JPS63283031A - 半導体製造装置 - Google Patents

半導体製造装置

Info

Publication number
JPS63283031A
JPS63283031A JP63078942A JP7894288A JPS63283031A JP S63283031 A JPS63283031 A JP S63283031A JP 63078942 A JP63078942 A JP 63078942A JP 7894288 A JP7894288 A JP 7894288A JP S63283031 A JPS63283031 A JP S63283031A
Authority
JP
Japan
Prior art keywords
core tube
furnace core
film
deposit
deposits
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP63078942A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0413853B2 (enExample
Inventor
Yasumasa Otsuki
大月　康正
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP63078942A priority Critical patent/JPS63283031A/ja
Publication of JPS63283031A publication Critical patent/JPS63283031A/ja
Publication of JPH0413853B2 publication Critical patent/JPH0413853B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
JP63078942A 1988-03-31 1988-03-31 半導体製造装置 Granted JPS63283031A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63078942A JPS63283031A (ja) 1988-03-31 1988-03-31 半導体製造装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63078942A JPS63283031A (ja) 1988-03-31 1988-03-31 半導体製造装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP56121116A Division JPS5821826A (ja) 1981-07-31 1981-07-31 半導体製造装置の堆積物除去方法

Publications (2)

Publication Number Publication Date
JPS63283031A true JPS63283031A (ja) 1988-11-18
JPH0413853B2 JPH0413853B2 (enExample) 1992-03-11

Family

ID=13675937

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63078942A Granted JPS63283031A (ja) 1988-03-31 1988-03-31 半導体製造装置

Country Status (1)

Country Link
JP (1) JPS63283031A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03147317A (ja) * 1989-10-23 1991-06-24 Internatl Business Mach Corp <Ibm> プラズマ処理における汚染を抑制するための方法及び装置
US5443686A (en) * 1992-01-15 1995-08-22 International Business Machines Corporation Inc. Plasma CVD apparatus and processes

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5821826A (ja) * 1981-07-31 1983-02-08 Seiko Epson Corp 半導体製造装置の堆積物除去方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5821826A (ja) * 1981-07-31 1983-02-08 Seiko Epson Corp 半導体製造装置の堆積物除去方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03147317A (ja) * 1989-10-23 1991-06-24 Internatl Business Mach Corp <Ibm> プラズマ処理における汚染を抑制するための方法及び装置
US5443686A (en) * 1992-01-15 1995-08-22 International Business Machines Corporation Inc. Plasma CVD apparatus and processes

Also Published As

Publication number Publication date
JPH0413853B2 (enExample) 1992-03-11

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