JPS60182031A - Information recording mother disk and its production - Google Patents
Information recording mother disk and its productionInfo
- Publication number
- JPS60182031A JPS60182031A JP3633484A JP3633484A JPS60182031A JP S60182031 A JPS60182031 A JP S60182031A JP 3633484 A JP3633484 A JP 3633484A JP 3633484 A JP3633484 A JP 3633484A JP S60182031 A JPS60182031 A JP S60182031A
- Authority
- JP
- Japan
- Prior art keywords
- metal
- layer
- disk
- photoresist
- metal layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 229910052751 metal Inorganic materials 0.000 claims abstract description 86
- 239000002184 metal Substances 0.000 claims abstract description 86
- 238000000034 method Methods 0.000 claims abstract description 26
- 239000011521 glass Substances 0.000 claims abstract description 24
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 18
- 238000005530 etching Methods 0.000 claims abstract description 16
- 239000007788 liquid Substances 0.000 claims abstract description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 29
- 229910052759 nickel Inorganic materials 0.000 claims description 15
- 238000007772 electroless plating Methods 0.000 claims description 9
- 229910052709 silver Inorganic materials 0.000 claims description 7
- 239000004332 silver Substances 0.000 claims description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 6
- 229910052802 copper Inorganic materials 0.000 claims description 6
- 239000010949 copper Substances 0.000 claims description 6
- 238000005323 electroforming Methods 0.000 abstract description 14
- 230000002093 peripheral effect Effects 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 35
- 239000010408 film Substances 0.000 description 15
- 238000007747 plating Methods 0.000 description 13
- 239000000243 solution Substances 0.000 description 10
- 230000007547 defect Effects 0.000 description 8
- 230000008569 process Effects 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 6
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 5
- 239000003989 dielectric material Substances 0.000 description 4
- 238000007733 ion plating Methods 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 238000000748 compression moulding Methods 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 238000007738 vacuum evaporation Methods 0.000 description 2
- ZSLUVFAKFWKJRC-IGMARMGPSA-N 232Th Chemical compound [232Th] ZSLUVFAKFWKJRC-IGMARMGPSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 229910052776 Thorium Inorganic materials 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000005282 brightening Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 238000003698 laser cutting Methods 0.000 description 1
- 230000005415 magnetization Effects 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 150000002815 nickel Chemical class 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-M phosphinate Chemical compound [O-][PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-M 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- LJCNRYVRMXRIQR-OLXYHTOASA-L potassium sodium L-tartrate Chemical compound [Na+].[K+].[O-]C(=O)[C@H](O)[C@@H](O)C([O-])=O LJCNRYVRMXRIQR-OLXYHTOASA-L 0.000 description 1
- 229940074439 potassium sodium tartrate Drugs 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- -1 silver Chemical class 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 235000011006 sodium potassium tartrate Nutrition 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B23/00—Record carriers not specific to the method of recording or reproducing; Accessories, e.g. containers, specially adapted for co-operation with the recording or reproducing apparatus ; Intermediate mediums; Apparatus or processes specially adapted for their manufacture
- G11B23/0057—Intermediate mediums, i.e. mediums provided with an information structure not specific to the method of reproducing or duplication such as matrixes for mechanical pressing of an information structure ; record carriers having a relief information structure provided with or included in layers not specific for a single reproducing method; apparatus or processes specially adapted for their manufacture
Landscapes
- Manufacturing Optical Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は光学的に記録情報を読み出す情報レコードディ
スクの原盤となる情報記録原盤の製造方法(従来技術)
光学的に記録情報を読み出す情報レコードディスクには
、ビデオディスク、ディジタルオーディオディスク、追
記型文書ファイルディスク、画像ファイルディスク等が
あり、これらは信号を微小な凹凸に変換してディスク」
二にノ1f成し、レーザー光の行路差による干渉作用を
利用して読み取る型式のもの;レーザー光による走査の
ためのトラッキング溝を設け、それに沿って薄膜状に形
成びせた記録媒体に穴をあけたり、反射率を変化させた
り、垂直磁化方向を反転させたりして情報を)1シ込ん
だり読出す型式のもの;あるいはこの信号ビット及びト
ラッキング溝
式のもの等かあるか、いずれにしても使用するレー的あ
るいは連続的にスパイラル状あるいは同心円状に基盤デ
ィスク上に形成させることが必要で、通常スタンバ−と
いわれる金属の型に溝を形成し、このスタンパ−をプラ
スチックスの射出成形機、圧縮成型機の金型内に装着し
て成形を行なうことによってスタンパ−の溝とプラスチ
・ノクス基盤に転写させるか、あるいはいわゆる2P法
と呼ばれる方法により、共重合性9モノマーをスタンパ
−2」−で光重合させて、溝の転写したプラスチックス
゛膜を作る等の方法がとられている。DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to a method for manufacturing an information recording master which is a master of an information record disk from which recorded information is optically read out (prior art); an information record from which recorded information is optically read out; Discs include video discs, digital audio discs, write-once document file discs, image file discs, etc. These discs convert signals into minute irregularities.
A type of recording medium that uses the interference effect caused by the difference in the path of laser light; a tracking groove is provided for scanning by laser light, and holes are formed in the recording medium in the form of a thin film along the tracking groove. Is there a type that inputs or reads information by opening the hole, changing the reflectance, or reversing the perpendicular magnetization direction? Or is there a type of signal bit and tracking groove type? It is necessary to form a spiral or continuous spiral or concentric circle on the base disk to be used even if the stamper is used for plastic injection molding. The 9 copolymerizable monomers can be transferred to the grooves of the stamper and the Plasti-Nox substrate by being placed in the mold of a compression molding machine or compression molding machine, or by a method called the so-called 2P method. Methods such as photopolymerizing with ``-'' to create a plastic film with grooves transferred thereon have been used.
スタンパ−を製造するには原盤上に形成した溝を一段階
あるいは後述するような三段階の電鋳によって転写させ
るのが通常の方法である。The usual method for manufacturing a stamper is to transfer grooves formed on a master by one-step or three-step electroforming as described below.
原盤を作る際には研磨されたカラス盤上にポジ型レジス
トを所定の膜厚に塗布し、レジスト膜上に焦点をしぼっ
たレーザー光で感光させた後、感光部分を溶解除去して
溝を形成させる方法が最も一般的であり、信号に応じた
溝の断続はレーザー光の変調によって容易に得られる。When making a master disc, a positive resist is applied to a predetermined thickness on a polished glass disc, the resist film is exposed to a focused laser beam, and the exposed areas are dissolved and removed to create grooves. The most common method is to form grooves, and intermittent grooves depending on signals can be easily obtained by modulating laser light.
この方法によって得られた原盤は導電性がないので、そ
のままでは電鋳を行なうことかできず、金属の導電膜を
レジスト膜上に蒸着、スパフタリング、イオンプレイテ
ィング、無電解めっきなどの方法により形成させること
が必要である。これら導電膜は電鋳後、溝の転写された
表面層となるので、これをそのまま成形用スタンパ−と
して用いる場合には、表面硬度等の機械的性質を充分に
伺与し且つ耐腐食性を与えることが必要である。しかし
導電性にすぐれ平滑かつ均質な11す膜が得られる金属
たとえば銀では、硬度及び耐腐食性か充分でないため、
原盤から電鋳して得られる電鋳物いわゆるファザー盤を
そのままスタンパ−として用いることかできず、電鋳に
よりファザー盤から溝の反転したマザー盤を作り、更に
マザー盤から転写してスタンパ−を作るという三段階の
電υj方法を取らざるを得ない。カラス原盤を用いる方
法はこのように導電性イ」与にともなう工程が伺加され
ねばならず、最終的に得られるディスクの欠陥は工程が
増えるごとに増加するため好ましくない。ガラス上のレ
ジスト膜による原盤は又誘電体であるため、工程中面電
気を帯びやすく、座弁を吸着して欠陥を形成しディスク
のエラーヒツトの原因を作る。かくしてカラス上のレジ
スト原盤はそれか誘電体であるために生ずる欠点すなわ
ち導電性(q与のための工程増、静電気による座弁吸着
によって生ずる欠、陥増が問題である。Since the master disc obtained by this method has no conductivity, it cannot be electroformed as it is, and methods such as vapor deposition, sputtering, ion plating, electroless plating, etc., of a conductive metal film on the resist film are used. It is necessary to form it by After electroforming, these conductive films become a surface layer with grooves transferred to them, so if this is used as a molding stamper as it is, it must have sufficient mechanical properties such as surface hardness and corrosion resistance. It is necessary to give. However, metals such as silver, which have excellent conductivity and can form a smooth and homogeneous 11-layer film, do not have sufficient hardness or corrosion resistance.
The electroformed product obtained by electroforming from the master disk cannot be used as a stamper as it is, so a mother disk with the grooves reversed is made from the father disk by electroforming, and then a stamper is made by transferring from the mother disk. We have no choice but to take the three-step electric υj method. In this way, the method using a glass master disk requires the addition of a process for imparting conductivity, and the defects in the final disc increase as the process increases, which is not preferable. Since the master disc made of a resist film on glass is also a dielectric material, it is easily charged with surface electricity during the process, and the seat valve is attracted to form defects, causing disc errors and hits. Thus, since the resist master disk on the glass is a dielectric material, it has defects such as conductivity (additional steps for adding q) and defects and cavities caused by static electricity adsorption of the seat valve.
