JPS634174B2 - - Google Patents
Info
- Publication number
- JPS634174B2 JPS634174B2 JP7104080A JP7104080A JPS634174B2 JP S634174 B2 JPS634174 B2 JP S634174B2 JP 7104080 A JP7104080 A JP 7104080A JP 7104080 A JP7104080 A JP 7104080A JP S634174 B2 JPS634174 B2 JP S634174B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- configuration
- plate
- lithographic
- transparent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 claims description 13
- 238000009792 diffusion process Methods 0.000 description 9
- 229910052782 aluminium Inorganic materials 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 239000011888 foil Substances 0.000 description 5
- 238000001459 lithography Methods 0.000 description 4
- 230000008719 thickening Effects 0.000 description 4
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 3
- 229910052744 lithium Inorganic materials 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 2
- 241000238631 Hexapoda Species 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
- G03C5/08—Photoprinting; Processes and means for preventing photoprinting
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Silver Salt Photography Or Processing Solution Therefor (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7104080A JPS56167135A (en) | 1980-05-28 | 1980-05-28 | Contact exposing method |
| DE19813120964 DE3120964A1 (de) | 1980-05-28 | 1981-05-26 | Kontaktbelichtungsverfahren |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7104080A JPS56167135A (en) | 1980-05-28 | 1980-05-28 | Contact exposing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS56167135A JPS56167135A (en) | 1981-12-22 |
| JPS634174B2 true JPS634174B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1988-01-27 |
Family
ID=13449003
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7104080A Granted JPS56167135A (en) | 1980-05-28 | 1980-05-28 | Contact exposing method |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPS56167135A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
| DE (1) | DE3120964A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58188659A (ja) * | 1982-04-30 | 1983-11-04 | Toppan Printing Co Ltd | 太りパタ−ンの作成方法 |
| JPS59179038U (ja) * | 1983-05-17 | 1984-11-30 | サカタインクス株式会社 | 太らせ文字作成用写真焼付装置 |
| EP0409169A3 (en) * | 1989-07-20 | 1992-03-25 | Ciba-Geigy Ag | Exposing method |
| CN102591156B (zh) * | 2011-12-05 | 2015-05-20 | 深圳市华星光电技术有限公司 | 曝光装置及曝光方法 |
| US9041909B2 (en) * | 2011-12-05 | 2015-05-26 | Shenzhen China Star Optoelectronics Technology Co., Ltd. | Exposure apparatus and exposure method |
| CN102436150A (zh) * | 2011-12-15 | 2012-05-02 | 深圳市华星光电技术有限公司 | 曝光装置及曝光方法 |
| US9383650B2 (en) * | 2011-12-15 | 2016-07-05 | Shenzhen China Star Optoelectronics Technology Co., Ltd. | Exposure apparatus and exposure method |
-
1980
- 1980-05-28 JP JP7104080A patent/JPS56167135A/ja active Granted
-
1981
- 1981-05-26 DE DE19813120964 patent/DE3120964A1/de not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| JPS56167135A (en) | 1981-12-22 |
| DE3120964A1 (de) | 1982-04-08 |