JPS6330395A - Method and jig for growing thin film crystal - Google Patents

Method and jig for growing thin film crystal

Info

Publication number
JPS6330395A
JPS6330395A JP17450086A JP17450086A JPS6330395A JP S6330395 A JPS6330395 A JP S6330395A JP 17450086 A JP17450086 A JP 17450086A JP 17450086 A JP17450086 A JP 17450086A JP S6330395 A JPS6330395 A JP S6330395A
Authority
JP
Japan
Prior art keywords
growth
substrate
ampoule tube
raw materials
raw material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17450086A
Other languages
Japanese (ja)
Inventor
Yoshio Fujino
芳男 藤野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP17450086A priority Critical patent/JPS6330395A/en
Publication of JPS6330395A publication Critical patent/JPS6330395A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To obtain a crystal superior in homogeneity by oscillating an ampoule tube in which a base plate and raw materials for growing thin film crystal are separately enclosed in the upper and the lower parts and mixing the raw materials. CONSTITUTION:A base plate supporter which supports the base plate 7 for growing and the raw materials 8 for growing are enclosed in vacuum in the ampoule tube 6. This ampoule tube 6 is set upright to separate the base plate 7 from the raw materials 8 so that the base plate 7 is in the upper position and the raw materials 8 in the lower position, and the raw materials 8 is melted. Then, with the base plate 7 separated from the raw materials 8, the ampoule tube 6 is oscillated from the vertical position to a slanting position to mix the melted liquid of the raw materials 8. And then, the ampoule tube 6 is slanted in the direction opposite to the above-mentioned to bring the base plate 7 into contact with the melted liquid of raw materials. Thus, a thin film crystal is grown on the base plate 7.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は液相法で薄膜結晶を成長させる方法およびそれ
に用いる成長用治具、特に傾斜法で薄膜結晶を成長させ
る方法及びそれに用いる成長用冶具に関する。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a method for growing thin film crystals by a liquid phase method and a growth jig used therefor, particularly a method for growing thin film crystals by a tilting method and a growth jig used therefor. Regarding jigs.

[従来の技術〕 基板上に薄膜結晶を液相法で成長させる方法にはスライ
ドポート法、ティッピング法(傾斜法)。
[Conventional technology] Methods for growing thin film crystals on a substrate using a liquid phase method include the slide port method and the tipping method (tilting method).

ディッピング法(浸漬法)などがあり、原11が蒸気圧
の低い元素で構成されている場合は開管式のスライドボ
ート法が有効であるが、蒸気圧の高い元素を含む場合は
閉管法である傾斜法又は浸漬法が有利である。一般に薄
膜結晶を成長さVようと゛する場合、その原料構成は2
種類以上の元素がらなっており、成長させるのに先立っ
て融解状態で充分に混合することが必要でおる。混合が
不充分な場合は基板上の場所によっておるいは基板ごと
に組成の異なる結晶が成長する。スライドボート法は原
理的に混合が不可能な方法であるが、後の三者は可能で
ある。
There are dipping methods, etc. If the element 11 is composed of elements with low vapor pressure, the open-tube slide boat method is effective, but if it contains elements with high vapor pressure, the closed-tube method is effective. Certain tilting or dipping methods are advantageous. Generally, when trying to grow a thin film crystal, the raw material composition is 2.
It is made up of more than one type of element, and it is necessary to thoroughly mix it in a molten state before growing it. If the mixing is insufficient, crystals with different compositions will grow depending on the location on the substrate or from substrate to substrate. The slide boat method is a method in which mixing is not possible in principle, but the latter three methods are possible.

[発明が解決しようとする問題点] しかしながら、装置の構造がよく考慮されていないと充
分な混合は期待できない。例えば傾斜法の例として化合
物半導体テルル化水銀カドミウムの結晶成長に関する論
文「ジャーナル・オブ・エレクトロケミカル・ソサエテ
ィ:ソリッド・ステイト・サイエンス・アンド・テクノ
ロジ」(J。
[Problems to be Solved by the Invention] However, unless the structure of the device is carefully considered, sufficient mixing cannot be expected. For example, as an example of the gradient method, there is an article in "Journal of Electrochemical Society: Solid State Science and Technology" (J.

Electrochem、 Soc、 : 5OLIf
)−3TATE 5CIENCE AND丁ECHN叶
0GY) 1981年、第128巻、第3号、第656
ページ、および同じ<1983年、第130巻、第1号
Electrochem, Soc, : 5OLIf
)-3TATE 5CIENCE AND DING ECHN Kano 0GY) 1981, Volume 128, No. 3, No. 656
Page, and the same <1983, Volume 130, No. 1.

第229ページに各々示されている構造を挙げることが
できる。曲者においては浅い皿状の原料収容部内で融液
化した原料を揺動させることによって混合しようとして
いるが、その形状から見て充分な混合は不可能であると
推定できる。後者では積極的な混合の意志は認められな
い。これらの論文においては同一の原料組成と同一の温
度条件で繰り返し実験を行なっていないので、原料混合
の充分・不充分に関するデータを得ることはできない。
The structures shown respectively on page 229 can be mentioned. In the bender, it is attempted to mix the molten raw material by shaking it in a shallow dish-shaped raw material container, but considering the shape, it can be assumed that sufficient mixing is impossible. In the latter case, no positive intention to mix is recognized. Since these papers did not repeatedly conduct experiments with the same raw material composition and the same temperature conditions, it was not possible to obtain data regarding whether the raw material mixing was sufficient or insufficient.

そこで発明者は前者と同様の装置を用いて実験を行なっ
た。実験は同一条件で5回繰り返した。その結果、目的
とした薄膜結晶の組成はhal−xCdxTeにおいて
x=O1200であったが、得られたX値は基板の中央
の位置で0.194から0.207まで分散していた。
Therefore, the inventor conducted an experiment using a device similar to the former. The experiment was repeated five times under the same conditions. As a result, although the intended composition of the thin film crystal was hal-xCdxTe with x=O1200, the obtained X values were dispersed from 0.194 to 0.207 at the center position of the substrate.

この結果から従来のような混合が充分できない構造を持
つ装置では目的とする組成を持った薄膜結晶を得ること
が困難であることが分かる。
This result shows that it is difficult to obtain a thin film crystal with a desired composition using a conventional device having a structure that does not allow sufficient mixing.

本発明の目的は傾斜法によって薄膜結晶を成長させるに
際して、従来法の欠点を除き、組成の均一性を向上させ
得る成長方法とそれに用いる成長用治具を提供すること
におる。
An object of the present invention is to provide a growth method that can eliminate the drawbacks of conventional methods and improve compositional uniformity when growing thin film crystals by the tilting method, and a growth jig for use therein.

[問題点を解決するための手段] 本発明は成長用基板が固定されている基板支持具と成長
用原料とをアンプル管に真空封入する工程と、このアン
プル管を鉛直状態に直立させて成長用基板と成長用原料
とを上下に分離して成長用基板を融解する工程と、成長
用基板と成長用原料とを分離したままでアンプル管を鉛
直姿勢と傾斜姿勢とに往復揺動させて、融解した成長用
原料を混合させる工程と、成長用原料を混合した後、ア
ンプル管を前記と反対方向に傾斜させて融解原料を基板
に接触させ、該基板上に薄膜結晶を成長させる工程とを
含むことを特徴とする薄膜結晶の成長方法及び成長用原
料を収容する中空のアンプル管と、成長用基板を取付け
てアンプル管内に設置する基板支持具とを有し、前記基
板支持具に、アンプル管内に封入した成長用原料の液面
上の位置に成長用基板を保持する足部及び、基板支持具
に取付けられた原料液を接触させるべき成長用基板の表
面をアンプル管内に露出させる透孔を設けたことを特徴
とする薄膜結晶成長用治具である。
[Means for Solving the Problems] The present invention includes a step of vacuum-sealing a substrate support to which a growth substrate is fixed and a growth raw material into an ampoule tube, and a step of vacuum-sealing a substrate support to which a growth substrate is fixed and a growth material, and a step of vacuum-sealing the ampoule tube in an upright position for growth. A step of separating the growth substrate and the growth raw material vertically and melting the growth substrate, and a step of swinging the ampoule tube back and forth between a vertical position and an inclined position while keeping the growth substrate and growth raw material separated. , a step of mixing the molten raw materials for growth; and a step of, after mixing the raw materials for growth, tilting the ampoule tube in the opposite direction to the above to bring the molten raw materials into contact with the substrate, and growing a thin film crystal on the substrate. A method for growing a thin film crystal, comprising: a hollow ampoule tube containing a growth material; and a substrate support to which a growth substrate is attached and installed in the ampoule tube, the substrate support having: The legs hold the growth substrate at a position above the liquid level of the growth raw material sealed in the ampoule tube, and the transparent part exposes the surface of the growth substrate attached to the substrate support to be brought into contact with the raw material liquid inside the ampoule tube. This is a thin film crystal growth jig characterized by having holes.

[実施例] 以下、本発明の一実施例を図により説明する。[Example] Hereinafter, one embodiment of the present invention will be described with reference to the drawings.

第1図(a)、 (b)に示すように本発明に係る成長
用治具は中空のアンプル管6と、成長用基板7を取付け
てアンプル管6内に設置する基板支持具1とからなる。
As shown in FIGS. 1(a) and 1(b), the growth jig according to the present invention includes a hollow ampoule tube 6 and a substrate support 1 to which a growth substrate 7 is attached and installed inside the ampoule tube 6. Become.

基板支持具1は第1図(a)に示すように断面U形をし
ており、両側にある側壁2.2と底壁3とそれに側壁2
を延長した足部4かうなり、底壁3には基板7であるテ
ルル化カドミウム(10x 10x l #3 )より
少し小さ目の透孔(8×8#2)5が設けられている。
The substrate support 1 has a U-shaped cross section as shown in FIG.
The bottom wall 3 is provided with a through hole (8 x 8 #2) 5 which is slightly smaller than the substrate 7 made of cadmium telluride (10 x 10 x l #3).

基板7は成長用の面が外側を向くようにこの透孔5に内
側から同心的に陣門が生じないように当てがわれ、カー
ボン製の抑え板とねじによって取付は固定される。石英
製の中空アンプル管6は第1図(b)に示すように基板
7を取付は固定した基板支持具1を足部4が下になるよ
うに成長用原料81石英製のスペーサー9等を真空封入
しである。足部4には基板支持具1が第1図(b)のよ
うに鉛直状態にあるとき1京料8が基板7に接触しない
だけの艮ざを持たせである。
The substrate 7 is placed concentrically in the through hole 5 from the inside so that the growth surface faces outward, and the attachment is fixed using a carbon holding plate and screws. As shown in FIG. 1(b), the hollow ampoule tube 6 made of quartz is made by attaching and fixing the substrate 7 to the substrate support 1, and attaching the growth material 81 and the quartz spacer 9 etc. so that the foot part 4 is at the bottom. It is vacuum sealed. The legs 4 are provided with a grip that prevents the 1000 yen 8 from coming into contact with the substrate 7 when the substrate support 1 is in a vertical state as shown in FIG. 1(b).