このような欠点は平滑な金属盤を用いその上に直接機械
的カッティング法あるいはレジストによるパターン形成
の後のエツチング法によ、つて溝と形成することによっ
て解決できる。アースされた金属上の誘電体すなわちレ
ジスト膜はカラス等の誘電体上のレジスト膜に比べ帯電
しにくいことはよく知られている。金属原盤は勿論導電
性であるため、電鋳によってレプリカを取る場合に導電
処理をする必要がなく原盤の溝を反転転写するのには一
段階の電鋳を行なえばよい。この金属製原盤は、レジス
ト原盤が一回の電鋳によって損傷されるのに対し、10
回程度まで再使用して電鋳することができる。したかっ
てガラス上のレジストによる原盤を使用する場合に比ベ
ニ程が短縮され座弁吸着の機会が減少してディスクのノ
イズの原因となる欠陥の生成を少なくできる。金属盤を
用いた原盤は例えば特開昭56−169234号等を参
照されたい。These drawbacks can be solved by using a smooth metal disk and forming grooves thereon by direct mechanical cutting or by etching after forming a pattern with resist. It is well known that a dielectric material, ie, a resist film, on a grounded metal is less likely to be charged than a resist film on a dielectric material, such as a glass. Since the metal master disk is of course conductive, there is no need to perform conductive treatment when making a replica by electroforming, and one-step electroforming is sufficient to reversely transfer the grooves of the master disk. This metal master disc is damaged by one electroforming process, whereas the resist master disc is damaged by one electroforming process.
It can be reused and electroformed up to several times. Therefore, when using a master disk with a resist on glass, the relative gap is shortened, the chance of seat valve adsorption is reduced, and the generation of defects that cause disk noise can be reduced. For a master disc using a metal disc, see, for example, Japanese Patent Laid-Open No. 169234/1983.
しかしながら金属原盤のこのような長所を生かすには解
決すべき問題点がある。すなわち、先ず傷のない平滑な
金属原盤を得ることが前提となるが、金属の研磨はカラ
スの研磨はどの精度にするのはむずかしく、反射鏡等の
目的でダイヤモンド超精密研削により無酸素銅、アルミ
ニウムなとから平滑面をすJり出すことが通常行なわれ
るか、R111ax= 200〜300 Xのオーダー
の表面粗きか通常得られるレベルてあり100OX以下
の深さの溝を刻むことか要求される光ディスクの原盤の
場合不充分であるのは明らかである。However, there are problems that need to be solved in order to take advantage of these advantages of metal master discs. In other words, it is first necessary to obtain a smooth, scratch-free metal master, but it is difficult to polish metal to a certain level of precision, and for purposes such as reflectors, diamond ultra-precision grinding is used to produce oxygen-free copper, Either it is usually done to cut out a smooth surface from aluminum, or it is required to cut a groove with a depth of less than 100OX, with a surface roughness of the order of R111ax = 200-300X. It is clear that this is not sufficient for optical disc masters.
また、溝を形成させるためのエツチング上程においては
、金属の結晶粒界にそって腐食か進行し、金属が溶解す
るので、必然的にエツチングされた溝の底面は粗な表面
状態を有し、かかるスタンパ−から得られる成形品には
粗な而か転写されるので光か散乱され、レーザーによっ
て読み取られる信号に対してのノイズレベルが増大する
。In addition, during the etching process to form grooves, corrosion progresses along the grain boundaries of the metal and the metal dissolves, so the bottom surface of the etched grooves inevitably has a rough surface. The molded article obtained from such a stamper is transferred so roughly that light is scattered and the noise level relative to the signal read by the laser increases.
サラに、フォトレジストを用いずに金属薄膜にレーザー
ビームを照射し、金属薄膜を選択的に蒸発させて原盤を
作る方法も公知であるが、この方法テハレーザービーム
によって金属薄膜に明ケラれるピントの周辺が盛5り上
り、ピント形状が悪くなる。この欠点を改良するために
、レーザービームの照射によりピントを形成する第1金
属層と”この第1金属層をマスクとしてエツチングされ
る第2金机層とを組合せた方法が提案されている(特開
昭54−134604号)が、この方法によっても前記
の電鋳二「程における問題点すなわち導電性と表面平滑
性の両方を満足させることはできない。Another well-known method is to irradiate a metal thin film with a laser beam without using a photoresist and selectively evaporate the metal thin film to create a master disc. The periphery of the image is raised and the shape of the focus becomes poor. In order to improve this drawback, a method has been proposed that combines a first metal layer that forms a focal point by irradiation with a laser beam and a second metal layer that is etched using the first metal layer as a mask. JP-A No. 54-134604), even with this method, it is not possible to satisfy both the problems in the electroforming process, that is, both electrical conductivity and surface smoothness.
(発明の目的)
したかって、本発明の第1の目的は電鋳工程で要求され
る導電性と表面平滑性の両方を同時に満足する情報記録
原盤を提供することにある。(Objective of the Invention) Therefore, the first object of the present invention is to provide an information recording master disk that simultaneously satisfies both the electrical conductivity and surface smoothness required in the electroforming process.
