JPS63274768A - 真空処理装置 - Google Patents
真空処理装置Info
- Publication number
- JPS63274768A JPS63274768A JP11008987A JP11008987A JPS63274768A JP S63274768 A JPS63274768 A JP S63274768A JP 11008987 A JP11008987 A JP 11008987A JP 11008987 A JP11008987 A JP 11008987A JP S63274768 A JPS63274768 A JP S63274768A
- Authority
- JP
- Japan
- Prior art keywords
- heating plate
- treated
- temperature
- workpiece
- processed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000009489 vacuum treatment Methods 0.000 title abstract 4
- 238000010438 heat treatment Methods 0.000 claims abstract description 66
- 239000000463 material Substances 0.000 abstract description 17
- 238000000034 method Methods 0.000 abstract description 6
- 238000013021 overheating Methods 0.000 abstract 1
- 230000011514 reflex Effects 0.000 abstract 1
- 238000004544 sputter deposition Methods 0.000 description 26
- 239000007789 gas Substances 0.000 description 9
- 230000007423 decrease Effects 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 230000005611 electricity Effects 0.000 description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000017525 heat dissipation Effects 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000003028 elevating effect Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
Landscapes
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11008987A JPS63274768A (ja) | 1987-05-06 | 1987-05-06 | 真空処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11008987A JPS63274768A (ja) | 1987-05-06 | 1987-05-06 | 真空処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63274768A true JPS63274768A (ja) | 1988-11-11 |
| JPH0261548B2 JPH0261548B2 (enrdf_load_stackoverflow) | 1990-12-20 |
Family
ID=14526744
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11008987A Granted JPS63274768A (ja) | 1987-05-06 | 1987-05-06 | 真空処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63274768A (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0294251U (enrdf_load_stackoverflow) * | 1989-01-05 | 1990-07-26 | ||
| US6756568B1 (en) | 2000-06-02 | 2004-06-29 | Ibiden Co., Ltd. | Hot plate unit |
-
1987
- 1987-05-06 JP JP11008987A patent/JPS63274768A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0294251U (enrdf_load_stackoverflow) * | 1989-01-05 | 1990-07-26 | ||
| US6756568B1 (en) | 2000-06-02 | 2004-06-29 | Ibiden Co., Ltd. | Hot plate unit |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0261548B2 (enrdf_load_stackoverflow) | 1990-12-20 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |