JPS6339930U - - Google Patents
Info
- Publication number
- JPS6339930U JPS6339930U JP13297386U JP13297386U JPS6339930U JP S6339930 U JPS6339930 U JP S6339930U JP 13297386 U JP13297386 U JP 13297386U JP 13297386 U JP13297386 U JP 13297386U JP S6339930 U JPS6339930 U JP S6339930U
- Authority
- JP
- Japan
- Prior art keywords
- infrared
- heating means
- heat treatment
- infrared heating
- treatment apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010438 heat treatment Methods 0.000 claims description 8
- 239000004065 semiconductor Substances 0.000 claims description 2
- 239000000758 substrate Substances 0.000 claims 1
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 1
Landscapes
- Resistance Heating (AREA)
- Recrystallisation Techniques (AREA)
Description
第１図は本考案実施例の赤外線熱処理装置の断
面図、第２図は本考案実施例の赤外線加熱手段の
上面図、第３図、第４図は従来の赤外線熱処理装
置の断面図、第５図は従来のウエハ面内の温度分
布図である。
３……透明石英製チユーブ、４……半導体ウエ
ハ、５……透明石英製サセプタ、８……反射板、
９，１０，１１，１２，１３，１４，１５，１６
，１７……赤外線加熱手段。
FIG. 1 is a sectional view of an infrared heat treatment apparatus according to an embodiment of the present invention, FIG. 2 is a top view of an infrared heating means according to an embodiment of the present invention, and FIGS. 3 and 4 are sectional views of a conventional infrared heat treatment apparatus. FIG. 5 is a conventional temperature distribution diagram within the wafer surface. 3...Transparent quartz tube, 4...Semiconductor wafer, 5...Transparent quartz susceptor, 8...Reflector,
9, 10, 11, 12, 13, 14, 15, 16
, 17... Infrared heating means.
Claims (1)
処理する赤外線熱処理装置において、 前記赤外線加熱手段は同心円状に配置されると
ともに群に分けてまたは個々に制御されることを
特徴とする赤外線熱処理装置。[Claims for Utility Model Registration] In an infrared heat treatment apparatus for heat-treating a semiconductor substrate using a plurality of infrared heating means, the infrared heating means are arranged concentrically and controlled in groups or individually. Features of infrared heat treatment equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13297386U JPS6339930U (en) | 1986-08-29 | 1986-08-29 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13297386U JPS6339930U (en) | 1986-08-29 | 1986-08-29 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6339930U true JPS6339930U (en) | 1988-03-15 |
Family
ID=31032856
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13297386U Pending JPS6339930U (en) | 1986-08-29 | 1986-08-29 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6339930U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0268479A (en) * | 1988-09-02 | 1990-03-07 | Pioneer Electron Corp | Device for drying original plate of optical disk by heating |
| JP2008010883A (en) * | 2007-08-10 | 2008-01-17 | Matsushita Electric Ind Co Ltd | Method and apparatus for heat treatment by light irradiation |
-
1986
- 1986-08-29 JP JP13297386U patent/JPS6339930U/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0268479A (en) * | 1988-09-02 | 1990-03-07 | Pioneer Electron Corp | Device for drying original plate of optical disk by heating |
| JP2008010883A (en) * | 2007-08-10 | 2008-01-17 | Matsushita Electric Ind Co Ltd | Method and apparatus for heat treatment by light irradiation |
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