本発明の第2の目的は上記の情報記録原盤の製造方法を
提供することにある。A second object of the present invention is to provide a method for manufacturing the above-mentioned information recording master disc.
(発明の構成)
本発明による情報記録原盤は研磨ガラス盤と、この研磨
ガラス盤上に形成された第1の金属よりなる厚さが均一
で且つ表面が平滑な第1金属層と、この第1金属層上に
形成された第2の金属よりなり且つ周方向および/また
は放射方向に不連続な第2金属層とにより構成され、上
記第1の金属は上記第2の金属を溶解するエツチング液
によっては溶解されない金属であることを特徴としてい
る。(Structure of the Invention) An information recording master disc according to the present invention includes a polished glass disc, a first metal layer formed on the polished glass disc and having a uniform thickness and a smooth surface. a second metal layer formed on one metal layer and discontinuous in the circumferential direction and/or radial direction; the first metal is etched by dissolving the second metal; It is characterized by being a metal that cannot be dissolved in some liquids.
本発明による」1記情報記録原盤は上記第2金属層がエ
ツチングによりピント形状または同心円あるいはスパイ
ラルのtfl’j形状に除去されたものであるので、こ
れらの形状は極めて均一で、従来のような周辺の盛」二
りは全くない。さらに、上記第1金属層により完全な導
電性かf」与され旧つ極めて高い表面平滑性が」1記ビ
ットまたはτ14の底面に与えられる。In the information recording master according to the present invention, the second metal layer is removed by etching into a focus shape, a concentric circle, or a spiral tfl'j shape, so these shapes are extremely uniform and different from the conventional one. There are no surrounding areas. Furthermore, the first metal layer provides complete electrical conductivity and extremely high surface smoothness to the bottom surface of the bit or τ14.
一]二記第1と第2の金属の組合せは第1の金属が第2
の金属を溶解するエツチング液によっては溶解されない
ような組合せてあればよく、公知の任意の組合せが使用
できる。例えば、酸性エツチング液の場合には、」−記
第1の金属を二゛ノケルとし、上記第2の金属を銅とし
た組合せ、上記第1の金属をニッケルとし、」二記第2
の金属を銀とした組合せ等があり、アルカリ性エソチン
ダ液の場合には、第・1の金属を亜鉛、錫、アンチモン
、ベリラム等とし、第2の金属をアルミニウム、クロム
等とすることができる。1] 2. The combination of the first and second metals is such that the first metal is the second metal.
Any known combination can be used as long as it is not dissolved by the etching solution that dissolves the metal. For example, in the case of an acidic etching solution, a combination of ``-- the first metal is nickel and the second metal is copper; the first metal is nickel;
In the case of an alkaline esotynda liquid, the first metal may be zinc, tin, antimony, berylam, etc., and the second metal may be aluminum, chromium, etc.
なお、本発明の情報記録原盤はプラ不チ・ツクディ。The information recording master disc of the present invention is made by Prafuchi Tsukudi.
スフの成形に用いられるスタンパ−の電鋳用原盤として
のみならず、この原盤そのものから再生装置を用いて情
報を取出す記録盤として用いることかできるのは明らか
である。It is clear that the present invention can be used not only as a master disk for electroforming of a stamper used for forming fabrics, but also as a recording disk from which information can be extracted from the master disk itself using a reproducing device.
本発明による情報記録原盤の製造方法は研磨ガラス上に
第1の金属よりなる厚さが均一で且つ表面が平滑な第1
金属層を形成し、この第1金属層上に第2の金属より成
る厚さが均一な第2金属層を形成し、この第2金属層上
にフォトレジスト層を均一に形成し、このフォトレジス
ト層にレーザー光を所望パターンに当てて感光させ、未
硬化フォトレジストを除去し、次いて上記第2の金属は
溶解するが第1の金属は溶解しないエツチング液を用い
て上記フォトレジストが除去された部分の第2金属層を
エツチングし、次いて硬化フォトレジストを除去するこ
とによって構成される。The method for manufacturing an information recording master disc according to the present invention is to prepare a first metal having a uniform thickness and a smooth surface on a polished glass.
A second metal layer made of a second metal and having a uniform thickness is formed on the first metal layer. A photoresist layer is uniformly formed on the second metal layer. The resist layer is exposed to laser light in a desired pattern to remove the uncured photoresist, and then the photoresist is removed using an etching solution that dissolves the second metal but does not dissolve the first metal. the second metal layer in the exposed areas and then removing the hardened photoresist.
