JPS6332948A - ウエ−ハ・ステ−ジ - Google Patents

ウエ−ハ・ステ−ジ

Info

Publication number
JPS6332948A
JPS6332948A JP61176066A JP17606686A JPS6332948A JP S6332948 A JPS6332948 A JP S6332948A JP 61176066 A JP61176066 A JP 61176066A JP 17606686 A JP17606686 A JP 17606686A JP S6332948 A JPS6332948 A JP S6332948A
Authority
JP
Japan
Prior art keywords
stage
speed
magnetic force
wafer stage
positioning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61176066A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0558663B2 (enExample
Inventor
Junichi Naganami
純一 長南
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Yamagata Ltd
Original Assignee
NEC Yamagata Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Yamagata Ltd filed Critical NEC Yamagata Ltd
Priority to JP61176066A priority Critical patent/JPS6332948A/ja
Publication of JPS6332948A publication Critical patent/JPS6332948A/ja
Publication of JPH0558663B2 publication Critical patent/JPH0558663B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Details Of Measuring And Other Instruments (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP61176066A 1986-07-25 1986-07-25 ウエ−ハ・ステ−ジ Granted JPS6332948A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61176066A JPS6332948A (ja) 1986-07-25 1986-07-25 ウエ−ハ・ステ−ジ

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61176066A JPS6332948A (ja) 1986-07-25 1986-07-25 ウエ−ハ・ステ−ジ

Publications (2)

Publication Number Publication Date
JPS6332948A true JPS6332948A (ja) 1988-02-12
JPH0558663B2 JPH0558663B2 (enExample) 1993-08-27

Family

ID=16007118

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61176066A Granted JPS6332948A (ja) 1986-07-25 1986-07-25 ウエ−ハ・ステ−ジ

Country Status (1)

Country Link
JP (1) JPS6332948A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11130251A (ja) * 1997-10-24 1999-05-18 Sharp Corp 基板搬送装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11130251A (ja) * 1997-10-24 1999-05-18 Sharp Corp 基板搬送装置

Also Published As

Publication number Publication date
JPH0558663B2 (enExample) 1993-08-27

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees