JPS6364649A - Manufacture of stamper - Google Patents
Manufacture of stamperInfo
- Publication number
- JPS6364649A JPS6364649A JP20834686A JP20834686A JPS6364649A JP S6364649 A JPS6364649 A JP S6364649A JP 20834686 A JP20834686 A JP 20834686A JP 20834686 A JP20834686 A JP 20834686A JP S6364649 A JPS6364649 A JP S6364649A
- Authority
- JP
- Japan
- Prior art keywords
- stamper
- electroforming
- glass master
- glass
- master disk
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 239000011521 glass Substances 0.000 claims abstract description 35
- 238000005323 electroforming Methods 0.000 claims abstract description 21
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 30
- 229910052759 nickel Inorganic materials 0.000 claims description 14
- 229920002120 photoresistant polymer Polymers 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 9
- 230000002093 peripheral effect Effects 0.000 claims description 9
- 239000006087 Silane Coupling Agent Substances 0.000 claims description 5
- 239000011248 coating agent Substances 0.000 claims description 2
- 238000000576 coating method Methods 0.000 claims description 2
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 abstract description 5
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 8
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 238000003698 laser cutting Methods 0.000 description 4
- 230000007547 defect Effects 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- 238000001746 injection moulding Methods 0.000 description 2
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 description 2
- LAIZPRYFQUWUBN-UHFFFAOYSA-L nickel chloride hexahydrate Chemical compound O.O.O.O.O.O.[Cl-].[Cl-].[Ni+2] LAIZPRYFQUWUBN-UHFFFAOYSA-L 0.000 description 2
- 235000006408 oxalic acid Nutrition 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 101100441092 Danio rerio crlf3 gene Proteins 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- VSRIZRHGMXKDIK-UHFFFAOYSA-N nickel sulfamic acid tetrahydrate Chemical compound O.O.O.O.[Ni].S(N)(O)(=O)=O VSRIZRHGMXKDIK-UHFFFAOYSA-N 0.000 description 1
- KERTUBUCQCSNJU-UHFFFAOYSA-L nickel(2+);disulfamate Chemical compound [Ni+2].NS([O-])(=O)=O.NS([O-])(=O)=O KERTUBUCQCSNJU-UHFFFAOYSA-L 0.000 description 1
- TXRHHNYLWVQULI-UHFFFAOYSA-L nickel(2+);disulfamate;tetrahydrate Chemical compound O.O.O.O.[Ni+2].NS([O-])(=O)=O.NS([O-])(=O)=O TXRHHNYLWVQULI-UHFFFAOYSA-L 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Landscapes
- Manufacturing Optical Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は光記録媒体、光磁気記録媒体等の光情報記録媒
体用のスタンパ及びその製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a stamper for optical information recording media such as optical recording media and magneto-optical recording media, and a method for manufacturing the stamper.
近年、大容量メモリーの一つとして、光メモリの研究が
活発である。In recent years, optical memory has been actively researched as a type of large-capacity memory.
該光メモリ用ディスク原盤の製造プロセスは、ｖスタ’
Ｊ ングプロセスと呼ばれ、日経メカニカル１９８４年
４月３日号 Ｐ７５ あるいはＮａｔｉｏｎａｌ
Ｔｅｃｈｎｉｃａｌ Ｒｅｐｏｒｔ Ｖｏｌ、２
９ Ｎｏ、５ Ｏｃｔ、１９８３ Ｐ２Ｏ３に詳
細に記されている。The manufacturing process of the optical memory disk master is
Nikkei Mechanical April 3, 1984 issue P75 or National
Technical Report Vol.2
9 No. 5 Oct. 1983 P2O3.
その基本プロセスは、ガラス原盤の研摩、レジスト塗布
、レーザカッティング、現像、導体化処理、ニッケル電
鋳の工程を経るものである。なお前記参考文献中では、
マスターを製造後凹凸パターンの反転したマザー盤を製
造し、これを基に再度電鋳によりスタンパを複製するプ
ロセスが記述されて−るが、マスターをスタンパとして
も使用上問題はなく、説明も簡略化される為、ここでは
マスターをスタンパとすることで説明する。The basic process involves polishing the glass master, applying resist, laser cutting, development, conductive treatment, and nickel electroforming. In addition, in the above reference literature,
A process is described in which after manufacturing a master, a mother board with an inverted concavo-convex pattern is manufactured, and a stamper is duplicated by electroforming again based on this, but there is no problem in using the master as a stamper, and the explanation is simple. , so the explanation here assumes that the master is the stamper.
