JPS6326386A - Method for detecting end of etching - Google Patents
Method for detecting end of etchingInfo
- Publication number
- JPS6326386A JPS6326386A JP16912586A JP16912586A JPS6326386A JP S6326386 A JPS6326386 A JP S6326386A JP 16912586 A JP16912586 A JP 16912586A JP 16912586 A JP16912586 A JP 16912586A JP S6326386 A JPS6326386 A JP S6326386A
- Authority
- JP
- Japan
- Prior art keywords
- etching
- hydrogen
- soln
- concn
- time
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005530 etching Methods 0.000 title claims abstract description 55
- 238000000034 method Methods 0.000 title claims description 17
- 239000004065 semiconductor Substances 0.000 claims abstract description 15
- 239000000758 substrate Substances 0.000 claims abstract description 14
- 229910052751 metal Inorganic materials 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 6
- 239000001257 hydrogen Substances 0.000 abstract description 24
- 229910052739 hydrogen Inorganic materials 0.000 abstract description 24
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract description 21
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 abstract description 10
- 229910000147 aluminium phosphate Inorganic materials 0.000 abstract description 5
- 239000007789 gas Substances 0.000 abstract description 5
- 150000002431 hydrogen Chemical class 0.000 abstract description 5
- 239000000243 solution Substances 0.000 description 10
- 229910052782 aluminium Inorganic materials 0.000 description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 6
- 238000001514 detection method Methods 0.000 description 6
- 239000007864 aqueous solution Substances 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000000151 deposition Methods 0.000 description 3
- 238000001039 wet etching Methods 0.000 description 3
- 241000282412 Homo Species 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 241000208140 Acer Species 0.000 description 1
- 241000894006 Bacteria Species 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Landscapes
- ing And Chemical Polishing (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明はエツチング処理終点の検出法に関し、特に半導
体基板上に被着された金属層のエツチングの処理時間の
終点を効率良く検出する方法の提供を目的とする。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a method for detecting the end point of an etching process, and in particular to a method for efficiently detecting the end point of an etching process time for a metal layer deposited on a semiconductor substrate. For the purpose of providing.
従来、半導体装置の電極および配線部分は、アルミニウ
ムを蒸着させて形成していることが多く、この工程は半
導体基板に拡散層領域を所定通量形成し、その上に被着
形成した絶縁膜に所定の窓明けをした後、全面にわたっ
て金属たとえばアルミニウムを蒸着し、感光性レジスト
を塗布し所定の回路を有するマスクを用いて露光・現像
し不要部分をエツチングして除去することにより、電極
および配線部分が形成される。Conventionally, the electrodes and wiring parts of semiconductor devices are often formed by vapor-depositing aluminum, and this process involves forming a diffusion layer region in a predetermined amount on a semiconductor substrate, and then depositing an insulating film on top of the diffusion layer region. After opening a predetermined window, metal such as aluminum is vapor-deposited over the entire surface, a photosensitive resist is applied, and a mask with a predetermined circuit is used to expose and develop the unnecessary parts to remove the electrodes and wiring. parts are formed.
上述のエツチング工程におけるエツチング液としては、
リン酸(HmPOa) 系の水溶液を用いる湿式エツ
チング方法が公知である。この湿式エツチング方法の特
徴は、エツチング処理槽内の収納治具単位で半導体基板
をエツチングする事によって、−度に多量に処理するこ
とが可能であるということである。As the etching liquid in the above etching process,
Wet etching methods using phosphoric acid (HmPOa) based aqueous solutions are known. A feature of this wet etching method is that a large amount of semiconductor substrates can be processed at one time by etching the semiconductor substrates in units of jigs stored in the etching tank.
この湿式エツチング方法において、エツチング液が新鮮
な状態であればあらかじめ設定したエツチング時間で満
足ゆくエツチングが行なわれるが、同一のエツチング液
を用いて半導体基板を大量に処理するとエツチング液が
次第に疲労し、劣化してくる。In this wet etching method, if the etching solution is fresh, etching can be performed satisfactorily within a preset etching time, but if a large number of semiconductor substrates are processed using the same etching solution, the etching solution will gradually become exhausted. It's getting worse.
上述した従来のエツチング処理終点検出法は、エツチン
グ液の劣化に比例してエツチング速度が低下してくるた
めに、エツチング液の劣化の程度に応じてエツチング処
理時間を長くする必要がめるので、適正なエツチング処
理時間の条件を把握することが極めて困難となる。また
、連続的または断続的に半導体基板を浸漬エツチング処
理する場合、エツチング剥奪する半導体基板の領域面積
や処理枚数は不特定なため、エツチング液の疲労度の管
理が非常に困難で満足のゆく浸漬エツチングが行なわれ
ないこともある。またエツチング処理時間の終点の把握
は人間が行い、そこに人為的な要因が介在するために、
作業の熟練を要するだけでなく人間の個人差が生ずるこ
ととなるという欠点がある。In the conventional etching processing end point detection method described above, the etching speed decreases in proportion to the deterioration of the etching solution, so it is necessary to lengthen the etching processing time according to the degree of deterioration of the etching solution. It becomes extremely difficult to grasp the etching processing time conditions. Furthermore, when immersion etching is performed on semiconductor substrates continuously or intermittently, the area of the semiconductor substrate to be etched and the number of semiconductor substrates to be etched are not specified, so it is very difficult to control the degree of fatigue of the etching solution. Sometimes etching is not performed. In addition, the end point of the etching processing time is determined by humans, and human factors intervene therein.
This method not only requires skill in the work, but also has the drawback that individual differences arise between people.
上述した従来のエツチング処理時間の終点検出法が1、
その終点の把握を人間が視認によシ感覚的に行なうのに
対し、本発明は金属層と酸とのエツチング反応過程時に
発生するガスに着眼し、ガスの濃度によりエツチング反
応の進行を定量的にとらえ、エツチング処理時間の終点
を検出するといった独創的内容を有する。The conventional method for detecting the end point of etching processing time described above is 1.
While humans grasp the end point visually and intuitively, the present invention focuses on the gas generated during the etching reaction process between the metal layer and acid, and quantitatively measures the progress of the etching reaction based on the gas concentration. It has original content such as detecting the end point of the etching processing time.
本発明のエツチング処理終点検出法は、半導体基板上に
金属層を被着させたのち所定形状に前記金属層をエツチ
ングするにあた楓処理槽内に満たしたエツチング液上に
ガス検知センサーを取り付け、発生するガス濃度を計測
することによりエツチング処理時間の終点を検出するこ
とを備えて構成される。The etching process end point detection method of the present invention involves depositing a metal layer on a semiconductor substrate and then etching the metal layer into a predetermined shape by attaching a gas detection sensor to the etching solution filled in a maple treatment tank. , the end point of the etching process time is detected by measuring the gas concentration generated.
次に本発明について図面全参照して説明する。 Next, the present invention will be explained with reference to all the drawings.
第1図は本発明の第一の実施例の構成を示すブロック図
、第2図は第一の実施例の処理槽の断面を示す断面図、
第3図は本発明の第二の実施例の構成を示すブロック図
、第4図はアルミニウムのエツチング面積と発生する水
素の濃度の関係を示す図表である。FIG. 1 is a block diagram showing the configuration of the first embodiment of the present invention, FIG. 2 is a sectional view showing the cross section of the processing tank of the first embodiment,
FIG. 3 is a block diagram showing the configuration of a second embodiment of the present invention, and FIG. 4 is a chart showing the relationship between the etched area of aluminum and the concentration of generated hydrogen.
エツチング液であるリン酸H1lPO4の水溶液にアル
ミニウムAIが被着された半導体基板を浸漬させてエツ
チングを進行させると、
2Al+2HsPO4→2A/PO4+ 3I(zなる
反応がおこり、水素(3H2)が発生する。第4図はA
lのエツチング面積と発生する水素の濃度の関係を示し
たもので、本発明はこの水素の発生量がアルミニウムの
反応量すなわちエツチングの量に比例することに着目し
、水素の発生量(濃度)でエツチングの進行状態を把握
しようとするものである。When a semiconductor substrate coated with aluminum AI is immersed in an aqueous solution of phosphoric acid H11PO4, which is an etching solution, and etching is allowed to progress, a reaction occurs: 2Al+2HsPO4→2A/PO4+3I(z), and hydrogen (3H2) is generated. Figure 4 is A
This figure shows the relationship between the etching area of l and the concentration of hydrogen generated.The present invention focuses on the fact that the amount of hydrogen generated is proportional to the amount of reaction of aluminum, that is, the amount of etching, and the amount of hydrogen generated (concentration) The aim is to understand the progress of etching.
以下具体的に実施例によシ説明する。This will be explained in detail below using examples.
第1図および第2図の第一の実施例においてエツチング
液であるリン酸水溶液4を満たした処理ッチングの進行
で水素ガス8が発生しエツチング液面上は、水素の雰囲
気9となる。In the first embodiment shown in FIGS. 1 and 2, hydrogen gas 8 is generated as etching progresses in a phosphoric acid aqueous solution 4 which is an etching solution, and a hydrogen atmosphere 9 is created above the etching solution surface.
水素検知センサー2は、この水素を検知し、水素検知器
3は水素濃度に対応した電気信号を出力するので、エツ
チングの進行状態を定量的に把握する事ができ、検出濃
度が飽和したところ(すなわち検出濃度の時間変化が零
となったところ)がエツチングの終点として判断する事
ができる。The hydrogen detection sensor 2 detects this hydrogen, and the hydrogen detector 3 outputs an electrical signal corresponding to the hydrogen concentration, so it is possible to quantitatively understand the progress of etching, and when the detected concentration is saturated ( In other words, the point at which the time change in detected concentration becomes zero can be determined as the end point of etching.
