JPS63274768A - 真空処理装置 - Google Patents

真空処理装置

Info

Publication number
JPS63274768A
JPS63274768A JP11008987A JP11008987A JPS63274768A JP S63274768 A JPS63274768 A JP S63274768A JP 11008987 A JP11008987 A JP 11008987A JP 11008987 A JP11008987 A JP 11008987A JP S63274768 A JPS63274768 A JP S63274768A
Authority
JP
Japan
Prior art keywords
heating plate
treated
temperature
workpiece
processed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11008987A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0261548B2 (enrdf_load_stackoverflow
Inventor
Tetsuo Kurisaki
栗崎　哲雄
Takahiro Anada
穴田　隆啓
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokuda Seisakusho Co Ltd
Original Assignee
Tokuda Seisakusho Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokuda Seisakusho Co Ltd filed Critical Tokuda Seisakusho Co Ltd
Priority to JP11008987A priority Critical patent/JPS63274768A/ja
Publication of JPS63274768A publication Critical patent/JPS63274768A/ja
Publication of JPH0261548B2 publication Critical patent/JPH0261548B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP11008987A 1987-05-06 1987-05-06 真空処理装置 Granted JPS63274768A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11008987A JPS63274768A (ja) 1987-05-06 1987-05-06 真空処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11008987A JPS63274768A (ja) 1987-05-06 1987-05-06 真空処理装置

Publications (2)

Publication Number Publication Date
JPS63274768A true JPS63274768A (ja) 1988-11-11
JPH0261548B2 JPH0261548B2 (enrdf_load_stackoverflow) 1990-12-20

Family

ID=14526744

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11008987A Granted JPS63274768A (ja) 1987-05-06 1987-05-06 真空処理装置

Country Status (1)

Country Link
JP (1) JPS63274768A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0294251U (enrdf_load_stackoverflow) * 1989-01-05 1990-07-26
US6756568B1 (en) 2000-06-02 2004-06-29 Ibiden Co., Ltd. Hot plate unit

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0294251U (enrdf_load_stackoverflow) * 1989-01-05 1990-07-26
US6756568B1 (en) 2000-06-02 2004-06-29 Ibiden Co., Ltd. Hot plate unit

Also Published As

Publication number Publication date
JPH0261548B2 (enrdf_load_stackoverflow) 1990-12-20

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees