JPH01141892A - Method for growing crystal - Google Patents

Method for growing crystal

Info

Publication number
JPH01141892A
JPH01141892A JP30096387A JP30096387A JPH01141892A JP H01141892 A JPH01141892 A JP H01141892A JP 30096387 A JP30096387 A JP 30096387A JP 30096387 A JP30096387 A JP 30096387A JP H01141892 A JPH01141892 A JP H01141892A
Authority
JP
Japan
Prior art keywords
growth
melt
crystal
substrate
vessel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP30096387A
Other languages
Japanese (ja)
Inventor
Yoshio Fujino
芳男 藤野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP30096387A priority Critical patent/JPH01141892A/en
Publication of JPH01141892A publication Critical patent/JPH01141892A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To homogenize a growth melt and to obtain a crystal having uniform composition by oscillating a growth device, and growing a crystal while always oscillating the melt. CONSTITUTION:In the LPE using a tipping method, a growth substrate 2 is set on an inclined surface in a horizontally placed growth vessel 1. A growth melt 3 consisting of Hg, Cd, and Te for example, is charged in the vessel 1, heated by an electric furnace, and melted. The whole growth device is then inclined to place the substrate 2 in a horizontal position L, and the melt 3 is moved to cover the substrate 2 with the melt 3'. Under such conditions, annealing is started, the vessel 1 is oscillated B and T in + or -7.5 deg. amplitude with the horizontal position L as the reference, hence the melt 3' is agitated, the melt 3' is homogenized, and a crystal is grown on the substrate 2.

Description

【発明の詳細な説明】 (産業上の利用分野〕 本発明はLPE法を用いて半導体結晶を育成する方法に
関する。
DETAILED DESCRIPTION OF THE INVENTION (Industrial Field of Application) The present invention relates to a method for growing semiconductor crystals using the LPE method.

〔従来の技術〕[Conventional technology]

LPE法を用いて半導体結晶を成長させる方法として従
来は、ジャーナル・オブ・エレクトロケミカル・ソサエ
ティ;ソリッドステイト・サイエンス・アンド・テクノ
ロジー(J、Electrocham、Soc、:・5
olid−5tate 5cience And Te
chnology)誌、 1981年・3月・第128
巻・第3号・第655〜661頁及び同誌1983年・
1月・第130巻・第1号・第228〜230頁に述べ
られている如く、結晶育成に先立って融解されていた育
成用メルトは、育成のときに育成装置を傾斜させること
によって育成用基板上に到達してこれを覆い、徐冷によ
って基板上に結晶を成長せしめる方法が用いられている
Conventionally, the method for growing semiconductor crystals using the LPE method has been described in the Journal of Electrochemical Society; Solid State Science and Technology (J, Electrochem, Soc,: 5
solid-5tate 5science and Te
chnology) magazine, March 1981, No. 128
Volume, No. 3, pages 655-661 and the same magazine, 1983.
As described in January, Vol. 130, No. 1, pp. 228-230, the growth melt that has been melted prior to crystal growth can be grown by tilting the growth device during crystal growth. A method is used in which the crystal reaches the substrate, covers it, and grows crystals on the substrate by slow cooling.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

このとき育成用メルトは静止状態で基板を覆っているの
で、メルトが比重の著しく異なるいくつかの成分からな
っていたり、これらが充分に混合されていなかったりす
ると、成長した結晶は第2図(a)、(b)の如く、結
晶の面内で組成の不均一が起こる。殊に上述文献の例の
如く、メルトが水銀、カドミウム、テルルの如き比重が
各々著しく異なるものからなり、かつ成分比が例えば水
銀: 18.7%、カドミウム:1.3%、テルル:8
0%と互いに著しく異なる場合は成長した結晶の組成不
均一は起こり易い。
At this time, the growing melt covers the substrate in a stationary state, so if the melt consists of several components with significantly different specific gravities or if these are not mixed sufficiently, the grown crystals will be as shown in Figure 2 ( As shown in a) and (b), compositional non-uniformity occurs within the plane of the crystal. In particular, as in the example of the above-mentioned literature, the melt is composed of materials such as mercury, cadmium, and tellurium, each having significantly different specific gravities, and the component ratio is, for example, mercury: 18.7%, cadmium: 1.3%, tellurium: 8.
If they are significantly different from 0%, the composition of the grown crystal is likely to be non-uniform.

