとき、
光記録媒体用基板の材料となる樹脂との離型性が優れ
ず、したがって製品の歩止りが悪いという欠点があっ
た。However, when the metal matrix thus manufactured is used as a stamper for manufacturing a substrate for an optical recording medium,
There is a drawback that the releasability from the resin used as the material of the substrate for the optical recording medium is not excellent, and therefore the product yield is poor.
（Ｄ）発明の目的 本発明の目的は、光記録媒体用基板の材料となる樹脂
と、感光性樹脂製の原盤から金属メッキ法によって製造
し光記録媒体用基板の製造に使用する金属母型との離型
性を向上することにある。(D) Object of the Invention An object of the present invention is to use a resin as a material for a substrate for an optical recording medium and a metal master mold manufactured from a photosensitive resin master by a metal plating method and used for manufacturing the substrate for an optical recording medium. It is to improve the releasability with.
（Ｅ）発明の構成 本発明になる母型の製造方法は、感光性樹脂製の原盤上
に金属電極層を形成し該金属電極層上に金属メッキを施
したのち前記原盤から前記金属電極層を剥離して金属電
極層と金属メッキ層との一体化された金属母型を得る母
型の製造方法において、前記剥離後の金属母型の型面に
酸素プラズマ処理を施すものである。(E) Configuration of the Invention In the method for producing a master block according to the present invention, a metal electrode layer is formed on a master plate made of a photosensitive resin, the metal electrode layer is plated with metal, and then the metal electrode layer is formed on the master plate. In the method for producing a master mold in which the metal master layer is peeled off to obtain a metal master layer in which the metal electrode layer and the metal plating layer are integrated, the mold surface of the metal master mold after the peeling is subjected to oxygen plasma treatment.
（Ｆ）発明の実施例 以下に本発明の要旨を実施例によって具体的に説明す
る。(F) Examples of the Invention Hereinafter, the gist of the present invention will be specifically described with reference to Examples.
第１図ないし第５図は本発明による母型の製造方法の一
実施例を断面図によって順序に示したものであり、１は
ガラス基板,2は原盤,3はクローム電極層,4はニッケル電
極層,5はニッケルメッキ層を示す。1 to 5 show one embodiment of a method for manufacturing a master die according to the present invention in order of sectional views, in which 1 is a glass substrate, 2 is a master, 3 is a chrome electrode layer, and 4 is nickel. The electrode layer, 5 is a nickel plating layer.
すなわち、最初に第１図に示すようにガラス基板１の上
にホトレジストによって形成した原盤２の上に蒸着法に
よって厚さ300Åのクローム電極層３を形成する。That is, first, as shown in FIG. 1, a chrome electrode layer 3 having a thickness of 300Å is formed on a master 2 formed of a photoresist on a glass substrate 1 by a vapor deposition method.
次に第２図に示すようにクローム電極層３の上に蒸着法
によって厚さ300Åのニッケル電極層４を形成する。Next, as shown in FIG. 2, a nickel electrode layer 4 having a thickness of 300 Å is formed on the chrome electrode layer 3 by a vapor deposition method.
次に第３図に示すようにニッケル電極層４の上にメッキ
によって厚さ300μｍのニッケルメッキ層５を形成す
る。Next, as shown in FIG. 3, a nickel plating layer 5 having a thickness of 300 μm is formed on the nickel electrode layer 4 by plating.
次に第４図に示すように原盤２からクローム電極層３を
剥離して、クローム電極層３とニッケル電極層４とニッ
ケルメッキ層５との一体化された金属母型を得る。Next, as shown in FIG. 4, the chrome electrode layer 3 is peeled off from the master 2 to obtain an integrated metal matrix of the chrome electrode layer 3, the nickel electrode layer 4, and the nickel plating layer 5.
続いて金属母型の型面すなわちクローム電極層３の表面
に付着した原盤２の材料すなわち感光性樹脂をエタノー
ル及びメチルエチルケトンによって溶解除去したのち、
第５図に示すように、酸素圧力を２×10-2Torr.また高
周波電力を200Wとして、クローム電極層３の表面に対し
20分間の酸素プラズマ（OP）処理を施す。Subsequently, the material of the master 2 that is attached to the surface of the metal matrix, that is, the surface of the chrome electrode layer 3, that is, the photosensitive resin, is dissolved and removed with ethanol and methyl ethyl ketone.
As shown in FIG. 5, the oxygen pressure was 2 × 10 -2 Torr. The high frequency power was 200 W, and the surface of the chrome electrode layer 3 was
Oxygen plasma (OP) treatment is performed for 20 minutes.
以上のようにして製造した金属母型は、型面と光記録媒
体用基板の材料となる樹脂との離型性が極めて優れ、し
たがって、これをスタンパとして用い転写による光記録
媒体用基板の製造において製品歩止りを向上することが
できる。The metal master block manufactured as described above has an extremely excellent mold releasability between the mold surface and the resin used as the material for the optical recording medium substrate. Therefore, using this as a stamper, the optical recording medium substrate is manufactured by transfer. In, product yield can be improved.
（Ｇ）発明の効果 以上説明したように、本発明によれば光記録媒体用基板
の材料となる樹脂と、感光性樹脂製の原盤から金属メッ
キ法によって製造し光記録媒体用基板の製造に使用する
母型との離型性を向上し、したがって光記録媒体用基板
の製造において製品歩止りを向上することができる。(G) Effects of the Invention As described above, according to the present invention, a resin as a material of an optical recording medium substrate and a master plate made of a photosensitive resin are manufactured by a metal plating method to manufacture an optical recording medium substrate. It is possible to improve the releasability from the mother die used, and thus improve the product yield in the production of the substrate for an optical recording medium.
第１図・第２図・第３図・第４図および第５図は本発明
一実施例の説明図である。また図中、２は原盤,3はクロ
ーム電極層,4はニッケル電極層,5はニッケルメッキ層で
ある。FIG. 1, FIG. 2, FIG. 3, FIG. 4, and FIG. 5 are explanatory views of an embodiment of the present invention. In the figure, 2 is a master, 3 is a chrome electrode layer, 4 is a nickel electrode layer, and 5 is a nickel plating layer.
Claims (1)
し該金属電極層上に金属メッキを施したのち前記原盤か
ら前記金属電極層を剥離して金属電極層と金属メッキ層
との一体化された金属母型を得る母型の製造方法におい
て、前記剥離後の金属母型の型面に酸素プラズマ処理を
施すことを特徴とする母型の製造方法。1. A metal electrode layer is formed on a master plate made of a photosensitive resin, metal plating is applied to the metal electrode layer, and then the metal electrode layer is peeled off from the master plate to form a metal electrode layer and a metal plating layer. In the method of manufacturing a master mold for obtaining the integrated metal master mold, the mold surface of the metal master after the peeling is subjected to oxygen plasma treatment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9351283A JPH07106606B2 (en) | 1983-05-27 | 1983-05-27 | Mold manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9351283A JPH07106606B2 (en) | 1983-05-27 | 1983-05-27 | Mold manufacturing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59218646A JPS59218646A (en) | 1984-12-08 |
| JPH07106606B2 true JPH07106606B2 (en) | 1995-11-15 |
Family
ID=14084398
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9351283A Expired - Lifetime JPH07106606B2 (en) | 1983-05-27 | 1983-05-27 | Mold manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH07106606B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ATE453911T1 (en) * | 2000-10-03 | 2010-01-15 | Panasonic Corp | MULTI-LAYER OPTICAL PLATE AND METHOD FOR PRODUCING THE MULTI-LAYER OPTICAL PLATE |
| JP5458527B2 (en) * | 2008-08-08 | 2014-04-02 | コニカミノルタ株式会社 | Manufacturing method of optical film |
-
1983
- 1983-05-27 JP JP9351283A patent/JPH07106606B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59218646A (en) | 1984-12-08 |
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