次に、本発明の薄膜結晶の成長方法は次の手順により実
施される。すなわら、 まず、基板支持具1に成長用基板7を固定し、組成がH
g0.20 cdo、01 TeO,79となるように
水銀とカドミウムとテルルとを合わせて40Cl秤■し
て原料8となし、これらにスペーサー9を加えて第1図
(b)の如く内径25φの石英アンプル管6中に真空封
入したものを、モニター用の熱電対(直径3 mm >
と共に収容′可能な内径を持つ縦長の電気炉に収容する
。この電気炉は鉛直状態(正立)から左右に90°弱づ
つ傾斜させることが可能な電気炉に搭載されている。次
に第2図(a)のようにアンプル管6を鉛直姿勢にて原
料用基板7を原料8の液面上に位置させたままで電気炉
を昇温させて530’Cで原料8を融解し、−時間放置
した後、第2図(b)のように基板支持具1の基板7が
固定されていない開放側が下側になるように電気炉を9
0°弱傾斜させる。この角度は融解した成長用原料8が
スペーサー9の下端に接触しない程度に水平に近くアン
プル管6が傾斜する角iである。3分間この状態に置い
てから再びアンプル管6を正立姿勢に戻して(a)の状
態とし、ざらに3分間経過後再び(b)の状態に倒した
。このような繰り返し工程を1時間続行し、融解原料の
i昆合を徹底し最後には(a)の状態に戻した。次に成
長用温度500℃に降温し、その温度に落ちついたとこ
ろで、融解原料8を基板7に接触させるため前工程とは
反対側に90’弱傾斜させ、毎分0.2°Cで徐冷しな
がら基板7上にテルル化水銀カドミウムの薄膜結晶を成
長させた。2時間後、電気炉を(a)の状態に戻して融
解原料8を基板7から分離し、炉の電源を断って室温ま
で冷却した。石英アンプルから基板を取り出したところ
約201M1の厚さの結晶が成長していたが、このよう
な成長を5回繰り返した結果、Cdの値は基板上の中央
の位置で0.197から0、203までの分布となって
いた。この値は混合不充分な方法に比べてかなり良い値
であるということができる。
Next, the method for growing a thin film crystal of the present invention is carried out by the following procedure. That is, first, the growth substrate 7 is fixed to the substrate support 1, and the composition is H.
Mix mercury, cadmium, and tellurium together in 40 Cl to give g 0.20 cdo, 01 TeO, 79 to obtain raw material 8, add spacer 9 to these, and prepare a material with an inner diameter of 25φ as shown in Figure 1 (b). A thermocouple for monitoring (diameter 3 mm >
It is housed in a vertically elongated electric furnace that has an inner diameter that can accommodate both. This electric furnace is installed in an electric furnace that can be tilted from the vertical position (upright) to the left and right by a little less than 90 degrees. Next, as shown in FIG. 2(a), with the ampoule tube 6 in a vertical position and the raw material substrate 7 positioned above the liquid surface of the raw material 8, the electric furnace is heated to melt the raw material 8 at 530'C. After leaving it for - hours, turn the electric furnace 9 so that the open side of the substrate support 1 to which the substrate 7 is not fixed is facing downwards, as shown in FIG. 2(b).
Tilt slightly less than 0°. This angle is an angle i at which the ampoule tube 6 is inclined so close to horizontal that the molten growth raw material 8 does not come into contact with the lower end of the spacer 9. After being left in this state for 3 minutes, the ampoule tube 6 was returned to the upright position again to obtain the state shown in (a), and after approximately 3 minutes, it was again brought back to the state shown in (b). This repeated process was continued for 1 hour to ensure thorough mixing of the molten raw materials, and finally the state was returned to (a). Next, the growth temperature is lowered to 500°C, and when the temperature has settled down to that temperature, the molten raw material 8 is tilted slightly 90' to the opposite side from the previous step in order to contact the substrate 7, and the temperature is gradually reduced at 0.2°C per minute. A thin film crystal of mercury cadmium telluride was grown on the substrate 7 while cooling. After 2 hours, the electric furnace was returned to the state of (a), the molten raw material 8 was separated from the substrate 7, the power to the furnace was turned off, and the furnace was cooled to room temperature. When the substrate was taken out from the quartz ampoule, a crystal with a thickness of approximately 201M1 had grown.As a result of repeating this growth five times, the Cd value at the center position on the substrate varied from 0.197 to 0. The distribution was up to 203. This value can be said to be considerably better than the method with insufficient mixing.

