JPS6339128A - Magnetic recording medium - Google Patents
Magnetic recording mediumInfo
- Publication number
- JPS6339128A JPS6339128A JP18298286A JP18298286A JPS6339128A JP S6339128 A JPS6339128 A JP S6339128A JP 18298286 A JP18298286 A JP 18298286A JP 18298286 A JP18298286 A JP 18298286A JP S6339128 A JPS6339128 A JP S6339128A
- Authority
- JP
- Japan
- Prior art keywords
- chromium
- iron
- magnetic
- alloy
- cobalt
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims abstract description 37
- 239000000758 substrate Substances 0.000 claims abstract description 22
- 229910052742 iron Inorganic materials 0.000 claims abstract description 18
- 239000010941 cobalt Substances 0.000 claims abstract description 16
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims abstract description 16
- 229910017052 cobalt Inorganic materials 0.000 claims abstract description 15
- 229910000599 Cr alloy Inorganic materials 0.000 claims abstract description 10
- 239000000788 chromium alloy Substances 0.000 claims abstract description 9
- 239000010409 thin film Substances 0.000 claims description 24
- 229910052782 aluminium Inorganic materials 0.000 claims description 12
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 12
- 229910000531 Co alloy Inorganic materials 0.000 claims description 7
- 238000007747 plating Methods 0.000 claims description 5
- 230000003647 oxidation Effects 0.000 claims 1
- 238000007254 oxidation reaction Methods 0.000 claims 1
- 238000004544 sputter deposition Methods 0.000 abstract description 26
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 abstract description 20
- 229910052804 chromium Inorganic materials 0.000 abstract description 20
- 239000011651 chromium Substances 0.000 abstract description 20
- 239000013077 target material Substances 0.000 abstract description 8
- 229910000640 Fe alloy Inorganic materials 0.000 abstract description 7
- 229910045601 alloy Inorganic materials 0.000 abstract description 7
- 239000000956 alloy Substances 0.000 abstract description 7
- UPHIPHFJVNKLMR-UHFFFAOYSA-N chromium iron Chemical compound [Cr].[Fe] UPHIPHFJVNKLMR-UHFFFAOYSA-N 0.000 abstract description 5
- 239000000463 material Substances 0.000 abstract description 5
- 229910019589 Cr—Fe Inorganic materials 0.000 abstract description 2
- 238000000407 epitaxy Methods 0.000 abstract 1
- 239000010408 film Substances 0.000 description 7
- 230000008018 melting Effects 0.000 description 5
- 238000002844 melting Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 229910018104 Ni-P Inorganic materials 0.000 description 3
- 229910018536 Ni—P Inorganic materials 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 239000000696 magnetic material Substances 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 229910018487 Ni—Cr Inorganic materials 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 230000008646 thermal stress Effects 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 238000002048 anodisation reaction Methods 0.000 description 1
- 229910001566 austenite Inorganic materials 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 229910001004 magnetic alloy Inorganic materials 0.000 description 1
- 239000006247 magnetic powder Substances 0.000 description 1
- 230000005415 magnetization Effects 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は磁気記録媒体に関し、特にコバルト又はコバル
ト合金磁性薄膜の下地層としてクロム−鉄合金薄膜とす
ることにより、該下地層薄膜をスパッタリングによりア
ルミニウム基板上へ施す際の生産性を向上させたもので
ある。Detailed Description of the Invention [Field of Industrial Application] The present invention relates to a magnetic recording medium, and in particular, by using a chromium-iron alloy thin film as the underlayer of a cobalt or cobalt alloy magnetic thin film, the underlayer thin film can be formed by sputtering. This improves productivity when applying on aluminum substrates.
電子計算機の記録装置に用いられる磁気記録媒体として
は、一般にアルミニウム合金からなる基板の表面に磁性
体を被覆したものが用いられている。このような磁気記
録媒体は基板を所定の厚さに加工した後、表面を鏡面研
磨してからγ−FhOs。2. Description of the Related Art Magnetic recording media used in recording devices for electronic computers generally include a substrate made of an aluminum alloy whose surface is coated with a magnetic material. Such magnetic recording media are manufactured by processing a substrate to a predetermined thickness, mirror-polishing the surface, and then polishing the surface with γ-FhOs.
コバルトをドープしたγ−Fe、 O,等の磁性体粉末
と樹脂粉末の混合物を塗布し、しかる後加熱処理して磁
性体膜を形成することにより造られている。It is manufactured by applying a mixture of cobalt-doped magnetic powder such as γ-Fe, O, etc. and resin powder, and then heat-treating it to form a magnetic film.
近年磁気記録媒体は大容量化、高密度化が要請されるよ
うになり、このため1ビット当りの磁化領域は益々微小
化されると共に、磁性体膜にも薄膜化が望まれるように
なった。In recent years, magnetic recording media have been required to have larger capacities and higher densities, and as a result, the magnetized area per bit has become smaller and smaller, and magnetic films are also desired to be thinner. .
このため基板を所定の厚さに加工した後、表面を清面加
工してから磁性体被覆のための下地処理(第一次下地層
)として、硬質非磁性金属、例えばNi−P合金を無電
解メンキするか或いは陽極酸化処理を施し、しかる後化
学的メッキ、又は蒸着、スパッタリング等の物理的メッ
キにより磁性体薄膜を被覆した磁気記録媒体が提案され
ており、更に前記下地処理を施さずに基板上に直接磁性
体薄膜を被覆する方法も提案されている。For this reason, after processing the substrate to a predetermined thickness, the surface is cleaned and then a hard non-magnetic metal such as a Ni-P alloy is coated as a base treatment (primary base layer) for coating with magnetic material. Magnetic recording media have been proposed that are electrolytically peeled or anodized, and then coated with a magnetic thin film by chemical plating or physical plating such as vapor deposition or sputtering. A method of directly coating a substrate with a magnetic thin film has also been proposed.
而して、前記磁性体薄膜の被覆方法の内スパッタリング
は信頼性が高く、合金薄膜が作製可能である等の利点を
有しており、最近注目されている。The internal sputtering method for coating the magnetic thin film has been attracting attention recently because it has advantages such as high reliability and the ability to produce alloy thin films.
又磁性膜の材質としてはコバルト及びコバルト合金が優
れているが、水平方向即ち磁性面内での磁気特性を良く
する為に、斜め蒸着を行なったり、コバルト系磁性膜の
下地層(第二次下地層)として純クロム薄膜を施すこと
が行なわれている。而して・・−ドディスク等の磁気記
録媒体の製造においでは、斜め蒸着法は装置が複雑にな
りすぎて操業上困難であり、専ら後者の方法が行なわれ
ている。この方法で磁気特性が向上するのは、基板上に
蒸着又はスパッタリングしたクロム結晶(体心立方格子
)の(110)面が基板に平行に成長し、この面上に磁
性体としてのコバルト又はコノ(ルト合金を蒸着又はス
パッタリングすることにより、コバルト(稠密六方格子
)の容易磁化軸であるC軸が基板面に平行になるように
エピタキシャル成長するだめであり、J、 DAVAL
、 D、RANDET(IEEETRANSACTIO
NS ON MACNET工C3,VOL、、 MAG
−6,、No、lt。Cobalt and cobalt alloys are excellent materials for magnetic films, but in order to improve the magnetic properties in the horizontal direction, that is, in the magnetic plane, oblique evaporation is performed, and the underlayer (secondary layer) of the cobalt-based magnetic film is used. A pure chromium thin film is applied as an underlayer (base layer). However, in the production of magnetic recording media such as hard disks, the oblique deposition method requires too complicated equipment and is difficult to operate, so the latter method is exclusively used. This method improves magnetic properties because the (110) plane of a chromium crystal (body-centered cubic lattice) deposited or sputtered on the substrate grows parallel to the substrate, and on this plane cobalt or cobalt as a magnetic material is grown. (By evaporating or sputtering a metal alloy, it is possible to grow epitaxially so that the C axis, which is the axis of easy magnetization of cobalt (close-packed hexagonal lattice), is parallel to the substrate surface. J, DAVAL
,D,RANDET(IEEEETRANSACTIO
NS ON MACNET C3, VOL, MAG
-6,,No,lt.
