JPH01191796A - Method for reproducing information recording disk - Google Patents
Method for reproducing information recording diskInfo
- Publication number
- JPH01191796A JPH01191796A JP1459388A JP1459388A JPH01191796A JP H01191796 A JPH01191796 A JP H01191796A JP 1459388 A JP1459388 A JP 1459388A JP 1459388 A JP1459388 A JP 1459388A JP H01191796 A JPH01191796 A JP H01191796A
- Authority
- JP
- Japan
- Prior art keywords
- plating
- information recording
- photoresist layer
- information
- nickel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims description 13
- 238000007747 plating Methods 0.000 claims abstract description 50
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 25
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 claims abstract description 11
- 229910052751 metal Inorganic materials 0.000 claims abstract description 11
- 239000002184 metal Substances 0.000 claims abstract description 11
- 238000007772 electroless plating Methods 0.000 claims abstract description 9
- 239000002738 chelating agent Substances 0.000 claims abstract description 8
- 239000003638 chemical reducing agent Substances 0.000 claims abstract description 6
- YPTUAQWMBNZZRN-UHFFFAOYSA-N dimethylaminoboron Chemical compound [B]N(C)C YPTUAQWMBNZZRN-UHFFFAOYSA-N 0.000 claims abstract description 6
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 claims abstract description 5
- 239000004471 Glycine Substances 0.000 claims abstract description 5
- 229940095064 tartrate Drugs 0.000 claims abstract description 5
- ACVYVLVWPXVTIT-UHFFFAOYSA-M phosphinate Chemical compound [O-][PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-M 0.000 claims abstract description 4
- 150000002815 nickel Chemical class 0.000 claims description 9
- KWSLGOVYXMQPPX-UHFFFAOYSA-N 5-[3-(trifluoromethyl)phenyl]-2h-tetrazole Chemical compound FC(F)(F)C1=CC=CC(C2=NNN=N2)=C1 KWSLGOVYXMQPPX-UHFFFAOYSA-N 0.000 claims description 4
- 239000000203 mixture Substances 0.000 claims description 4
- 229910001379 sodium hypophosphite Inorganic materials 0.000 claims description 4
- 230000003014 reinforcing effect Effects 0.000 claims description 2
- TVJORGWKNPGCDW-UHFFFAOYSA-N aminoboron Chemical compound N[B] TVJORGWKNPGCDW-UHFFFAOYSA-N 0.000 claims 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 claims 1
- 239000000758 substrate Substances 0.000 abstract description 4
- 150000003839 salts Chemical class 0.000 abstract 2
- 239000008139 complexing agent Substances 0.000 abstract 1
- ZZUFCTLCJUWOSV-UHFFFAOYSA-N furosemide Chemical compound C1=C(Cl)C(S(=O)(=O)N)=CC(C(O)=O)=C1NCC1=CC=CO1 ZZUFCTLCJUWOSV-UHFFFAOYSA-N 0.000 abstract 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 47
- 239000010410 layer Substances 0.000 description 24
- 229910052759 nickel Inorganic materials 0.000 description 22
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 230000002378 acidificating effect Effects 0.000 description 5
- 238000009713 electroplating Methods 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 229910000990 Ni alloy Inorganic materials 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- UORVGPXVDQYIDP-UHFFFAOYSA-N borane Chemical compound B UORVGPXVDQYIDP-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical compound O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 229910000521 B alloy Inorganic materials 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 241001460678 Napo <wasp> Species 0.000 description 1
- 241001602876 Nata Species 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- 229910001096 P alloy Inorganic materials 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 206010070834 Sensitisation Diseases 0.000 description 1
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 229910000085 borane Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- DANUORFCFTYTSZ-UHFFFAOYSA-N epinigericin Natural products O1C2(C(CC(C)(O2)C2OC(C)(CC2)C2C(CC(O2)C2C(CC(C)C(O)(CO)O2)C)C)C)C(C)C(OC)CC1CC1CCC(C)C(C(C)C(O)=O)O1 DANUORFCFTYTSZ-UHFFFAOYSA-N 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000004922 lacquer Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- KBJMLQFLOWQJNF-UHFFFAOYSA-N nickel(ii) nitrate Chemical compound [Ni+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O KBJMLQFLOWQJNF-UHFFFAOYSA-N 0.000 description 1
- DANUORFCFTYTSZ-BIBFWWMMSA-N nigericin Chemical compound C([C@@H]1C[C@H]([C@H]([C@]2([C@@H](C[C@](C)(O2)C2O[C@@](C)(CC2)C2[C@H](CC(O2)[C@@H]2[C@H](C[C@@H](C)[C@](O)(CO)O2)C)C)C)O1)C)OC)[C@H]1CC[C@H](C)C([C@@H](C)C(O)=O)O1 DANUORFCFTYTSZ-BIBFWWMMSA-N 0.000 description 1
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 230000008313 sensitization Effects 0.000 description 1
- HELHAJAZNSDZJO-OLXYHTOASA-L sodium L-tartrate Chemical compound [Na+].[Na+].[O-]C(=O)[C@H](O)[C@@H](O)C([O-])=O HELHAJAZNSDZJO-OLXYHTOASA-L 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 239000001509 sodium citrate Substances 0.000 description 1
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 1
- 239000001433 sodium tartrate Substances 0.000 description 1
- 229960002167 sodium tartrate Drugs 0.000 description 1
- 235000011004 sodium tartrates Nutrition 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Manufacturing Optical Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
〔発明の目的〕
皇呈上少剋■公団
本発明は、情報記録ディスクとくに光ディスクなどの原
盤から複製盤を製造するための金属マスターを得る方法
に関する。DETAILED DESCRIPTION OF THE INVENTION [Object of the Invention] The present invention relates to a method for obtaining a metal master for producing a duplicate disc from a master disc such as an information recording disc, particularly an optical disc.
皿米坐侠五
光ディスク等の情報記録ディスクを作成するには、たと
えば平坦なガラス基盤上にホトレジストなどの層を形成
し、光などによって情報を記録したのち現像して凹凸状
の信号パターンを形成した記録原盤を形成する。次いで
、この記録原盤の面にたとえば無電解めっきによって金
属層を形成し、更に電解めっきによって適宜の厚さの裏
打金属層を設けたのち原盤から分離して金属マスターを
得る。更に、かかる金属マスターを用い、上記と同様に
して電気めっき法を利用して成形用型を作成し、この成
形用型を用いて合成樹脂を成形することによって表面上
に信号パターンを有する複製ディスクを作成することが
行なわれている。To create information recording discs such as the Saramai Zakya Goko disc, for example, a layer of photoresist is formed on a flat glass substrate, information is recorded using light, etc., and then developed to form an uneven signal pattern. form a recorded master disc. Next, a metal layer is formed on the surface of this recording master, for example, by electroless plating, and a backing metal layer of an appropriate thickness is further provided by electrolytic plating, and then separated from the master to obtain a metal master. Furthermore, using such a metal master, a molding mold is created by electroplating in the same manner as described above, and a synthetic resin is molded using this molding mold, thereby producing a duplicate disc having a signal pattern on its surface. is being created.
このようにして原盤から複製盤を製造するに当り、ホト
レジスト層の面に無電解めっきをするが、かかるめっき
は情報信号の凹凸形状を忠実に複製する必要があること
ろから、通常ニッケルめっきが用いられる。ところが光
情報記録のためのディスクは情報密度を高めることが必
要とされるので微細で精密な情報記録をするためにポジ
型のホトレジストが用いられ、従って従来ラッカー盤の
複製などで用いられていた公知のアルカリ性無電解ニッ
ケルめっき浴ではホトレジスト層が侵され、情報の忠実
性が損われる問題があった。In manufacturing a duplicate disc from an original disc in this way, electroless plating is applied to the surface of the photoresist layer, but since such plating needs to faithfully reproduce the uneven shape of the information signal, nickel plating is usually used. used. However, discs for recording optical information need to increase the information density, so positive photoresists are used to record minute and precise information, and thus were conventionally used for duplicating lacquer discs. Known alkaline electroless nickel plating baths have the problem of corroding the photoresist layer and impairing the fidelity of information.
”° しようとする課題
そこで酸性の浴を用いて無電解ニッケルめっき層を形成
することを試みたが、たとえば従来公知の次亜リン酸塩
を還元剤とする酸性のニッケルめっき浴を用いても高温
度たとえば70℃以上でないと良好なめっきができず、
情報記録面の変形により精度が損われることを防ぐこと
ができない。Therefore, we attempted to form an electroless nickel plating layer using an acidic bath, but even if we used a conventionally known acidic nickel plating bath using hypophosphite as a reducing agent, Good plating cannot be achieved unless the temperature is high, e.g. 70°C or higher.
It is not possible to prevent accuracy from being impaired due to deformation of the information recording surface.
そしてめっき温度が低いとホトレジスト面へのニッケル
被膜の密着性が低下し、めっき層に微細なりラックが発
生すると共に部分的な剥離が起り、以後の操作に耐える
ニッケルめっき層かえられないという問題があった。When the plating temperature is low, the adhesion of the nickel film to the photoresist surface decreases, causing fine cracks and cracks in the plating layer, as well as partial peeling, resulting in the problem that the nickel plating layer cannot be replaced to withstand subsequent operations. there were.
このような事情の下で、本発明者は、ポジ型ホトレジス
ト層上に記録された情報信号を忠実に再現するために、
低温で密着性の良好なニッケル被膜層を得ることができ
る無電解ニッケルめっき浴について鋭意研究を行い、そ
の結果新たに見出した無電解ニッケルめっき浴を用いて
情報記録原盤に忠実な複製盤を製造する方法を提供しよ
うとするものである。Under these circumstances, the inventor of the present invention has developed a method for faithfully reproducing information signals recorded on a positive photoresist layer.
We conducted intensive research on electroless nickel plating baths that can obtain nickel coating layers with good adhesion at low temperatures, and as a result, we manufactured reproduction discs that were faithful to the information recording master discs using the newly discovered electroless nickel plating baths. The aim is to provide a method to do so.
課 を”°するための
かかる本発明の情報記録ディスクの複製法は、ディスク
基盤上に設けたホトレジスト層に情報信号を記録して現
像し、該情報記録面に無電解金属めっきを施したのち更
に金属補強層を形成して複製盤を製造するに当り、該無
電解めっきを、0.05〜0.15M/I!、のニッケ
ル塩、該ニッケル塩濃度の少くとも、1.5倍のモル濃
度のキレート化剤であって酒石酸塩、グリシンおよびこ
れらの混合物から選択されたもの、および、次亜リン酸
塩素かまたはジメチルアミノボランのいづれかの還元剤
の所要量を含んで、pJ(5,o〜7.0に調整された
めっき浴を用い、温度30〜60°Cの範囲内で実施す
ることを特徴とするものである。The method for duplicating information recording disks of the present invention for accomplishing the above-mentioned problems involves recording an information signal on a photoresist layer provided on a disk substrate, developing it, applying electroless metal plating to the information recording surface, and then applying electroless metal plating to the information recording surface. Furthermore, when forming a metal reinforcing layer and manufacturing a reproduction disc, the electroless plating is performed using a nickel salt of 0.05 to 0.15 M/I!, at least 1.5 times the concentration of the nickel salt. containing a molar concentration of chelating agent selected from tartrate, glycine, and mixtures thereof, and the required amount of reducing agent, either chlorine hypophosphite or dimethylaminoborane, in pJ (5 , o to 7.0, and is characterized in that it is carried out at a temperature of 30 to 60°C.
本発明において情報信号を記録したホトレジストの面に
無電解めっきをするに当って用いられるめっき浴はニッ
ケル塩を含むものであるが、かかるニッケル塩としては
たとえば硫酸ニッケル、塩化ニッケル、硝酸ニッケルな
どが用いられる。かかるニッケル塩の濃度が低すぎると
きはめっきの速度がおそく非効率であり、また高すぎる
ときはめっきの効率は頭打ちとなって寿命も長くはなく
、反って経済的ではないから、ニッケルの濃度として0
.05〜0.15M/lの範囲内にあることが望ましい
。In the present invention, the plating bath used for electroless plating on the surface of the photoresist on which information signals are recorded contains a nickel salt, and examples of such nickel salt include nickel sulfate, nickel chloride, and nickel nitrate. . If the concentration of nickel salt is too low, the plating speed will be slow and inefficient, and if it is too high, the plating efficiency will reach a plateau, the life will not be long, and it will warp, making it uneconomical. as 0
.. It is desirable that it be within the range of 0.05 to 0.15 M/l.
またニッケル塩に対して併用されるキレート化剤として
は酒石酸塩またはグリシンが好ましく、これらの混合物
であってもよい。これらのキレート化剤はホトレジスト
層とくにポジ型ホトレジスト層上に記録された情報信号
に対して変形を与えずにニッケルめっきを行なうための
望ましいめっき浴の条件、すなわちアルカリ性でないこ
とおよび低温でめっき可能であること、の2つの条件を
満たし、しかもホトレジスト層に対して密着性がよくて
ストレスクラック等の生じないニッケル被膜を与えるの
に適したものである。Further, the chelating agent used in combination with the nickel salt is preferably tartrate or glycine, and a mixture thereof may be used. These chelating agents meet the desirable plating bath conditions for performing nickel plating without deforming the information signals recorded on the photoresist layer, especially the positive photoresist layer, namely non-alkalinity and low temperature plating. It is suitable for providing a nickel film that satisfies the following two conditions, has good adhesion to the photoresist layer, and does not cause stress cracks or the like.
若しめっき浴がアルカリ性のものであればホトレジスト
層が浸食膨潤して記録された信号の形状の忠実な複製が
期待できず、まためっきを従来のように高温で行なうと
ホトレジスト層が軟化すると共に膨潤が進み易くこれま
た信号形状の正確な複製ができない。そして従来の酸性
無電解ニッケ°ルめっき浴では、低温でめっきをしよう
とするとホトレジスト層に対して密着性が満足できなか
ったのに対して、本発明におけるキレート化剤を用いる
と、上記のような酸性かつ低温というめっき条件で密着
性の優れた被膜が得られることがわかったのである。If the plating bath is alkaline, the photoresist layer will erode and swell, making it impossible to expect a faithful reproduction of the recorded signal shape.If plating is performed at high temperatures as in the past, the photoresist layer will soften and swell. Swelling tends to proceed, and the signal shape cannot be accurately reproduced. In contrast, with conventional acidic electroless nickel plating baths, adhesion to the photoresist layer could not be satisfied when plating was attempted at low temperatures, but with the use of the chelating agent of the present invention, It was discovered that a film with excellent adhesion could be obtained under plating conditions of acidic acidity and low temperature.
本発明のめっき浴に用いられるキレート化剤すなわち酒
石酸塩またはグリシンは、浴中のニッケル塩に対してモ
ル濃度で1.5倍以上用いることが必要で、これ以下で
は密着性改良効果が不充分となる。これらのキレート化
剤の使用濃度に上限は無いが、使用濃度が高過ぎては不
経済であるから実用上ニッケル塩の3倍程度以下で充分
である。The chelating agent, i.e., tartrate or glycine, used in the plating bath of the present invention needs to be used at a molar concentration of 1.5 times or more relative to the nickel salt in the bath, and if it is less than this, the adhesion improving effect is insufficient. becomes. Although there is no upper limit to the concentration of these chelating agents, it is uneconomical if the concentration is too high, so for practical purposes, it is sufficient to use the concentration at most three times that of the nickel salt.
本発明において無電解ニッケルめっき浴に用いられる還
元剤は次亜リン酸またはジメチルアミノボランのいづれ
かが好ましい。次亜リン酸塩たとえば次亜リン酸ナトリ
ウムなどを用いるときはニッケルとリンの合金の被膜が
得られるが、かかる次亜リン酸ナトリウムの使用量とし
ては10〜30g/I!、の範囲内であるのが好ましい
、使用量が少なすぎるとめっき速度が遅(なって実用的
でなく、また使用量が多すぎてもめっき速度は飽和して
利点はない、また還元剤としてジメチルアミノボランを
用いるときはニッケルとホウ素の合金の被膜が得られる
が、かかるボランの使用量としては2〜4g/I!の範
囲内であるのが好ましい。使用量が少なすぎるとめっき
速度が遅くなって実用的でなく、また使用量が多すぎて
もめっき速度は飽和して利点はない。In the present invention, the reducing agent used in the electroless nickel plating bath is preferably either hypophosphorous acid or dimethylaminoborane. When a hypophosphite salt such as sodium hypophosphite is used, a coating of an alloy of nickel and phosphorus is obtained, but the amount of sodium hypophosphite used is 10 to 30 g/I! If the amount used is too small, the plating speed will be slow (and impractical), and if the amount used is too large, the plating speed will be saturated and there will be no advantage. When dimethylaminoborane is used, a coating of nickel and boron alloy is obtained, but the amount of borane used is preferably within the range of 2 to 4 g/I!.If the amount used is too small, the plating rate will be reduced. It becomes slow and impractical, and if too much is used, the plating speed becomes saturated and there is no advantage.
本発明におけるこのようなめっき浴は、pHが5゜0〜
7.0において好ましく使用される。かかるpHの調整
のためには塩酸や水酸化ナトリウムなどを使用すること
ができる。pHが5.0よりも低くなるとめっき速度が
低下するため実用的でなく、またpHが7.0を超える
本来の目的であるホトレジスト層上の記録信号忠実性が
低下するので好ましくない。Such a plating bath in the present invention has a pH of 5°0 to
7.0 is preferably used. Hydrochloric acid, sodium hydroxide, etc. can be used to adjust the pH. If the pH is lower than 5.0, it is not practical because the plating rate decreases, and if the pH exceeds 7.0, the fidelity of the recording signal on the photoresist layer, which is the original purpose, decreases, which is not preferable.
本発明において、このようなめっき浴を用いてホトレジ
ストの信号記録面に無電解めっきを行なうに当って、浴
温は30〜60℃の範囲内であることが望ましい、浴温
か30″Cより低いときはめっき被膜の生成速度が遅く
て実用的でなく、また浴温か高くなると被膜生成速度は
早くなるが浴の寿命が短くなって不経済であると共に、
ホトレジスト層の軟化変形によって情報の忠実性が低下
する。In the present invention, when performing electroless plating on the signal recording surface of photoresist using such a plating bath, the bath temperature is preferably within the range of 30 to 60°C, and the bath temperature is lower than 30''C. In some cases, the rate of formation of the plating film is slow and impractical, and if the bath temperature increases, the rate of film formation becomes faster, but the life of the bath becomes shorter, making it uneconomical.
Softening deformation of the photoresist layer reduces information fidelity.
本発明においては、従来公知の方法に従って光信号を記
録したホトレジスト層を有する光デイスク原盤を得、こ
れに公知の前処理方法に従って増感処理を行なったのち
活性化処理し、次いで本発明における無電解ニッケルめ
っきを行なう。こうして得られたニッケルめっき被膜は
ストレスクランク等の欠陥がなく、またホトレジスト層
に対する密着性も良好であって、流水中での洗浄などに
よって被膜が剥離することもなく、次段階の電解めっき
、たとえば電解ニッケルめっきを行なうに当って何等の
支障も発生せず、忠実な複製盤を得ることができる。In the present invention, an optical disk master having a photoresist layer on which an optical signal is recorded is obtained according to a conventionally known method, and then subjected to a sensitization treatment and an activation treatment according to a known pretreatment method. Perform electrolytic nickel plating. The nickel plating film thus obtained has no defects such as stress cranks, has good adhesion to the photoresist layer, and does not peel off when washed under running water, so it can be used in the next step, such as electrolytic plating. No problems occur during electrolytic nickel plating, and a faithful reproduction disc can be obtained.
叉施開
径220mmの平滑なガラス円盤上にスピンコード法に
より厚さ0.1μmのポジ型ホトレジスト層を設けたデ
ィスク基盤を作成した。これに対してレーザー信号を照
射し、アルカリ性現像液を用いて現像し、信号記録原盤
を得た。A disk substrate was prepared by providing a positive photoresist layer with a thickness of 0.1 μm on a smooth glass disk with a fork opening diameter of 220 mm by a spin cord method. This was irradiated with a laser signal and developed using an alkaline developer to obtain a signal recording master disc.
この原盤を水洗後塩化錫増感剤で処理し、更に充分に水
洗後塩化パラジウム活性化剤で処理し、水洗した。この
ように前処理した原盤に第1表に示す組成のめっき液お
よびめっき条件で無電解ニッケルめっきを行った。After washing this master disc with water, it was treated with a tin chloride sensitizer, and then thoroughly washed with water, treated with a palladium chloride activator, and washed with water. Electroless nickel plating was performed on the thus pretreated master disc using a plating solution having the composition and plating conditions shown in Table 1.
なお、表中の記号はそれぞれ次の通りの意味を示すもの
である。The symbols in the table have the following meanings.
NaTa r :酒石酸ナトリウム
Glyニゲリシン
Na0Ac:酢酸ナトリウム
NaC1t:クエン酸ナトリウム
NaPo:次亜リン酸ナトリウム
DMAB :ジメチルアミノボラン
Q Z Z Z OZ Z Z Oo、 娩駅籐肴二の
ようにして本発明の方法により得たA−Hの無電解ニッ
ケルめっき被膜は、いづれも流水中で洗浄しても剥離を
起すことがなく、続いてニッケルの電解めっきを行なう
ことによって欠陥のない複製ディスクが得られたのに対
して、対照例のF−Gの無電解ニッケルめっき被膜は、
めっき浴から引き上げる際にすでに部分的に剥離が生じ
、水による洗浄によって剥離部分が拡大し、電解ニッケ
ルメッキを行なうことができなかった。NaTa r : Sodium tartrate Gly nigericin Na0Ac : Sodium acetate NaC1t : Sodium citrate NaPo : Sodium hypophosphite DMAB : Dimethylaminoborane Q Z Z Z Z OZ Z Z Z Oo, The method of the present invention as in the method of the method of the present invention The electroless nickel plating films of A-H obtained by the method did not peel off even when washed under running water, and by subsequent nickel electroplating, defect-free replica disks were obtained. On the other hand, the electroless nickel plating film of the control example FG,
Partial peeling had already occurred when it was taken out of the plating bath, and the peeled portion expanded when washed with water, making it impossible to perform electrolytic nickel plating.
(発明の効果〕
本発明の情報記録ディスクの複製法によれば、ホトレジ
スト層面に対して酸性乃至中性において低温度で密着性
のよい無電解ニッケルめっきができるので、ホトレジス
ト層の情報信号に変形を与えることなく忠実な複製盤を
得ることができるものである。(Effects of the Invention) According to the information recording disk duplication method of the present invention, electroless nickel plating with good adhesion can be performed on the photoresist layer surface in acidic or neutral conditions at low temperature, so that the information signal of the photoresist layer is transformed. This allows you to obtain a faithful copy without having to give up.
Claims (2)
号を記録して現像し、該情報記録面に無電解金属めっき
を施したのち更に金属補強層を形成して複製盤を製造す
るに当り、該無電解めっきを、0.05〜0.15M/
lのニッケル塩、該ニッケル塩濃度の少くとも1.5倍
のモル濃度のキレート化剤であって酒石酸塩、グリシン
およびこれらの混合物から選択されたもの、および、次
亜リン酸塩かまたはジメチルアミノボランのいづれかの
還元剤の所要量を含んで、pH5.0〜7.0に調整さ
れためっき浴を用い、温度30〜60℃の範囲内で実施
することを特徴とする情報記録ディスクの複製法。(1) When producing a copy disc by recording an information signal on a photoresist layer provided on a disc base, developing it, applying electroless metal plating to the information recording surface, and then forming a metal reinforcing layer, The electroless plating is performed at a rate of 0.05 to 0.15M/
1 of a nickel salt, a chelating agent selected from tartrate, glycine and mixtures thereof, at a molar concentration of at least 1.5 times the concentration of the nickel salt, and hypophosphite or dimethyl. An information recording disk characterized in that the plating is carried out at a temperature of 30 to 60°C using a plating bath containing the required amount of any reducing agent such as aminoborane and adjusted to pH 5.0 to 7.0. Reproduction law.
ナトリウムかまたは2〜4g/lのジメチルアミノボラ
ンである、特許請求の範囲第1項記載の情報記録ディス
クの複製法。(2) The method for duplicating an information recording disk according to claim 1, wherein the required amount of reducing agent is 10 to 30 g/l of sodium hypophosphite or 2 to 4 g/l of dimethylaminoborane.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1459388A JPH01191796A (en) | 1988-01-27 | 1988-01-27 | Method for reproducing information recording disk |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1459388A JPH01191796A (en) | 1988-01-27 | 1988-01-27 | Method for reproducing information recording disk |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01191796A true JPH01191796A (en) | 1989-08-01 |
Family
ID=11865471
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1459388A Pending JPH01191796A (en) | 1988-01-27 | 1988-01-27 | Method for reproducing information recording disk |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01191796A (en) |
-
1988
- 1988-01-27 JP JP1459388A patent/JPH01191796A/en active Pending
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