本発明の特徴の一つは研磨カラス盤と同等の平滑性を有
する金属表面を得ることにあるが、これは研磨力′ラス
盤」二に上記第1金属層を形成させることによって達成
される。この第1金属層を形成するにはスパッタリング
、真空蒸着、イオンプレイ−ティング、無電解メッキか
用いられ得る。特に無電解メッキによれば360mm1
lfiはどのガラス盤にも±10%以内の均一性で金属
薄膜を形成させるのか容易で、スパッタリング、真空蒸
着、イオンプレイティング等、金属の発生源すなわちタ
ーゲントやるつぼに対する広がり角の影響が膜厚分布に
現れる方法に比へ優れている。無電解メッキの種類とし
ては無電解ニッケルメソキ、無電解銅メッキ、無電解ず
ずメッキ、無電解銀メッキ及び他の公知の無電解メッキ
がすべて可能である。メッキの厚さは後で刻む溝の深さ
に比へ充分厚ければよく、0.5μから10μまでの厚
さが可能である。One of the features of the present invention is to obtain a metal surface with a smoothness equivalent to that of a polished lath disk, which is achieved by forming the first metal layer on an abrasive lath disk. . Sputtering, vacuum deposition, ion plating, or electroless plating may be used to form this first metal layer. In particular, according to electroless plating, 360mm1
With LFI, it is easy to form a thin metal film on any glass plate with a uniformity within ±10%, and the film thickness depends on the spread angle of the metal source, i.e., target or crucible, such as sputtering, vacuum evaporation, ion plating, etc. It is superior to the way it appears in the distribution. All types of electroless plating include electroless nickel metal plating, electroless copper plating, electroless tin plating, electroless silver plating, and other known electroless plating. The thickness of the plating should be sufficiently thick compared to the depth of the grooves to be carved later, and the thickness can be from 0.5μ to 10μ.
本発明の第二の特徴すなわち[1jおよび深さが均一で
且つ底面か平滑なピットまたは溝を得、る、ためには、
上記のようにして得られた平滑な第1金属層上に更にこ
の金属と異種の第2金属層を形成する。この異種金属二
重層を形成する目的は、第2金属層上にレジストにより
パターンを形成した後、第2金属層のみを溶解し、第1
金属層(ま溶解しな゛いエツチング液により処理するこ
とにより、第2層金属の膜厚に相当する深さの溝を得る
ところにある。溝の底は第一金属層の表面であり前述の
ごとくガラス原盤と同等の平滑性を有している。第2金
属層を形成するには、スパッタリング、真空蒸着、イオ
ンプレイティング、無電解メッキ、電解メッキが可能で
あり、電解メッキにおいては表面平滑性を得るため光沢
剤を添加するいわゆる光沢メッキ、パルスメッキあるい
はPR1R1ツメツキ用することか特に有効である。The second feature of the present invention is to obtain pits or grooves that are uniform in depth and have a smooth bottom surface.
A second metal layer of a different kind from this metal is further formed on the smooth first metal layer obtained as described above. The purpose of forming this dissimilar metal double layer is to form a pattern on the second metal layer using a resist, then dissolve only the second metal layer, and
By treating the metal layer with an etching solution that does not dissolve it, a groove with a depth corresponding to the film thickness of the second metal layer is obtained.The bottom of the groove is the surface of the first metal layer, as described above. The second metal layer can be formed by sputtering, vacuum evaporation, ion plating, electroless plating, or electrolytic plating. It is particularly effective to use so-called bright plating, pulse plating, or PR1R1 plating in which a brightening agent is added to obtain smoothness.
以下、添(=J図面を参照しながら本発明の特殊実施例
を説明する。本発明はこの特殊実施例に限定されるもの
ではないということは明らかである。Hereinafter, a special embodiment of the present invention will be described with reference to the accompanying drawings. It is clear that the present invention is not limited to this special embodiment.
実施例1
表面粗さ10X以内の精密に研磨された、外径356m
m5内径7.2 mrn %厚さ6 mmのガラス円盤
(ソーダガラス)1に次の処方により無電解メッキをほ
どこした。Example 1 Precisely polished surface roughness within 10X, outer diameter 356m
Electroless plating was applied to a glass disk (soda glass) 1 having a m5 inner diameter of 7.2 mrn% and a thickness of 6 mm according to the following recipe.