1970)等により称えられている。彼等はコノ(ルト
及びクロム薄膜を蒸着で形成しているが、最近はスパッ
タリング装置を用い、磁性膜にCo−Ni−Cr合金膜
を形成することにより、磁気特性、耐食性を改善すると
共に、第二次下地層としての純クロムの膜厚を薄くし、
クロムターゲットの使用量を削減することが試みられて
いる(山田、谷、石川、太田、中村、伊藤、昭和60年
度電子通信学会総合全国大会1−199)。尚この様な
磁性合金薄膜の形成においては、添加元素の蒸気圧に差
があるため蒸着法の適用は困難で、一般にスパッタリン
グ法が用いられている。1970) and others. They form Co-Ni-Cr thin films by vapor deposition, but recently they have used sputtering equipment to form Co-Ni-Cr alloy films on magnetic films, improving magnetic properties and corrosion resistance. By reducing the thickness of pure chromium as the secondary underlayer,
Attempts have been made to reduce the amount of chromium target used (Yamada, Tani, Ishikawa, Ota, Nakamura, Ito, 1985 IEICE General National Conference 1-199). In forming such a magnetic alloy thin film, it is difficult to apply a vapor deposition method because of the difference in vapor pressure of the added elements, and a sputtering method is generally used.
前述の第二次下地層として純クロムをスパッタリングし
た磁気記録媒体において、従来は純クロム薄膜をアルミ
ニウム基板上へ施す際、生産性の点で問題があった。即
ちスパッタリングする際にパワーを上げすぎるとターゲ
ット表面の温度が上昇し、水冷されているターゲット裏
面との熱膨張の差によって熱応力を生じるが、純クロム
は脆いためにこの熱応力によってターゲットに割れが入
り易く、スパッタリング速度を上げることが出来なかっ
た。そのため生産性が上らず、磁気記録媒体の価格を低
下させることが困難であった。In the magnetic recording medium in which pure chromium is sputtered as the secondary underlayer described above, there has conventionally been a problem in terms of productivity when forming a pure chromium thin film on an aluminum substrate. In other words, if the power is increased too much during sputtering, the temperature of the target surface will rise, causing thermal stress due to the difference in thermal expansion from the water-cooled back surface of the target, but since pure chromium is brittle, this thermal stress can cause the target to crack. It was not possible to increase the sputtering speed. As a result, productivity has not increased and it has been difficult to reduce the price of magnetic recording media.
又純クロムは融点が高く、脆いので、溶解、鋳造、圧延
法でターゲノー動造することが困難で、粉末焼結法で製
造していたため、ターゲット自体の価格も高価であった
。Furthermore, since pure chromium has a high melting point and is brittle, it is difficult to form a target by melting, casting, or rolling, and since it is produced by a powder sintering method, the target itself is expensive.
C問題点を解決するだめの手段〕
本発明はこの様な問題点を解決するため鋭意研究の結果
得られたものであり、アルミニウム基板上にコバルト又
はコバルト合金磁性薄膜を有する磁気記録媒体において
、該磁性薄膜の下地層として鉄を3.0〜30.0 w
t%含有するクロム合金薄膜を施すことを特徴とする磁
気記録媒体である。[Means for Solving Problem C] The present invention was obtained as a result of intensive research to solve these problems, and is a magnetic recording medium having a cobalt or cobalt alloy magnetic thin film on an aluminum substrate. 3.0 to 30.0 w of iron as the underlayer of the magnetic thin film
This magnetic recording medium is characterized by being coated with a chromium alloy thin film containing t%.
本発明者は、クロムの結晶構造を余り変えることがなく
、クロムターゲツト材の靭性を増大させ得るような添加
元素を種々探索した結果、鉄が最も優れていることを見
出した。即ちクロムに鉄を添加したCr−Fe合金ター
ゲツト材とすることによりターゲツト材の靭性を増大す
ることができ、スパッタリング速度を上げてもターゲッ
トに割れが入らなく、従って磁気ディスクの生産性を大
巾に向上させることが出来る。又鉄は常温でクロムと同
じ体心立方格子を有し、格子定数もほぼ同じであり、ク
ロム−鉄合金の下地上にコバルト系材料をスパッタリン
グする際にコバルトのC軸が基板面に平行になる様にエ
ピタキシャル成長するのを阻害しなく、純クロムの上に
コバルト系材料をスパッタリングした場合とほぼ同等の
磁気特性が得られる。更にクロムに鉄を添加した0r−
Fe合金とすることにより、ターゲツト材の靭性が増大
すると共に融点も下るので、ターゲツト材を溶解、鋳造
で容易に製造出来る様になり、ターゲット自体の価格も
低下させることが出来る。The present inventor searched for various additive elements that could increase the toughness of the chromium target material without significantly changing the crystal structure of chromium, and found that iron was the best. In other words, by using a Cr-Fe alloy target material in which iron is added to chromium, the toughness of the target material can be increased, and even if the sputtering speed is increased, the target will not crack, thus greatly increasing the productivity of magnetic disks. can be improved. In addition, iron has the same body-centered cubic lattice as chromium at room temperature and has almost the same lattice constant, so when sputtering a cobalt-based material onto a chromium-iron alloy substrate, the C axis of cobalt is parallel to the substrate surface. Thus, epitaxial growth is not inhibited, and magnetic properties almost equivalent to those obtained by sputtering a cobalt-based material on pure chromium can be obtained. Furthermore, 0r- which added iron to chromium
By using Fe alloy, the toughness of the target material increases and the melting point decreases, so the target material can be easily manufactured by melting and casting, and the price of the target itself can be reduced.
本発明において、0r−Fe合金ターゲツト材の鉄添加
量をう、0〜30. 0wt%の範囲内に限定したのは
、3. 0wt%未満では靭性の増大が不充分でスパッ
タリング速度を上げることが出来なく、又300wt%
を超えると下地層のクロム合金が磁性を帯びてノイズ等
の原因となるからである。In the present invention, the amount of iron added to the Orr-Fe alloy target material is 0 to 30. The reason why it was limited to 0wt% was 3. If it is less than 0 wt%, the increase in toughness is insufficient and the sputtering rate cannot be increased, and if it is less than 30 wt%
This is because if it exceeds 100%, the chromium alloy of the underlayer becomes magnetic, causing noise and the like.
本発明の磁気記録媒体は、アルミニウム基板を所定の厚
さに加工した後、表面を鏡面加工してから第一次下地層
として、硬質非磁性金属、例えばNi−P合金を無電解
メッキするか或いは陽極酸化処理を施し、しかる後に第
二次下地層として0゜05−0.4 p mのクロム−
鉄(′3.0〜30. 0wt% )合金薄膜をスパッ
タリングし、その上に0,05〜0、2μm程度のコバ
ルト又はコバルト合金磁性薄膜をスパッタリング、メッ
キ等により施すことにより得られるが、第一次下地層を
施さずに、鏡面加工したアルミニウム基板上に直接第二
次下地層としてのクロム−鉄合金をスパッタリングして
もさしつかえない。The magnetic recording medium of the present invention is produced by processing an aluminum substrate to a predetermined thickness, mirror-finishing the surface, and then electrolessly plating a hard non-magnetic metal, such as a Ni-P alloy, as a primary underlayer. Alternatively, anodization treatment may be applied, followed by 0.05-0.4 pm of chromium as a secondary underlayer.
It can be obtained by sputtering an iron ('3.0 to 30.0 wt%) alloy thin film and then applying a cobalt or cobalt alloy magnetic thin film of about 0.05 to 0.2 μm by sputtering, plating, etc. It is also possible to sputter a chromium-iron alloy as a second underlayer directly onto a mirror-finished aluminum substrate without applying a first underlayer.
以下に本発明の実施例について説明する。 Examples of the present invention will be described below.
第1表に示す様にクロムに鉄を0〜35wt%添加して
、0.5気圧のArガス中で高周波溶解後鉄製の金型に
鋳造し、厚さ15+nm、巾220圏、長さ220m+
の鋳塊を得た。この鋳塊を機械加工により厚さ6鰭、直
径200mmの円板に仕上げ、第1図に示すマグネトロ
ンスパッタリング装置にセットしてターゲットとして使
用した。第1図において、1はターゲット、2はアルミ
ニウム基板、うは銅プレート、ヰa、IIbは磁石であ
る。直径525”のアルミニウム基板2を鏡面研磨後筒
−次下地層としてNi−P無電解メッキを施し、その上
に第二次下地層として前記クロム−鉄合金のターゲット
1を用いて、01μmスパッタリングした。As shown in Table 1, iron is added to chromium in an amount of 0 to 35 wt%, and after high-frequency melting in Ar gas at 0.5 atmospheres, it is cast into an iron mold with a thickness of 15+ nm, a width of 220 mm, and a length of 220 m+.
An ingot was obtained. This ingot was machined into a disk with a thickness of 6 fins and a diameter of 200 mm, which was set in a magnetron sputtering apparatus shown in FIG. 1 and used as a target. In FIG. 1, 1 is a target, 2 is an aluminum substrate, 2 is a copper plate, and Ia and IIb are magnets. After mirror-polishing an aluminum substrate 2 with a diameter of 525'', Ni-P electroless plating was applied as a second base layer, and sputtering was performed to a thickness of 01 μm using the chromium-iron alloy target 1 as a second base layer. .
その際ターゲット1に割れが発生することなくスパッタ
リングが行なえる最高のスパッタリング速度を測定した
結果を第1表に示す。而して前記クロム合金下地層の上
にCO−30at%Ni−7,5at%Cr合金を0.
1μmスパッタリングし、更に保護膜としてCを0.0
3μmスパッタリングして本発明の磁気記録媒体を得た
。該磁気記録媒体について最外周トラックの2.5 K
Hzにおける再生出力を測定した結果を第1表に併記し
た。Table 1 shows the results of measuring the highest sputtering speed at which sputtering could be performed without cracking the target 1. Then, a CO-30 at% Ni-7,5 at% Cr alloy was deposited on the chromium alloy base layer.
1 μm sputtering, and additionally 0.0 µm of C as a protective film.
A magnetic recording medium of the present invention was obtained by sputtering to a thickness of 3 μm. 2.5 K of the outermost track of the magnetic recording medium
The results of measuring the reproduction output at Hz are also listed in Table 1.
第 1 表
1 1 組成(wt%) 最高スパッタ
リング 再生出力1 ” Fe cr 速
度(μmV/min ) (m V )1 3#
0 残 0.21 2.70本
2 3.Or O,252,71□
1発・310.Oz O,292,69明 1
+ 13.0’ p O,312,
68例 5 20.Oz O,332
,66625,0z O,372,61
7う0.0 1 0.4
う 2.う6比 s
ol 残 0・082・71較 9
2.Oz O,092,70例 10
33.0 1 0.145 1.
90従−110残 0.08 2°
70焼 1来
結
側聞
第1表から明らかなように、鉄を3.0〜50.0wt
%含有するクロム−鉄合金をターゲットとして使用した
本発明例N(L 1〜7においては、純クロムの鋳造品
を使用した比較例N118、純クロムより粉末焼結法に
よジターゲットを製造したN[Lll(従来例)に比べ
て、アルミニウム基板上へのスパッタリング速度が著し
く速くなっている。父上記N(L1〜7は純クロムをス
パッタリングしたN[Lllとほとんど変らない再生出
力を示しており、磁気特性も従来例とほぼ同等である。Table 1 1 Composition (wt%) Maximum sputtering Reproduction output 1” Fe cr Speed (μmV/min) (mV) 1 3#
0 remaining 0.21 2.70 pieces
2 3. Or O, 252, 71□ 1 shot/310. Oz O,292,69 Ming 1
+ 13.0' p O, 312,
68 cases 5 20. Oz O, 332
,66625,0z O,372,61
7 U0.0 1 0.4
U 2. U6 ratio s
ol remaining 0.082.71 comparison 9
2. Oz O, 092, 70 cases 10
33.0 1 0.145 1.
90 minor - 110 remaining 0.08 2°
As is clear from Table 1, 3.0 to 50.0 wt of iron was used.
Example N of the present invention using a chromium-iron alloy containing % as a target (L 1 to 7, Comparative Example N118 using a cast product of pure chromium, ditarget manufactured by powder sintering method from pure chromium) Compared to N[Lll (conventional example), the sputtering speed on the aluminum substrate is significantly faster.The above N(L1 to 7 show almost the same reproduction output as N[Lll) sputtered with pure chromium. The magnetic properties are also almost the same as those of the conventional example.
