JPS6335711B2 - - Google Patents

Info

Publication number
JPS6335711B2
JPS6335711B2 JP53128345A JP12834578A JPS6335711B2 JP S6335711 B2 JPS6335711 B2 JP S6335711B2 JP 53128345 A JP53128345 A JP 53128345A JP 12834578 A JP12834578 A JP 12834578A JP S6335711 B2 JPS6335711 B2 JP S6335711B2
Authority
JP
Japan
Prior art keywords
flat plate
heat
wafer
plate member
heat source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP53128345A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5555536A (en
Inventor
Kensuke Nakada
Takehisa Nitsuta
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP12834578A priority Critical patent/JPS5555536A/ja
Publication of JPS5555536A publication Critical patent/JPS5555536A/ja
Publication of JPS6335711B2 publication Critical patent/JPS6335711B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
JP12834578A 1978-10-20 1978-10-20 Device for treating surface under vacuum Granted JPS5555536A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12834578A JPS5555536A (en) 1978-10-20 1978-10-20 Device for treating surface under vacuum

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12834578A JPS5555536A (en) 1978-10-20 1978-10-20 Device for treating surface under vacuum

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP10458684A Division JPS6024019A (ja) 1984-05-25 1984-05-25 表面処理装置

Publications (2)

Publication Number Publication Date
JPS5555536A JPS5555536A (en) 1980-04-23
JPS6335711B2 true JPS6335711B2 (enExample) 1988-07-15

Family

ID=14982503

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12834578A Granted JPS5555536A (en) 1978-10-20 1978-10-20 Device for treating surface under vacuum

Country Status (1)

Country Link
JP (1) JPS5555536A (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6029166U (ja) * 1983-08-03 1985-02-27 日本真空技術株式会社 真空装置に於ける基板加熱装置
JPS6024019A (ja) * 1984-05-25 1985-02-06 Hitachi Ltd 表面処理装置
US6087632A (en) * 1999-01-11 2000-07-11 Tokyo Electron Limited Heat processing device with hot plate and associated reflector

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS445160Y1 (enExample) * 1966-03-07 1969-02-25

Also Published As

Publication number Publication date
JPS5555536A (en) 1980-04-23

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