先ず界面活性剤入りの水と純水により超音波洗浄したガ
ラス盤1をS。g210 g/IJ 、 HCz 10
m1/11を含む活性化割水溶液で室温で5分間処理し
た後、水洗し、続イ”’CPdCl2 o、 3 jj
/l’i IIC13ml/lを活性化処理液中に室
温で5分間浸漬した後、水洗し以下の組成の無電解ニッ
ケルメッキ浴で90℃、15分間処理し2.6μの膜厚
均一で平滑なメッキ層すなわち第1金属層2を得た。(
第1図)塩化ニッケルN1ol、、−611,,030
g/1次亜りん酸すトリウムN、ll2PO□−1−]
20 1(Jjj/IJクエン塩ソーダNa 2C61
−1507・2l−1z015 jj/ljjソーダ
N;]C21−1302’ 31(205g/lかくし
て得1つれたニッケルメッキ層2上に以下の組成の無電
解鋼メッキ液、こより20’Cて15秒浸漬し銅メッキ
層すなわち第2金属層3を800Xの厚さほどこした。First, glass plate 1 was ultrasonically cleaned using surfactant-containing water and pure water. g210 g/IJ, HCz 10
After treating with an activated water solution containing m1/11 at room temperature for 5 minutes, washing with water and continuing with
/l'i After immersing 13ml/l of IIC in the activation treatment solution at room temperature for 5 minutes, it was washed with water and treated in an electroless nickel plating bath with the following composition at 90℃ for 15 minutes to form a smooth and uniform film with a thickness of 2.6μ. A plating layer, that is, a first metal layer 2 was obtained. (
Figure 1) Nickel chloride N1ol, -611,030
g/1 thorium hypophosphite N, ll2PO□-1-]
20 1 (Jjj/IJ citric salt soda Na 2C61
-1507・2l-1z015 jj/ljj soda
N; ] C21-1302' 31 (205 g/l) An electroless steel plating solution having the following composition was applied to the nickel plating layer 2 thus obtained, and the copper plating layer was immersed for 15 seconds at 20'C. 3 to a thickness of 800X.
(第2図)
硫 酸 銅 299/1
炭酸ナトリウム 259/11
酒石酸カリウムナトリウム 140 j9/11水酸化
ナトリウム 40 g/1
37%ホルムアルデヒド 150 ml/1EDTAと
トリエタノールアミンの等モルa合物 17g/lこの
ようにして得られた無電解ニッケル層2及び無電解銅層
3て二重にメンキしたガラス盤1にスピンコーターによ
り、フォトレジスト膜4 (シブレイ社AZ 1350
J)を0.1μの厚さ均一に塗布し、乾燥後、90℃で
30分プレベイクした(第3図)。このレジスト塗布ガ
ラス盤を、精密駆動装置と■IeNeレーザーによって
レーザー光の集光スポットの焦点を自動調整する機構を
そなえたアルコンレーザー露光装置により、20rn/
secの周速一定でガラス盤を回転させつつ、出力0.
12 Wテ4575 Xの波長のレーザー光を1μのス
ポットで盤」二に集光し、回転力゛ラス盤を一定方向に
移動させることによってピッチ2,5μのスパイラル状
にレジスト膜4を露光した。AZ現像液に室温で約30
秒間浸漬して現像を行ない、レーザー光で露光された部
分を除去した(第4図)。120 ’C130分間ポス
トヘークを行なった後、このガラス盤をCry324(
19/A XNa、、5O440,5g/1196%1
1−l2S04180/l及び少量の界面活性剤を含む
エツチング液に30秒浸漬した後よく水洗した(第5図
)。さらにレジストリムーバー(シブレイ社11、1
A)でレジストを除去し、イソプロノール、フレオンで
順次洗い乾燥した。レジストてカバーされていない部分
の銅3がエツチングされ、ニッケルの下層2か現れた。(Figure 2) Copper sulfate 299/1 Sodium carbonate 259/11 Potassium sodium tartrate 140 j9/11 Sodium hydroxide 40 g/1 37% formaldehyde 150 ml/1 Equimolar a compound of EDTA and triethanolamine 17 g/l A photoresist film 4 (Sibley AZ 1350
J) was applied uniformly to a thickness of 0.1 μm, and after drying, it was prebaked at 90° C. for 30 minutes (Figure 3). This resist-coated glass disk was exposed to 20 rn/cm using an Alcon laser exposure device equipped with a precision drive device and a mechanism that automatically adjusts the focus of the laser beam spot using an IeNe laser.
While rotating the glass plate at a constant circumferential speed of sec, the output is 0.
A laser beam with a wavelength of 12W Te4575X was focused on the disc 2 with a spot of 1μ, and the resist film 4 was exposed in a spiral shape with a pitch of 2.5μ by moving the rotary force disc in a fixed direction. . Approximately 30% in AZ developer at room temperature
The film was developed by immersion for a second, and the portion exposed to laser light was removed (FIG. 4). After post-haking at 120'C for 130 minutes, the glass disk was heated with Cry324 (
19/A XNa,,5O440,5g/1196%1
After being immersed for 30 seconds in an etching solution containing 1-l2S04180/l and a small amount of surfactant, it was thoroughly washed with water (Figure 5). In addition, the registry remover (Sibley 11, 1
The resist was removed in A), washed successively with isopronol and Freon, and dried. The portions of copper 3 not covered by the resist were etched away, exposing the underlying nickel layer 2.
ニッケルはこのエツチング液によっては腐食されない。Nickel is not corroded by this etching solution.