一方鉄添加量が本発明の請求範囲よりも少ない比較測高
9は、従来例NcL11に比べてスパッタリング速度が
速くなっていなく、又鉄添加量が本発明の範囲よりも多
い比較測高10は、Nα11に比べてスパッタリング速
度は速くなっているが、再生出力が低下している。On the other hand, comparative height measurement 9, in which the amount of iron added is less than the claimed range of the present invention, does not have a faster sputtering speed than conventional example NcL11, and comparative height measurement 10, in which the amount of iron added is higher than the range of the present invention, is , Nα11, the sputtering speed is faster, but the reproduction output is lower.
:、 このように本発明によれば、アルミニウム基板
上にコバルト又はコバルト合金磁性薄膜を有する磁気記
録媒体において、該磁性薄膜の下地層としてクロム系薄
膜をスパッタリングする際のスパッタリング速度を著し
く上げることが出来、磁気ディスクの生産性が大巾に向
上する。As described above, according to the present invention, in a magnetic recording medium having a cobalt or cobalt alloy magnetic thin film on an aluminum substrate, it is possible to significantly increase the sputtering speed when sputtering a chromium-based thin film as an underlayer of the magnetic thin film. This greatly improves the productivity of magnetic disks.
第1図は本発明に用いだマグネトロンスパッタリング装
置の断面図である。
1・・・・・・ターゲット、2・・・・・・アルミニウ
ム基板、う・・・・・・銅プレート、4a・・・・・・
磁石、4b・・・・・・磁石特許出願人 古河電気工
業株式会社
第1図FIG. 1 is a sectional view of a magnetron sputtering apparatus used in the present invention. 1...Target, 2...Aluminum substrate, U...Copper plate, 4a...
Magnet, 4b... Magnet patent applicant Furukawa Electric Co., Ltd. Figure 1
Claims (3)
磁性薄膜を有する磁気記録媒体において、該磁性薄膜の
下地層として鉄を3.0〜30.0wt%含有するクロ
ム合金薄膜を施すことを特徴とする磁気記録媒体。(1) A magnetic recording medium having a cobalt or cobalt alloy magnetic thin film on an aluminum substrate, characterized in that a chromium alloy thin film containing 3.0 to 30.0 wt% iron is applied as an underlayer of the magnetic thin film. recoding media.
施した後、二次下地層として鉄を3.0〜30.0wt
%含有するクロム合金薄膜を施すことを特徴とする特許
請求の範囲第1項記載の磁気記録媒体。(2) After plating the aluminum substrate as a primary base layer, 3.0 to 30.0wt of iron is applied as a secondary base layer.
2. The magnetic recording medium according to claim 1, further comprising a chromium alloy thin film containing % of chromium alloy.
処理を施した後、二次下地層として鉄を3.0〜30.
0wt%含有するクロム合金薄膜を施すことを特徴とす
る特許請求の範囲第1項記載の磁気記録媒体。(3) After performing anodic oxidation treatment on the aluminum substrate as a primary base layer, iron is applied as a secondary base layer of 3.0 to 30%.
2. The magnetic recording medium according to claim 1, further comprising a chromium alloy thin film containing 0 wt%.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18298286A JPS6339128A (en) | 1986-08-04 | 1986-08-04 | Magnetic recording medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18298286A JPS6339128A (en) | 1986-08-04 | 1986-08-04 | Magnetic recording medium |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6339128A true JPS6339128A (en) | 1988-02-19 |
Family
ID=16127694
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18298286A Pending JPS6339128A (en) | 1986-08-04 | 1986-08-04 | Magnetic recording medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6339128A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63200316A (en) * | 1987-02-14 | 1988-08-18 | Sumitomo Special Metals Co Ltd | Magnetic recording medium |
SG131748A1 (en) * | 2002-09-02 | 2007-05-28 | Inst Data Storage | Method of fabricating l10 ordered fept films with as a magnetic recording media |
-
1986
- 1986-08-04 JP JP18298286A patent/JPS6339128A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63200316A (en) * | 1987-02-14 | 1988-08-18 | Sumitomo Special Metals Co Ltd | Magnetic recording medium |
JPH0451884B2 (en) * | 1987-02-14 | 1992-08-20 | Sumitomo Spec Metals | |
SG131748A1 (en) * | 2002-09-02 | 2007-05-28 | Inst Data Storage | Method of fabricating l10 ordered fept films with as a magnetic recording media |
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