JPS6335411A - 高純度合成石英の製造方法 - Google Patents
高純度合成石英の製造方法Info
- Publication number
- JPS6335411A JPS6335411A JP17845186A JP17845186A JPS6335411A JP S6335411 A JPS6335411 A JP S6335411A JP 17845186 A JP17845186 A JP 17845186A JP 17845186 A JP17845186 A JP 17845186A JP S6335411 A JPS6335411 A JP S6335411A
- Authority
- JP
- Japan
- Prior art keywords
- gel
- alcohol
- synthetic quartz
- superheated steam
- tetraalkoxysilane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 37
- 239000010453 quartz Substances 0.000 title claims abstract description 35
- 238000004519 manufacturing process Methods 0.000 title claims description 11
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims abstract description 28
- 238000006460 hydrolysis reaction Methods 0.000 claims abstract description 7
- 238000001035 drying Methods 0.000 claims abstract description 6
- 238000010304 firing Methods 0.000 claims description 15
- 238000000034 method Methods 0.000 claims description 12
- 238000012643 polycondensation polymerization Methods 0.000 claims description 10
- 230000007062 hydrolysis Effects 0.000 claims description 6
- 239000012141 concentrate Substances 0.000 claims description 3
- 238000001816 cooling Methods 0.000 claims description 3
- 238000000926 separation method Methods 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 16
- 239000003054 catalyst Substances 0.000 abstract description 5
- 239000007788 liquid Substances 0.000 abstract description 5
- 239000002253 acid Substances 0.000 abstract description 4
- 238000001354 calcination Methods 0.000 abstract description 2
- 239000011261 inert gas Substances 0.000 abstract description 2
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 abstract description 2
- 230000005494 condensation Effects 0.000 abstract 1
- 238000006482 condensation reaction Methods 0.000 abstract 1
- 239000007789 gas Substances 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 238000006116 polymerization reaction Methods 0.000 abstract 1
- 239000002994 raw material Substances 0.000 abstract 1
- 239000000843 powder Substances 0.000 description 8
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 239000007858 starting material Substances 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- 229910052770 Uranium Inorganic materials 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 3
- 239000000945 filler Substances 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- JFALSRSLKYAFGM-UHFFFAOYSA-N uranium(0) Chemical compound [U] JFALSRSLKYAFGM-UHFFFAOYSA-N 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 239000008393 encapsulating agent Substances 0.000 description 2
- 230000003301 hydrolyzing effect Effects 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- ZSLUVFAKFWKJRC-IGMARMGPSA-N 232Th Chemical compound [232Th] ZSLUVFAKFWKJRC-IGMARMGPSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- 241000167880 Hirundinidae Species 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 229910052776 Thorium Inorganic materials 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 150000001722 carbon compounds Chemical class 0.000 description 1
- 238000003763 carbonization Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- -1 firstly Substances 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
Landscapes
- Silicon Compounds (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17845186A JPS6335411A (ja) | 1986-07-29 | 1986-07-29 | 高純度合成石英の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17845186A JPS6335411A (ja) | 1986-07-29 | 1986-07-29 | 高純度合成石英の製造方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21127992A Division JPH06643B2 (ja) | 1992-08-07 | 1992-08-07 | アルコールの回収方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6335411A true JPS6335411A (ja) | 1988-02-16 |
| JPH054925B2 JPH054925B2 (OSRAM) | 1993-01-21 |
Family
ID=16048747
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17845186A Granted JPS6335411A (ja) | 1986-07-29 | 1986-07-29 | 高純度合成石英の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6335411A (OSRAM) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1996021617A1 (en) * | 1995-01-12 | 1996-07-18 | Mitsubishi Chemical Corporation | Silica gel, synthetic quartz glass powder, quartz glass molding, and processes for producing these |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3735886B2 (ja) * | 1995-04-28 | 2006-01-18 | 三菱化学株式会社 | 合成石英粉の製造方法及び石英ガラス成形体の製造方法 |
| JP3735887B2 (ja) * | 1995-04-28 | 2006-01-18 | 三菱化学株式会社 | 合成石英粉の製造方法及び石英ガラス成形体の製造方法 |
| KR19990008146A (ko) * | 1995-04-28 | 1999-01-25 | 미우라아끼라 | 합성 석영 분말의 제조방법 및 석영 유리 성형체의 제조방법 |
| EP3053598A1 (en) | 2015-02-06 | 2016-08-10 | Faes Farma, S.A. | Calcifediol soft capsules |
-
1986
- 1986-07-29 JP JP17845186A patent/JPS6335411A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1996021617A1 (en) * | 1995-01-12 | 1996-07-18 | Mitsubishi Chemical Corporation | Silica gel, synthetic quartz glass powder, quartz glass molding, and processes for producing these |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH054925B2 (OSRAM) | 1993-01-21 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| EXPY | Cancellation because of completion of term |