[発明の効果コ 以上説明したように本発明によれば、多種の元素構成か
らなる化合物薄膜結晶を液相傾斜法で成長させる際に原
料の混合が充分に行なうことができるため、組成の均一
性のすぐれた結晶を得ることができる。尚、この発明は
実施例のテルル化水銀カドミウムだけでなく、その他の
化合物にも応用できることは勿論である。
[Effects of the Invention] As explained above, according to the present invention, when growing compound thin film crystals consisting of various elemental compositions by the liquid phase gradient method, raw materials can be sufficiently mixed, resulting in uniform composition. Crystals with excellent properties can be obtained. It goes without saying that this invention can be applied not only to mercury cadmium telluride in the examples but also to other compounds.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の薄膜結晶成長装置の説明図であり、(
a)は基板支持具を示す斜視図、(b)は全体図、第2
図(a)、 (b)、 (c)は本発明の薄膜結晶成長
方法の説明図である。 1・・・基板支持具    2・・・側壁3・・・底壁
       4・・・足部5・・・透孔      
 6・・・石英アンプル管7・・・基板       
8・・・成長用原料9・・・スペーサー
FIG. 1 is an explanatory diagram of the thin film crystal growth apparatus of the present invention.
a) is a perspective view showing the substrate support; (b) is an overall view;
Figures (a), (b), and (c) are explanatory diagrams of the thin film crystal growth method of the present invention. 1... Board support 2... Side wall 3... Bottom wall 4... Foot portion 5... Through hole
6...Quartz ampoule tube 7...Substrate
8... Raw material for growth 9... Spacer

Claims (2)

【特許請求の範囲】[Claims] (1)基板支持具に支持された成長用基板と成長用原料
とをアンプル管に真空封入する工程と、このアンプル管
を鉛直状態に直立させて成長用基板と成長用原料とを上
下に分離して成長用原料を融解する工程と、成長用基板
と成長用原料とを分離したままでアンプル管を鉛直姿勢
と傾斜姿勢とに往復揺動させて、融解した成長用原料を
混合させる工程と、成長用原料を混合した後、アンプル
管を前記と反対方向に傾斜させて融解原料を基板に接触
させ、該基板上に薄膜結晶を成長させる工程とを含むこ
とを特徴とする薄膜結晶の成長方法。
(1) The process of vacuum sealing the growth substrate and the growth raw material supported by the substrate support into an ampoule tube, and the step of vertically separating the growth substrate and the growth raw material by standing the ampoule tube vertically. and a step of mixing the melted growth raw material by swinging the ampoule tube back and forth between a vertical position and an inclined position while keeping the growth substrate and the growth raw material separated. , after mixing the growth raw materials, tilting the ampoule tube in the opposite direction to the above to bring the molten raw materials into contact with the substrate, and growing the thin film crystal on the substrate. Method.
(2)成長用原料を収容する中空のアンプル管と、成長
用基板を取付けてアンプル管内に設置する基板支持具と
を有し、前記基板支持具に、アンプル管内に封入した成
長用原料の液面上の位置に成長用基板を保持する足部及
び、基板支持具に取付けられた原料液を接触させるべき
成長用基板の表面をアンプル管内に露出させる透孔を設
けたことを特徴とする薄膜結晶成長用治具。
(2) It has a hollow ampoule tube that accommodates the growth raw material, and a substrate support to which a growth substrate is attached and installed in the ampoule tube, and the substrate support is provided with a solution of the growth raw material sealed in the ampoule tube. A thin film characterized by having feet for holding the growth substrate in a position above the surface, and a through hole for exposing the surface of the growth substrate to be brought into contact with the raw material solution attached to the substrate support into the ampoule tube. Jig for crystal growth.
JP17450086A 1986-07-23 1986-07-23 Method and jig for growing thin film crystal Pending JPS6330395A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17450086A JPS6330395A (en) 1986-07-23 1986-07-23 Method and jig for growing thin film crystal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17450086A JPS6330395A (en) 1986-07-23 1986-07-23 Method and jig for growing thin film crystal

Publications (1)

Publication Number Publication Date
JPS6330395A true JPS6330395A (en) 1988-02-09

Family

ID=15979582

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17450086A Pending JPS6330395A (en) 1986-07-23 1986-07-23 Method and jig for growing thin film crystal

Country Status (1)

Country Link
JP (1) JPS6330395A (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59111995A (en) * 1982-12-15 1984-06-28 Fujitsu Ltd Device for liquid-phase epitaxial phase
JPS6027698A (en) * 1983-06-29 1985-02-12 ストウフア−・ケミカル・カンパニ− Liquid phase growth and polyphosphide crystal

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59111995A (en) * 1982-12-15 1984-06-28 Fujitsu Ltd Device for liquid-phase epitaxial phase
JPS6027698A (en) * 1983-06-29 1985-02-12 ストウフア−・ケミカル・カンパニ− Liquid phase growth and polyphosphide crystal

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