かくしてrIJo、6μ、深さ800Xの溝が25μの
ピッチてスパイラル状に1.10”””から290 ”
戸の範囲にきざまれだ原盤が得られた(第6図)。口の
原盤を1.J:型として一回のニッケル電鋳によりスク
ンノぐ−を製作した。得られたスタンバ−はガラス原盤
に直接レジストを塗布してレーザーカッティングして得
られるマスター盤から工程の電鋳により得られる従来の
スタンバ−に比べ欠陥の数は各段に少なく、30μダの
スΔ7ノト径の5 (n wのI]eNeレーザーによ
り30μピンチでスパイラル状にスタンバ−」ニを走査
し散乱′光を検知した場合の欠陥は50μ以上の欠陥が
2個認められるのみであった。Thus, the rIJo, 6μ, 800X deep groove is spirally formed with a pitch of 25μ from 1.10"" to 290".
A notched master disk was obtained within the area of the door (Figure 6). The master of the mouth is 1. J: Sukunoggu was produced by one-time nickel electroforming as a mold. The obtained stambar has fewer defects in each step than conventional stambars obtained by electroforming from a master disk obtained by applying resist directly to a glass master disk and laser cutting. When a 5 (n w I) eNe laser with a Δ7 diameter was used to scan the stand bar in a spiral manner with a 30 μ pinch, and the scattered light was detected, only two defects larger than 50 μ were observed. .
実施例2
実施例1に使用したと同形状のガラス、円盤に実施例1
と同じ前処理およびニッケル無電解メッキを施した。こ
のニッケルメンキ層」二に以下の条件て銀のスパッタリ
ングを行ない800Xの銀層を設けた。Example 2 Glass of the same shape as used in Example 1, Example 1 on a disk
The same pretreatment and nickel electroless plating were applied. This nickel coating layer was sputtered with silver under the following conditions to form an 800X silver layer.
このようにして得られたニッケルおよび銀層を持つガラ
ス盤にスピンコーターによりフォトレジスト(ナガセ化
成社製N1)R1320)を0.1μmの厚さに均一に
塗布し、90°Gで30分ブリベイクした。このフォト
レジスト塗布ガラス盤を実施例1に用いたのと同じアル
ゴンレーザ露光装置により実施例1と同じ条件で露光し
た。N i) J) 809現像液に室温で約20秒間
浸漬して現像を行ない感光部分を除去した。130℃で
30分ポストヘークを行なった後、以下の組成のエツチ
ング液に15秒間浸漬した。A photoresist (N1, R1320, manufactured by Nagase Kasei Co., Ltd.) was applied uniformly to a thickness of 0.1 μm using a spin coater on the glass disk having the nickel and silver layers obtained in this way, and was baked at 90°G for 30 minutes. did. This photoresist-coated glass disk was exposed using the same argon laser exposure apparatus used in Example 1 under the same conditions as in Example 1. N i) J) Development was carried out by immersing it in 809 developer for about 20 seconds at room temperature, and the exposed areas were removed. After post-haking at 130° C. for 30 minutes, it was immersed in an etching solution having the following composition for 15 seconds.
無水クロム酸 5g
濃 硫 酸 5g
純 水 51
この後よく水洗し更にイソプロパツール、フレオンで順
次洗浄し乾燥した。フオ;l・ルジズト−ご保護されて
いない部分の銀がエンチングされ、ニッケルの下層が現
れた。ニッケルはこのエンチング液によっては腐食され
ない。こうして「111μm11深さ5ooXの溝が2
5μn1ピツチでスパイラル状に110 mm lから
290 v+m lの範囲に形成された。この原盤を母
型として実施例1と同じ方法でスタンバ−を得たところ
欠陥の数は実施例1の場合と同程度に少なかった。Chromic anhydride 5g Concentrated sulfuric acid 5g Pure water 51 Thereafter, it was thoroughly washed with water, further washed with isopropanol and Freon in sequence, and dried. Fo; L. Luzizto - The unprotected silver was etched away, revealing the nickel underlayer. Nickel is not corroded by this etching liquid. In this way, 2 grooves of 111 μm 11 depth 5oo
It was formed in a spiral shape with a pitch of 5 μn and a volume ranging from 110 mm 1 to 290 v+ml. When a stand bar was obtained using this master as a matrix in the same manner as in Example 1, the number of defects was as small as in Example 1.
