JPH0558663B2 - - Google Patents

Info

Publication number
JPH0558663B2
JPH0558663B2 JP61176066A JP17606686A JPH0558663B2 JP H0558663 B2 JPH0558663 B2 JP H0558663B2 JP 61176066 A JP61176066 A JP 61176066A JP 17606686 A JP17606686 A JP 17606686A JP H0558663 B2 JPH0558663 B2 JP H0558663B2
Authority
JP
Japan
Prior art keywords
stage
magnetic force
positioning
moving
movable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP61176066A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6332948A (ja
Inventor
Junichi Naganami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Yamagata Ltd
Original Assignee
NEC Yamagata Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Yamagata Ltd filed Critical NEC Yamagata Ltd
Priority to JP61176066A priority Critical patent/JPS6332948A/ja
Publication of JPS6332948A publication Critical patent/JPS6332948A/ja
Publication of JPH0558663B2 publication Critical patent/JPH0558663B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Details Of Measuring And Other Instruments (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP61176066A 1986-07-25 1986-07-25 ウエ−ハ・ステ−ジ Granted JPS6332948A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61176066A JPS6332948A (ja) 1986-07-25 1986-07-25 ウエ−ハ・ステ−ジ

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61176066A JPS6332948A (ja) 1986-07-25 1986-07-25 ウエ−ハ・ステ−ジ

Publications (2)

Publication Number Publication Date
JPS6332948A JPS6332948A (ja) 1988-02-12
JPH0558663B2 true JPH0558663B2 (enExample) 1993-08-27

Family

ID=16007118

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61176066A Granted JPS6332948A (ja) 1986-07-25 1986-07-25 ウエ−ハ・ステ−ジ

Country Status (1)

Country Link
JP (1) JPS6332948A (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3625127B2 (ja) * 1997-10-24 2005-03-02 シャープ株式会社 基板搬送装置並びに真空装置

Also Published As

Publication number Publication date
JPS6332948A (ja) 1988-02-12

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees