JPS6328338B2 - - Google Patents
Info
- Publication number
- JPS6328338B2 JPS6328338B2 JP55040893A JP4089380A JPS6328338B2 JP S6328338 B2 JPS6328338 B2 JP S6328338B2 JP 55040893 A JP55040893 A JP 55040893A JP 4089380 A JP4089380 A JP 4089380A JP S6328338 B2 JPS6328338 B2 JP S6328338B2
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- resist
- forming
- resist pattern
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H10D64/011—
Landscapes
- Electrodes Of Semiconductors (AREA)
- Bipolar Transistors (AREA)
- Weting (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4089380A JPS56137623A (en) | 1980-03-28 | 1980-03-28 | Forming of cross pattern electrode |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4089380A JPS56137623A (en) | 1980-03-28 | 1980-03-28 | Forming of cross pattern electrode |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS56137623A JPS56137623A (en) | 1981-10-27 |
| JPS6328338B2 true JPS6328338B2 (member.php) | 1988-06-08 |
Family
ID=12593183
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4089380A Granted JPS56137623A (en) | 1980-03-28 | 1980-03-28 | Forming of cross pattern electrode |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS56137623A (member.php) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58175830A (ja) * | 1982-04-08 | 1983-10-15 | Matsushita Electric Ind Co Ltd | パタ−ン形成方法 |
-
1980
- 1980-03-28 JP JP4089380A patent/JPS56137623A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS56137623A (en) | 1981-10-27 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN1036814C (zh) | 形成半导体器件接触孔的方法 | |
| JPH04115515A (ja) | パターン形成方法 | |
| JPS6236636B2 (member.php) | ||
| JPH05326358A (ja) | 微細パターン形成方法 | |
| JPS6328338B2 (member.php) | ||
| US4612274A (en) | Electron beam/optical hybrid lithographic resist process in acoustic wave devices | |
| KR20010011143A (ko) | 반도체소자의 미세패턴 형성방법 | |
| JPH0448715A (ja) | 半導体装置の製造方法 | |
| US4581316A (en) | Method of forming resist patterns in negative photoresist layer using false pattern | |
| JPS6346972B2 (member.php) | ||
| US5576124A (en) | Phase shift mask and method for fabricating the same | |
| EP0104235A4 (en) | METHOD OF FORMING A HYBRID LITHOGRAPHIC PROTECTION MATERIAL WITH ELECTRONIC / OPTICAL RADIUS. | |
| JPH0222537B2 (member.php) | ||
| JPS6245026A (ja) | 半導体集積回路の写真製版方法 | |
| JPH02189913A (ja) | 半導体装置のパターン形成方法 | |
| JPS6328337B2 (member.php) | ||
| JPS6310891B2 (member.php) | ||
| JPS58209124A (ja) | レジストパタ−ン形成方法 | |
| KR950000090B1 (ko) | 반도체장치의 제조방법 | |
| JPH02226724A (ja) | 集積回路装置の製造方法 | |
| JP2853471B2 (ja) | 半導体集積回路装置の製造方法 | |
| KR19980077753A (ko) | 포토리소그래피 공정에 의한 반도체장치의 패턴형성방법 | |
| KR100358161B1 (ko) | 반도체소자제조방법 | |
| JPH0117247B2 (member.php) | ||
| JPH05165195A (ja) | ガラスマスク並びに該ガラスマスクを使用した半導体装置の製造方法 |