第1〜6図は本発明による情報記録原盤の各製(図中符
号)
1ニガラス盤 2.、:第1金属層
3:m2金m層 4ニアオドレジスト
特許出願人 ダイセル化学工業株式会社鉋゛1図
第2図
第3図
第4図
第5図
第6図
手続補正書(自発)
昭和l;2年q月−JL?日
特許庁長官 若 杉 和 夫 殿
1、事件の表示
昭第1159年特許願第36334号
2、発明の名称
情報記録原盤とその製造方法
3、補正をする者
事件との関係 特許出願人
住 所 大阪府堺市鉄砲町1番地
氏 名 (290)ダイセル化学工業株式会社□□
5゜
記の通り補正する:
(1) 第4頁第3行目の「共重合」を1光重合」に補
正する。
(2)第10頁第20行目の1構成される。」の次に下
記文章を挿入する:
「上記フォトレジストはポジ型でもネガ型でもいずれで
もよい。」
(3)第14頁第15行目のr45751Jを「457
9A」に補正する。Figures 1 to 6 show various types of information recording master discs according to the present invention (numerals in the figures): 1. Nigarasu disc 2. , :First metal layer 3: m2 Gold m layer 4 near odd resist Patent applicant: Daicel Chemical Industries, Ltd. l; 2nd year q month - JL? Kazuo Wakasugi, Commissioner of the Japan Patent Office, 1. Indication of the case, Patent Application No. 36334 of 1159, 2. Title information recording master of the invention and its manufacturing method, 3. Relationship with the amendment person case. Address of patent applicant. 1 Teppo-cho, Sakai City, Osaka Prefecture Name (290) Daicel Chemical Industries, Ltd. □□ 5゜Amend as noted: (1) Correct “copolymerization” in the third line of page 4 to “1 photopolymerization” do. (2) 1 is configured on page 10, line 20. ”, insert the following sentence: “The above photoresist may be of positive type or negative type.” (3) Change r45751J on page 14, line 15 to “457
9A”.
Claims (1)
第1の金属よりなる厚さが均一で1つ表面が平滑な第1
金属層と、この第1金属層上に形成された第2の金属よ
りなり且つ周方向および/または放射方向に不連続な第
2金属層とにより構成され、上記第1の金属は」二記第
2の金属を溶解するエツチング液によっては溶解されな
い金属であることを特徴とする情報記録原盤。 2) 上記第1の金属かニッケルであり、」二記第2の
金属か銅であることを特徴とする特許請求の範囲第1項
記載の情報記録原盤。 3)上記第1の金属かニッケルであり、」−記第2の金
属が銀であることを特徴とする特許請求の範囲第1項記
載の情報記録原盤。 −で且つ表面が平滑な第1金属層を形成し、この第1金
属層上に第2の金属より成る厚さが均一な第2金属層を
形成し、この第2金属N上にフォトレジスト層を均一に
、形成し、このフォトレジスト層にレーザー光を所望パ
ターンに当てて感光させ、未硬化フォトレジストを除去
し、次いで上記第2の金属は溶解するが第1の金属は溶
解しないエツチング液を用いて上記フォトレジストが除
去された部分の第2金属層をエンチングし、次いて硬化
フォトレジストを除去することによって構成される情報
記録原盤の製造方法。 5) 上記第1金属層が無電解メッキによって形成され
ることを特徴とする特許請求の範囲第4項記載の方法。[Scope of Claims] 1) A first plate having a uniform thickness and a smooth surface, which is made of a polished glass disk and a first metal formed on the polished glass disk.
It is composed of a metal layer and a second metal layer formed on the first metal layer and discontinuous in the circumferential direction and/or the radial direction, and the first metal is An information recording master disk characterized in that the metal is not dissolved by an etching liquid that dissolves a second metal. 2) The information recording master disc according to claim 1, wherein the first metal is nickel, and the second metal is copper. 3) The information recording master disc according to claim 1, wherein the first metal is nickel, and the second metal is silver. - a first metal layer with a smooth surface is formed, a second metal layer made of a second metal with a uniform thickness is formed on the first metal layer, and a photoresist is formed on the second metal N. A layer is uniformly formed, the photoresist layer is exposed to laser light in a desired pattern, the uncured photoresist is removed, and the second metal is dissolved but the first metal is not dissolved. A method for manufacturing an information recording master disc, comprising etching the second metal layer in the portion where the photoresist has been removed using a liquid, and then removing the hardened photoresist. 5) The method of claim 4, wherein the first metal layer is formed by electroless plating.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3633484A JPS60182031A (en) | 1984-02-29 | 1984-02-29 | Information recording mother disk and its production |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3633484A JPS60182031A (en) | 1984-02-29 | 1984-02-29 | Information recording mother disk and its production |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS60182031A true JPS60182031A (en) | 1985-09-17 |
Family
ID=12466926
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3633484A Pending JPS60182031A (en) | 1984-02-29 | 1984-02-29 | Information recording mother disk and its production |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60182031A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61123035A (en) * | 1984-11-20 | 1986-06-10 | Matsushita Electric Ind Co Ltd | Negative disc for optical disc and its production |
JPS62164241A (en) * | 1986-01-16 | 1987-07-20 | Toshiba Corp | Production of recording medium |
-
1984
- 1984-02-29 JP JP3633484A patent/JPS60182031A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61123035A (en) * | 1984-11-20 | 1986-06-10 | Matsushita Electric Ind Co Ltd | Negative disc for optical disc and its production |
JPH0630170B2 (en) * | 1984-11-20 | 1994-04-20 | 松下電器産業株式会社 | Optical disc master and method of manufacturing the same |
JPS62164241A (en) * | 1986-01-16 | 1987-07-20 | Toshiba Corp | Production of recording medium |
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