しかし前述の従来技術では、ニッケル電鋳時に導体化処
′理を施゛したガラス原盤の、内周端部又は外周端部の
いずれか一方を負電極として電鋳を行なう、従ってガラ
ス原盤とフォトレジストの密、層性が不充分であり、こ
の為高温（５０〜６０’Ｏ）酸性浴中での電鋳工程で７
オトレジスト膜が剥離したり、一部浮きが発生する。However, in the above-mentioned conventional technology, electroforming is carried out using either the inner peripheral end or the outer peripheral end of the glass master disk, which has been subjected to conductor treatment during nickel electroforming, as a negative electrode. The density and layering properties of the resist were insufficient, and for this reason, the electroforming process in a high temperature (50 to 60'O) acidic bath
The photoresist film may peel off or some parts may be lifted.
その結果、スタンパにシミやキズ等の欠陥を生じ良品が
得られないという問題点を有する。As a result, there is a problem in that defects such as stains and scratches occur on the stamper, making it impossible to obtain non-defective products.
七−こて本発明は、このような問題点を解決するもので
その目的とするところは、フォトレジストとガラス原盤
の密着性を向上し、究極的にシミやキズ等の無いスタン
パ及びその製造方法を提供することにある。7-trowel The present invention is intended to solve these problems, and its purpose is to improve the adhesion between the photoresist and the glass master, and to ultimately produce a stamper that is free from stains and scratches, and its manufacture. The purpose is to provide a method.
不発明は、鏡面研摩されたガラス原盤を、シランカップ
リング剤で表面処理し、フォトレジストを塗布した後、
信号としての凹凸パターンをレーザ光の照射により形成
し、次いで導体化処理を行なった後、ニッケル電鋳を行
なうスタンパの製造において、前記導体化処理を施した
ガラス原盤の、内周端部及び外周端部を共通の負電極と
してもッケル電鋳を行なう事を特徴とする。The invention is to surface-treat a mirror-polished glass master disk with a silane coupling agent, apply a photoresist, and then
In manufacturing a stamper in which a concavo-convex pattern as a signal is formed by laser beam irradiation, and then conductive treatment is performed, nickel electroforming is performed. It is characterized by performing Keckel electroforming using the end as a common negative electrode.
以下実施例に基づき本発明について具体的に説明する。 The present invention will be specifically described below based on Examples.
実施例−１
鏡面研摩した直径２００ ｔｗｓ ｗ内径１０聰、厚さ
６ＩＩＩＩＩツガラス原盤なＨＭＤＳ（ヘキサメチルジ
シラサザン）の雰囲気中にさらし乾燥後、ポジ型フォト
レジストＡＺ−１３５０（米国シラプレー社＃りをスピ
ンコータで７００Ｘの厚さにコートし、レーザカッティ
ングマシンによりレーザ光を照射し、半径２３〜６３圏
の範囲に、巾α８μｍ。Example-1 A mirror-polished 200 twsw inner diameter 10 mm thick 6III glass master was exposed to an atmosphere of HMDS (hexamethyldisilazane) and dried, and then a positive photoresist AZ-1350 (Silapray Co., Ltd., USA) was used. was coated with a spin coater to a thickness of 700X, and irradiated with laser light using a laser cutting machine to cover a radius of 23 to 63 mm with a width α of 8 μm.
ピッチ１．６μｍでスパイラル状に感光させた後現像し
て、深さ７ｏｏＸ、巾ＣＬｆ３μｒｎ、ピッチ１．６μ
ｍの溝を有するガラス原盤とする。After exposing it to light in a spiral pattern with a pitch of 1.6 μm, it was developed to a depth of 7ooX, a width of CLf3 μrn, and a pitch of 1.6 μm.
A glass master disk with a groove of m is used.
該ガラス原盤なマグネトロンスパッタ装置にセットし、
ニッケルを７ｏｏｉ直流スパツタする。Set the glass master in a magnetron sputtering device,
Sputter 7ooi of nickel with direct current.
かかる導体化処理を施したガラス原盤を、スルファミン
酸ニッケル浴中で電鋳を行なう。The glass master disk subjected to such a conductive treatment is subjected to electroforming in a nickel sulfamate bath.
第１図（α）は、この時のガラス原盤のセット状況を示
す上面図で、第１図（ｂ）は断面図である。FIG. 1(α) is a top view showing how the glass master is set at this time, and FIG. 1(b) is a sectional view.
１はガラス、２は溝形成部、３はセンタービン、４は電
極板、５は押えネジ、６はガイドリング、７はリード線
である。1 is glass, 2 is a groove forming part, 3 is a center bin, 4 is an electrode plate, 5 is a holding screw, 6 is a guide ring, and 7 is a lead wire.
ガラス１にセンターピン２をセットし、電極板４及びガ
イドリング６をセットした後、押えネジ５で固定し、溝
形成部２を正極に対向し、リード線７より通電する。After setting the center pin 2 on the glass 1, and setting the electrode plate 4 and guide ring 6, it is fixed with a holding screw 5, the groove forming part 2 is faced to the positive electrode, and electricity is applied from the lead wire 7.
浴温は６０℃、ニッケル濃度は５５０ ？／１． 。Bath temperature is 60℃, nickel concentration is 550? /1. .
通電電流は［ＬＩＡ／ｄｊからスタートし、１０分後に
５Ａ／Ｊ、２０分後に１５Ａ／Ｊ、５０分後に３０Ａ／
−となる様直線的に増加させた。The current to be applied starts from [LIA/dj, 5A/J after 10 minutes, 15A/J after 20 minutes, and 30A/J after 50 minutes.
It was increased linearly so that -.
２時間後に厚さＣＬ５ｔｔｕｒｒのスタンパが得られ、
電鋳工程での膜浮きもなく、シミ、キズ等の無−極めて
表面状態の良好な品質であった。After 2 hours, a stamper with a thickness of CL5tturr was obtained,
There was no film lifting during the electroforming process, and the surface was of extremely good quality with no stains or scratches.
実施例−２
鏡面研摩した直径２００１１１１ ＋内径１（１＋ｍ、
厚さ６ｍのガラス原盤をＢＳＡＣビスアセトアシド）の
雰囲気中にさらし乾燥後、ざジ型フォトレジス）ＡＺ−
１３５０（米国シラプレー社製゛）をスピンコータで５
ｓｏＸの厚さにコートし、レーザカッティングマシンに
よりレーザ光を照・射し、半径２３〜６３ＩＩＩＩＩの
範囲に、巾（１８μｍ、ピッチ２．５μｍでスパイラル
状に感光させた後現像して、深さａｓａｉ、巾１８μｍ
、ピッチ２．５μｍの溝を有するガラス原盤とする。
゛
該ガラス原盤に、無電解ニッケルメッキにより７００〜
１ｏｏｏｘのニッケル層を形成する。Example-2 Mirror polished diameter 2001111 + inner diameter 1 (1+m,
A glass master disk with a thickness of 6 m was exposed to an atmosphere of BSAC (bisacetoacid), and after drying, a diagonal photoresist (AZ-) was formed.
1350 (manufactured by Silaplay, USA) using a spin coater.
It is coated to the thickness of soX, irradiated with laser light using a laser cutting machine, exposed in a spiral shape with a width (18 μm, pitch 2.5 μm) in a radius range of 23 to 63 III, and then developed and asai, width 18μm
, a glass master disk having grooves with a pitch of 2.5 μm.
゛The glass master is plated with electroless nickel to give a coating of 700~
Form a nickel layer of 100x.
かかる導体化処理を施したガラス原盤を、１５重量％の
スルファミン酸溶液で処理した後、スルファミン酸ニッ
ケル（四水和物） ５００ ｒｉｆｔ 。The glass master disk subjected to such conductorization treatment was treated with a 15% by weight sulfamic acid solution, and then 500 rifts of nickel sulfamate (tetrahydrate) were applied.
塩化ニッケル（六水和物） ｓ ｔ７ｘ 、はう酸５０
ｆ／２．ピット防止剤α５ ｆ／ｆｔからなる浴中に、
電解ニッケルベレットを添加し電鋳を行なう。Nickel chloride (hexahydrate) s t7x, oxalic acid 50
f/2. In a bath consisting of pit inhibitor α5 f/ft,
Electrolytic nickel pellets are added and electroforming is performed.
第２図（α）は、この時のガラス原盤のセット状況を示
す上面図で、第２図（ｂ）は断面図、第２図（Ｃ）は下
面図である。FIG. 2(α) is a top view showing how the glass master is set at this time, FIG. 2(b) is a sectional view, and FIG. 2(C) is a bottom view.
１１はガラス、１２は溝形成部、１３はセンタービン、
１４は電極板、１５は押えネジ、１６はクランプ、１７
はリード線である。11 is glass, 12 is a groove forming part, 13 is a center bin,
14 is an electrode plate, 15 is a holding screw, 16 is a clamp, 17
is the lead wire.
内周部はガラス１１にセンタービン１３をセットシ、電
極板１４をセットして押えネジ１５で固定する。外周部
は同じく電極板１４を、クランプ１６により固定する。At the inner peripheral part, a center bin 13 is set on the glass 11, an electrode plate 14 is set thereon, and the holding screws 15 are used to fix the glass 11. Similarly, the electrode plate 14 is fixed on the outer peripheral portion with a clamp 16.
溝形成１１１２を正極に対向し、リード線１７より通電
する。The groove formation 1112 is opposed to the positive electrode, and electricity is applied through the lead wire 17.
浴温は５０℃９通１！電流はα１Ａ／ｄｊからスタート
し、１０分後にＩＯＡ／ｄｊ、２０分後に２０Ａ／ｄｊ
、 ５０分後に５０ Ａ／ｄｊとなる様直線的に増り
口させた。Bath temperature is 50℃ 9 times 1! The current starts from α1A/dj, after 10 minutes IOA/dj, and after 20 minutes it increases to 20A/dj.
After 50 minutes, the amount was increased linearly to 50 A/dj.
約２時間で厚さα３隔のスタンパが得られ、シミ、キス
等の無い極めて良好な品質であった。A stamper having a thickness of α3 was obtained in about 2 hours, and was of extremely good quality without any stains or kisses.
実施例−３
鏡面研摩した直径２００ ＋ｍ 、内径１０ ｔｍ 、
厚さ６臘のガラス原盤をＨＭＤＳ（ヘキサメチルジシラ
サザン）のボイリング蒸気中にさらし乾燥後、ポジ型フ
ォトレジストＡＺ−１５５０（米国シラプレー社製）を
スピンコータで７５０人の厚さにコートし、レーザカッ
ティングマシンによりレーザ光を照射し、半径２３〜６
５ｒｒｍの範囲に、巾α８μｍ、ピッチ１．６μｍでス
パイラル状に感光させた後現像して、深さ７５０Ｘ、巾
α８μｍ。Example-3 Mirror polished diameter 200 + m, inner diameter 10 tm,
A glass master disk with a thickness of 6 liters was exposed to boiling steam of HMDS (hexamethyldisilazane) and dried, then coated with positive photoresist AZ-1550 (manufactured by Silaplay, Inc., USA) to a thickness of 750 mm using a spin coater. Irradiate laser light with a laser cutting machine to create a radius of 23 to 6
It was exposed to light in a spiral shape within a range of 5 rrm with a width α of 8 μm and a pitch of 1.6 μm, and then developed to a depth of 750× and a width α of 8 μm.
ピッチ１．６μｍの溝を有するガラス原盤とする。A glass master disk having grooves with a pitch of 1.6 μm is used.
該ガラス原盤を真空蒸着装置にセットし、クロムを１０
〜ｓｏＸ成膜した後、ニッケルを７００又・成膜する。The glass master disk was set in a vacuum evaporation device, and 10% of chromium was added.
~After forming the soX film, 700 layers of nickel are formed.
かかる導体化処理を施したガラス原盤を、２０重量％の
スルファミン酸溶液で処理した後、スルファミン酸ニッ
ケル（四水和物）ａ５ｏｙ／Ｘ。The glass master disk subjected to such conductorization treatment was treated with a 20% by weight sulfamic acid solution, and then sulfamic acid nickel (tetrahydrate) a5oy/X was formed.
塩化ニッケル（六水和物） ７ ？／ｆｌ 、はう酸３
５１／１．ビット防止剤０．５？／λからなる浴中に、
電解ニッケルペレットを添加しｉａ鋳を行なう。Nickel chloride (hexahydrate) 7? /fl, oxalic acid 3
51/1. Bit inhibitor 0.5? /λ in a bath consisting of
Add electrolytic nickel pellets and perform ia casting.
ガラス原盤のセットは実施例１と同様に行ない浴温は５
５℃２通電電流はＱ、ＩＡ／−からスタートし、２０分
後に１５Ａ／Ｊ、４０分後に３０Ａ／−となる様直線的
に増加させた。The glass master was set in the same manner as in Example 1, and the bath temperature was 5.
The current applied at 5°C was started from Q, IA/-, and was linearly increased to 15 A/J after 20 minutes and to 30 A/- after 40 minutes.
約２時間で厚さ０ＬＳＨのスタンパが得られ、シミ、キ
ズ等の無い極めて良好な品質であった。A stamper with a thickness of 0LSH was obtained in about 2 hours, and was of extremely good quality without any stains or scratches.
かくして得られた実施例１〜３のスタンパを、ｉ径５．
２５インチ、厚さ１．２閣のポリカーボネート樹脂のデ
ィスクの射出成形に使用したところ、いずれのスタンパ
も５００シヨツト目と５０００シヨツト目、更にｉ ｏ
ｏｏｏシ１ット目のディスクにおいて、溝形状に殆んど
有意差はなく、良好な表面状、報を示した。The thus obtained stampers of Examples 1 to 3 were used with an i diameter of 5.
When used for injection molding of a 25-inch, 1.2 mm thick polycarbonate resin disk, both stampers produced 500th and 5000th shots, as well as io
ooo The first disc had almost no significant difference in groove shape, showing good surface condition.
〔発明の効果〕
以上詳述した如く、本発明によれば、鏡面研摩されたガ
ラス原盤を、シランカップリング剤で表面処理し、フォ
トレジストを塗布した後、信号としての凹凸パターンを
レーザ光の照射により形成し、次いで導体化処理を行な
った後、ニッケル電鋳を行なうスタンパの製造において
、前記導体化処理を施したガラス原盤の、内周端部及び
外周端部を共通の負電極としてニッケル電鋳を行なう事
により、表面にシミやキズの無いスタンパが得られ、光
情報記録媒体用サブストレートの品質向上に顕著な効果
を有する。[Effects of the Invention] As detailed above, according to the present invention, a mirror-polished glass master is surface-treated with a silane coupling agent and coated with a photoresist, and then a concavo-convex pattern as a signal is exposed to a laser beam. In manufacturing a stamper that is formed by irradiation, then subjected to conductive treatment, and then subjected to nickel electroforming, nickel is applied to the inner and outer peripheral ends of the conductive glass master disk as a common negative electrode. By performing electroforming, a stamper with no stains or scratches on the surface can be obtained, which has a remarkable effect on improving the quality of substrates for optical information recording media.
又、スタンパの厚さの均一性が高く、内部欠陥が少ない
為、前記サブストレートの射出成形時、スタンパ一枚当
シの平均射出処理量が多いという効果をも有する。Furthermore, since the thickness of the stamper is highly uniform and there are few internal defects, there is also the effect that the average injection throughput per stamper is large during injection molding of the substrate.
なお本発明の基本的な主旨は、導体化処理を施したガラ
ス原盤の、内周端部及び外周端部を共通の負電極として
ニッケル電鋳を行なう工程にありその前後の工程に依存
しない。The basic gist of the present invention is the process of performing nickel electroforming using the inner peripheral end and the outer peripheral end of a conductive-treated glass master disk as a common negative electrode, and does not depend on the steps before and after the process.
従って、実施例中では、シランカップリング剤としてＨ
ＭＤＳ 、ＢＳＡの場合を例にあげて説明したが、他の
シランカップリング剤でも可能であり、フォトレジスト
としてはざジ型のＡＺ−１３５０を例にあげて説明した
が、他のポジ型フォトレジスト、あるいはネガ型フォト
レジストでも可能である。Therefore, in the examples, H is used as a silane coupling agent.
The explanation has been given using MDS and BSA as examples, but other silane coupling agents can also be used, and although the example of AZ-1350, which is a square type photoresist, has been explained, other positive type photoresists can also be used. A resist or a negative photoresist is also possible.
又、ニッケル電鋳の条件は、本実施例の浴組成浴温、通
電条件以外でも充分その効果が発揮され良好なスタンパ
が得られた。In addition, the nickel electroforming conditions were other than the bath composition, bath temperature, and energization conditions of this example, and the effect was sufficiently exhibited and a good stamper was obtained.
第１図（αン及びＣｂ）は本発明の実施例における、導
体化処理済のガラス原盤に電鋳を行なう時のガラス原盤
のセット状況を示す上面図及び断面図。
第２図（α）及び（ｂ）は本発明の他の実施例における
、導体化処理済のガラろＷ、盤に電鋳を行なう時のガラ
ス原盤のセット状況を示す上面図及び断面図。
以上
勇 １ 図 （（１）
名 １ 図 （ｂ）FIG. 1 (alpha and Cb) is a top view and a cross-sectional view showing how a glass master disk is set when performing electroforming on a glass master disk that has been made conductive, in an embodiment of the present invention. FIGS. 2(α) and (b) are a top view and a cross-sectional view showing the setting state of a glass master disk when performing electroforming on a conductive glass plate W and a plate in another embodiment of the present invention; FIG. Isamu 1 Figure ((1) Name 1 Figure (b)
Claims (1)
表面処理し、フォトレジストを塗布した後、信号として
の凹凸パターンをレーザ光の照射により形成し、次いで
導体化処理を行なった後、ニッケル電鋳を行なうスタン
パの製造方法において、前記導体化処理を施したガラス
原盤の、内周端部及び外周端部を共通の負電極としてニ
ッケル電鋳を行なう事を特徴とするスタンパの製造方法After surface-treating the mirror-polished glass master disk with a silane coupling agent and coating it with photoresist, a concavo-convex pattern as a signal is formed by irradiation with laser light, and then conductive treatment is performed, followed by nickel electroforming. A method for manufacturing a stamper, characterized in that nickel electroforming is performed using the inner peripheral end and the outer peripheral end of the conductive-treated glass master disk as common negative electrodes.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20834686A JPS6364649A (en) | 1986-09-04 | 1986-09-04 | Manufacture of stamper |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20834686A JPS6364649A (en) | 1986-09-04 | 1986-09-04 | Manufacture of stamper |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6364649A true JPS6364649A (en) | 1988-03-23 |
Family
ID=16554753
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20834686A Pending JPS6364649A (en) | 1986-09-04 | 1986-09-04 | Manufacture of stamper |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6364649A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH028393A (en) * | 1988-06-24 | 1990-01-11 | Victor Co Of Japan Ltd | Production of metal master for information recording medium |
| JPH031968U (en) * | 1989-05-29 | 1991-01-10 | ||
| JP2015197948A (en) * | 2014-03-31 | 2015-11-09 | 株式会社Ｇｓユアサ | discharge lamp and light irradiation device using the discharge lamp |
-
1986
- 1986-09-04 JP JP20834686A patent/JPS6364649A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH028393A (en) * | 1988-06-24 | 1990-01-11 | Victor Co Of Japan Ltd | Production of metal master for information recording medium |
| JPH0575836B2 (en) * | 1988-06-24 | 1993-10-21 | Victor Company Of Japan | |
| JPH031968U (en) * | 1989-05-29 | 1991-01-10 | ||
| JP2015197948A (en) * | 2014-03-31 | 2015-11-09 | 株式会社Ｇｓユアサ | discharge lamp and light irradiation device using the discharge lamp |
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