JPS63290262A - 薄膜の形成方法 - Google Patents
薄膜の形成方法Info
- Publication number
- JPS63290262A JPS63290262A JP12340087A JP12340087A JPS63290262A JP S63290262 A JPS63290262 A JP S63290262A JP 12340087 A JP12340087 A JP 12340087A JP 12340087 A JP12340087 A JP 12340087A JP S63290262 A JPS63290262 A JP S63290262A
- Authority
- JP
- Japan
- Prior art keywords
- ions
- ion implantation
- vacuum
- ion
- substrates
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004381 surface treatment Methods 0.000 title claims description 13
- 239000002131 composite material Substances 0.000 title claims description 12
- 230000007246 mechanism Effects 0.000 claims abstract description 58
- 238000005468 ion implantation Methods 0.000 claims abstract description 48
- 238000001659 ion-beam spectroscopy Methods 0.000 claims abstract description 15
- 238000007738 vacuum evaporation Methods 0.000 claims description 14
- 150000002500 ions Chemical class 0.000 abstract description 74
- 239000000758 substrate Substances 0.000 abstract description 47
- 239000010408 film Substances 0.000 abstract description 19
- 238000000034 method Methods 0.000 abstract description 9
- 238000004544 sputter deposition Methods 0.000 abstract description 7
- 238000001704 evaporation Methods 0.000 abstract description 6
- 230000008020 evaporation Effects 0.000 abstract description 5
- 239000010409 thin film Substances 0.000 abstract description 5
- 238000001771 vacuum deposition Methods 0.000 abstract description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 1
- 229910052593 corundum Inorganic materials 0.000 abstract 1
- 229910001220 stainless steel Inorganic materials 0.000 abstract 1
- 239000010935 stainless steel Substances 0.000 abstract 1
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract 1
- 238000000926 separation method Methods 0.000 description 15
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 9
- 230000001133 acceleration Effects 0.000 description 7
- 238000002156 mixing Methods 0.000 description 7
- 238000002513 implantation Methods 0.000 description 5
- 238000007740 vapor deposition Methods 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000000605 extraction Methods 0.000 description 4
- 238000002347 injection Methods 0.000 description 4
- 239000007924 injection Substances 0.000 description 4
- 238000010884 ion-beam technique Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 3
- 238000005240 physical vapour deposition Methods 0.000 description 3
- 238000005086 pumping Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000007943 implant Substances 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12340087A JPS63290262A (ja) | 1987-05-20 | 1987-05-20 | 薄膜の形成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12340087A JPS63290262A (ja) | 1987-05-20 | 1987-05-20 | 薄膜の形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63290262A true JPS63290262A (ja) | 1988-11-28 |
| JPH032947B2 JPH032947B2 (enrdf_load_stackoverflow) | 1991-01-17 |
Family
ID=14859617
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12340087A Granted JPS63290262A (ja) | 1987-05-20 | 1987-05-20 | 薄膜の形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63290262A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100537014B1 (ko) * | 2002-10-04 | 2006-01-20 | 권영욱 | 이온 플래이팅 방식에 의한 유해전자파 방지용 및 투명아크릴 폴리 카보네이트의 금속 칼라 박막 형성 시스템 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57174459A (en) * | 1981-04-21 | 1982-10-27 | Namiki Precision Jewel Co Ltd | Formation of thin film |
| JPS6056066A (ja) * | 1983-09-05 | 1985-04-01 | Nissin Electric Co Ltd | 薄膜形成装置 |
-
1987
- 1987-05-20 JP JP12340087A patent/JPS63290262A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57174459A (en) * | 1981-04-21 | 1982-10-27 | Namiki Precision Jewel Co Ltd | Formation of thin film |
| JPS6056066A (ja) * | 1983-09-05 | 1985-04-01 | Nissin Electric Co Ltd | 薄膜形成装置 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100537014B1 (ko) * | 2002-10-04 | 2006-01-20 | 권영욱 | 이온 플래이팅 방식에 의한 유해전자파 방지용 및 투명아크릴 폴리 카보네이트의 금속 칼라 박막 형성 시스템 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH032947B2 (enrdf_load_stackoverflow) | 1991-01-17 |
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