本発明の目的は上述の如き従来法の欠点を除き、結晶面
内での組成の均一性の優れた結晶育成方法を提供する二
氷にある。
An object of the present invention is to provide a crystal growth method that eliminates the drawbacks of the conventional methods as described above and has excellent compositional uniformity within the crystal plane.

〔問題点を解決するための手段〕[Means for solving problems]

本発明は傾斜ティッピング法を用いたLPE育成法にお
いて、育成中に育成装置に揺動を与えて育成用メルトを
常に揺動させながら結晶育成を行うことを特徴とする結
晶育成方法である。
The present invention is an LPE growth method using an inclined tipping method, which is characterized in that crystal growth is performed while constantly shaking the growth melt by shaking the growth apparatus during growth.

〔実施例〕〔Example〕

次に本発明を実施例によって説明する。 Next, the present invention will be explained by examples.

第1図は本発明の一実施例を示したものである。FIG. 1 shows an embodiment of the present invention.

1はグラファイト製の育成用容器、2は育成用テルル化
カドミウム製基板である。基板2は容器1内の傾斜面に
セットされている。3は結晶育成に移る前の育成用メル
トである。育成用メルト3は容器1内の水平面に充填さ
れている。
1 is a container for growth made of graphite, and 2 is a substrate made of cadmium telluride for growth. The substrate 2 is set on an inclined surface inside the container 1. 3 is a growth melt before proceeding to crystal growth. The growth melt 3 is filled in the horizontal surface of the container 1.

これらは全て石英製のアンプルに真空封入されており、
さらにアンプルは揺動可能な電気炉(いずれも図示せず
)に収容されている。
All of these are vacuum sealed in quartz ampoules.
Further, the ampoule is housed in a swingable electric furnace (none of which is shown).

上記育成用容器1を用いてテルル化水銀カドミウムの結
晶育成は次のように行った。まず、電気炉を水平状態に
して育成用容器lを水平状態としらなる育成用メルト3
を溶融(メルト)状にした。
Crystal growth of mercury cadmium telluride was carried out in the following manner using the growth container 1 described above. First, with the electric furnace in a horizontal position and the growth container l in a horizontal position, the growth melt 3
was made into a molten state.

次に育成用基板2が水平になるように装置全体を傾斜さ
せ、育成用メルト3が基板2を完全に覆うよう(メルト
は3′の状態)にした。第1図はこの段階を示しており
、水平になっている基板2の状態をLとする。通常はこ
の状態のまま徐冷を開始し、基板2上に結晶を成長させ
るが、本発明ではそれに加えて育成用容器1を揺動させ
、それによってメルト3′に動きを与えて攪拌効果を生
じさせ1本実施例における如き成分比や比重が互いに著
しく異なる水銀とカドミウムとテルルとの混合物の部分
的な成分の偏りを防止しようとしている。揺動の振幅は
151、すなわち水平状態りを基準として破線Tと破線
Bとの間にわたる±7.5°である。この値は大きいほ
ど良いが、メルト3′が基板2を覆っていることができ
ない程度に振幅を与えては意味がないので、本実施例で
はこの範囲にした。
Next, the entire apparatus was tilted so that the growth substrate 2 was horizontal, so that the growth melt 3 completely covered the substrate 2 (the melt was in the state 3'). FIG. 1 shows this stage, and it is assumed that the substrate 2 is in a horizontal state as L. Normally, slow cooling is started in this state to grow crystals on the substrate 2, but in the present invention, in addition to this, the growth container 1 is rocked, thereby giving movement to the melt 3' and creating a stirring effect. This is intended to prevent partial imbalance of the components of a mixture of mercury, cadmium, and tellurium whose component ratios and specific gravities are significantly different from each other as in this embodiment. The amplitude of the oscillation is 151 degrees, that is, ±7.5° extending between the broken line T and the broken line B with respect to the horizontal state. The larger this value is, the better; however, it is meaningless to give an amplitude to such an extent that the melt 3' cannot cover the substrate 2, so in this embodiment, it is set within this range.

基板2が水平でLの状態にあり、従って育成用メルト3
′がこれを完全に覆っている状態から30秒に1回の周
期で揺動を開始した。次いで徐冷を開始し、通常の成長
時間を経過した後、揺動、徐冷を停止し、通常通り結晶
育成を終了させた。基板2上に成長した結晶を回収し、
結晶面内の組成の均一性を調べた結果、第3図のように
等成分比線は揺動を行わない通常法に比べてかなり少な
くなっていることが分かった。これは揺動によってメル
トの均一化が行われ、あるいは成長中に成分の比重差に
よる不均一化が生じることがないためである。
The substrate 2 is horizontal and in the L state, so the growing melt 3
′ completely covered this, the rocking was started once every 30 seconds. Next, slow cooling was started, and after the normal growth time had elapsed, the shaking and slow cooling were stopped, and the crystal growth was completed as usual. Collect the crystals grown on the substrate 2,
As a result of examining the uniformity of the composition within the crystal plane, it was found that as shown in FIG. 3, the number of equal component ratio lines was considerably smaller than that in the conventional method in which no oscillation was performed. This is because the melt is made uniform by the rocking, and non-uniformity due to differences in specific gravity of the components does not occur during growth.

〔発明の効果〕〔Effect of the invention〕

以上詳述したように本発明によれば、結晶が成長してい
る間にメルトの均一化が促進し、あるいは成長中にメル
ト内での不均一化が防止され、均一な組成の結晶を得る
ことができる効果を有する。
As detailed above, according to the present invention, the uniformity of the melt is promoted while the crystal is growing, or non-uniformity within the melt is prevented during the growth, thereby obtaining a crystal with a uniform composition. It has the effect that it can.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明を原理的に示す図、第2図ω。 (b)は従来法によって得られる結晶内の組成を示す図
、第3図は本発明によって得られた結晶内の組成を示す
図である。
FIG. 1 is a diagram showing the principle of the present invention, and FIG. 2 is a diagram showing the principle of the present invention. (b) is a diagram showing the composition in the crystal obtained by the conventional method, and FIG. 3 is a diagram showing the composition in the crystal obtained by the present invention.

Claims (1)

【特許請求の範囲】[Claims] (1)傾斜ティッピング法を用いたLPE育成法におい
て、育成中に育成装置に揺動を与えて育成用メルトを常
に揺動させながら結晶育成を行うことを特徴とする結晶
育成方法。
(1) In the LPE growth method using the inclined tipping method, a crystal growth method is characterized in that crystal growth is performed while constantly shaking the growth melt by applying vibration to the growth apparatus during growth.
JP30096387A 1987-11-27 1987-11-27 Method for growing crystal Pending JPH01141892A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30096387A JPH01141892A (en) 1987-11-27 1987-11-27 Method for growing crystal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30096387A JPH01141892A (en) 1987-11-27 1987-11-27 Method for growing crystal

Publications (1)

Publication Number Publication Date
JPH01141892A true JPH01141892A (en) 1989-06-02

Family

ID=17891182

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30096387A Pending JPH01141892A (en) 1987-11-27 1987-11-27 Method for growing crystal

Country Status (1)

Country Link
JP (1) JPH01141892A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006022302A3 (en) * 2004-08-24 2006-04-20 Univ Osaka Process for producing aluminum nitride crystal and aluminum nitride crystal obtained thereby

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006022302A3 (en) * 2004-08-24 2006-04-20 Univ Osaka Process for producing aluminum nitride crystal and aluminum nitride crystal obtained thereby

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