第二の実施例は第3図を見るに第一の実施例にベル・2
ンプ等の警報装置を設けることが可能となるり壽〒聴覚
的・視覚的にエツチングの終点を把握する制御部10全
付加しており、さらにテレメータ等を通して遠隔集中監
視も可能となる。The second embodiment is similar to the first embodiment as shown in Figure 3.
It is possible to install an alarm device such as a lamp, etc., and a control section 10 is added to audibly and visually grasp the end point of etching, and remote central monitoring is also possible through a telemeter or the like.
以上説明したように本発明は、処理槽1に水素検知セン
サー2を設置し、処理槽1内に発生した水素の検出濃度
によりエツチング処理時間の終点の検出が可能となるた
めに、エツチング液の疲労の程度に関係なく何時も適性
なエツチング処理を行なうことができ、水素の検出濃度
からエツチング処理の終点を検出するといった定量的な
判断手段であるため、従来人間の視認による感覚的な判
断に比べて非常に正確かつ安定したエツチング処理が可
能となる。As explained above, in the present invention, the hydrogen detection sensor 2 is installed in the processing tank 1, and the end point of the etching processing time can be detected based on the detected concentration of hydrogen generated in the processing tank 1. Appropriate etching processing can be performed at any time regardless of the degree of fatigue, and since it is a quantitative judgment method such as detecting the end point of etching processing from the detected concentration of hydrogen, it is easier to judge than conventional human visual judgment. This makes it possible to perform extremely accurate and stable etching processing.
第1図は本発明の第一の実施例の構成を示すブロック図
、第2図は本発明の第一の実施例の処理槽の断面を示す
断面図、第3図は第二の実施例の構成を示すブロック図
、第4図はアルミニウムのエツチング面積と発生する水
素の濃度との関係を示す図表。
1・・・・・・処理槽、2・・・・・・水素検知センサ
ー、3・・・・・・水素検知器、4・・・・・・リン酸
水溶液、5・・・・・・蓋、6・・・・・・収納治具、
7・・・・・・半導体基板、8・・・・・・水素ガス、
9・・・・・・水素雰囲気、10・・・・・・制御部。
$ / M
弗 2 菌Fig. 1 is a block diagram showing the configuration of the first embodiment of the present invention, Fig. 2 is a sectional view showing the cross section of the processing tank of the first embodiment of the invention, and Fig. 3 is the second embodiment. FIG. 4 is a diagram showing the relationship between the etched area of aluminum and the concentration of hydrogen generated. 1... Processing tank, 2... Hydrogen detection sensor, 3... Hydrogen detector, 4... Phosphoric acid aqueous solution, 5... Lid, 6... Storage jig,
7... Semiconductor substrate, 8... Hydrogen gas,
9...Hydrogen atmosphere, 10...Control unit. $ / M 弗 2 Bacteria
Claims (1)
記金属層をエッチングするにあたり、発生するガス濃度
を計測することによりエッチング処理時間の終点を検出
することを特徴とするエッチング処理終点検出法。A method for detecting the end point of an etching process, characterized in that the end point of an etching process time is detected by measuring the gas concentration generated when a metal layer is deposited on a semiconductor substrate and then etched into a predetermined shape. .
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16912586A JPS6326386A (en) | 1986-07-17 | 1986-07-17 | Method for detecting end of etching |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16912586A JPS6326386A (en) | 1986-07-17 | 1986-07-17 | Method for detecting end of etching |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6326386A true JPS6326386A (en) | 1988-02-03 |
Family
ID=15880745
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16912586A Pending JPS6326386A (en) | 1986-07-17 | 1986-07-17 | Method for detecting end of etching |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6326386A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0531149A2 (en) * | 1991-09-05 | 1993-03-10 | C. Uyemura & Co, Ltd | Etching rate determining method and apparatus |
JP2012180548A (en) * | 2011-02-28 | 2012-09-20 | Mitsubishi Heavy Ind Ltd | Method and device for acid pickling treatment |
US11171020B2 (en) | 2019-02-27 | 2021-11-09 | Toshiba Memory Corporation | Substrate treatment apparatus |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59139630A (en) * | 1983-01-31 | 1984-08-10 | Nippon Texas Instr Kk | Detector for completion of etching |
-
1986
- 1986-07-17 JP JP16912586A patent/JPS6326386A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59139630A (en) * | 1983-01-31 | 1984-08-10 | Nippon Texas Instr Kk | Detector for completion of etching |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0531149A2 (en) * | 1991-09-05 | 1993-03-10 | C. Uyemura & Co, Ltd | Etching rate determining method and apparatus |
JP2012180548A (en) * | 2011-02-28 | 2012-09-20 | Mitsubishi Heavy Ind Ltd | Method and device for acid pickling treatment |
US11171020B2 (en) | 2019-02-27 | 2021-11-09 | Toshiba Memory Corporation | Substrate treatment apparatus |
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