JPS63250164A - High power hybrid integrated circuit substrate and its integrated circuit - Google Patents

High power hybrid integrated circuit substrate and its integrated circuit

Info

Publication number
JPS63250164A
JPS63250164A JP8389487A JP8389487A JPS63250164A JP S63250164 A JPS63250164 A JP S63250164A JP 8389487 A JP8389487 A JP 8389487A JP 8389487 A JP8389487 A JP 8389487A JP S63250164 A JPS63250164 A JP S63250164A
Authority
JP
Japan
Prior art keywords
circuit
aluminum
integrated circuit
copper
circuits
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8389487A
Other languages
Japanese (ja)
Inventor
Kazuo Kato
和男 加藤
Tatsuo Nakano
辰夫 中野
Shinichiro Asai
新一郎 浅井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Denka Co Ltd
Original Assignee
Denki Kagaku Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Denki Kagaku Kogyo KK filed Critical Denki Kagaku Kogyo KK
Priority to JP8389487A priority Critical patent/JPS63250164A/en
Publication of JPS63250164A publication Critical patent/JPS63250164A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors

Landscapes

  • Insulated Metal Substrates For Printed Circuits (AREA)

Abstract

PURPOSE:To stabilize quality with no current concentration and to decrease width of copper circuit patterns and to miniaturize the whole of circuits, by standardizing thickness of the whole of copper circuit patterns to be 35 mum or more. CONSTITUTION:Thick copper foil parts 1 as lower layers composed of heterogeneous metal composite foils are laminated on a base metal 6 through an insulating layer 5, and also aluminium bonding posts 3 as upper layers are laminated thereon. Power transistors 7 and diodes 8 are connected with the aluminium bonding posts 3 by the use of aluminium wires 9 so as to form circuits. Thickness of each copper foil thick part of the heterogeneous metal composite foils used in this invention is required to be 35mum or more, and large current conduction capacity can not be obtained when this thickness is 35mum or less. Though an upper limit is not restricted, this limit is 300mum or so in consideration of cost. Then, for example, silicon resin can be singly used or filler-containing silicon resin of good heat conductivity can be used as gelled silicon group resin which seals the circuits.

Description

【発明の詳細な説明】 (産業上の利用分野〕 本発明は銅回路パターンの全てを肉厚65μmを越罠し
て、大電流の必要な回路部分とな丁インパ 。
DETAILED DESCRIPTION OF THE INVENTION (Industrial Field of Application) The present invention is designed to make all of the copper circuit patterns have a wall thickness exceeding 65 μm so that they can be used as circuit parts that require large currents.

−用混成集積回路に関するものである。- relates to hybrid integrated circuits for

(従来の技術) パワーモジュール用の混成集積回路基板としてはセラミ
ックス基板が従来から多く使用されて来たが、その回路
形成が貴金属ペーストによるため、シート抵抗が大きく
、近年のパワーモジュールの大電流化には不向きになっ
て来ている。従って従来は銅等の金属薄板全回路に半田
付し、この大電流化に対応していた。またこれに代る基
板としてアルミニウム′と銅の両方の金属が露出した回
路を有し、絶縁層に高熱伝導性の樹脂を用いた金属ベー
ス基板が開発さnた(特開昭58−48432号公報)
(Prior technology) Ceramic substrates have traditionally been widely used as hybrid integrated circuit boards for power modules, but because the circuits are formed using noble metal paste, their sheet resistance is large, and the current trend in power modules has increased in recent years. It is becoming unsuitable for Therefore, in the past, all circuits were soldered to thin metal plates such as copper to cope with the increased current. In addition, as an alternative board, a metal base board was developed that had a circuit with exposed metals of both aluminum and copper and used a highly thermally conductive resin for the insulating layer (Japanese Patent Laid-Open No. 58-48432). Public bulletin)
.

この基板は銅の露出した回路の一部で半田付による回路
形成例えばヒートスプレッダ−や外部す−ドの接続を行
ない、アルミニウムの露出した回路の一部で半導体ベア
ーチップとの超音波振動アルミニウムワイヤーボンディ
ングを行なう様に設計さnている。
This board uses a part of the circuit with exposed copper to form a circuit by soldering, such as connecting a heat spreader or an external board, and a part of the circuit with exposed aluminum to perform ultrasonic vibration aluminum wire bonding with a semiconductor bare chip. It is designed to do the following.

しかしこの方法は、社会金属箔の厚みが薄く電流値に制
限があシ、銅箔に直接発熱素子と半田付することは前記
銅箔が薄いため出来ず、ヒートスプレッダ−が必要とな
る。
However, in this method, the current value is limited due to the thin thickness of the metal foil, and it is impossible to solder the heating element directly to the copper foil because the copper foil is thin, and a heat spreader is required.

またアルミニウムおよび銅回路パターンの露出部の銅回
路の局所に厚付きメッキを施すことによシ、大電流通電
用回路や半導体、発熱素子を設けたハイパワー用混成集
積回路がある(特開昭62−2587号公報)。
There are also high-power hybrid integrated circuits in which large current carrying circuits, semiconductors, and heat generating elements are provided by applying thick plating to the exposed areas of the aluminum and copper circuit patterns. 62-2587).

一方、局所に厚付きメッキをした銅回路では、厚付きメ
ッキ出来ないアルミニウムと銅との接合金属箔の厚みが
薄いため1.電流値に制限があること及びメッキ時間が
長いためハイパワー用混成集積回路としての品質の安定
性に欠く欠点があった。
On the other hand, in copper circuits where thick plating is applied locally, the bonding metal foil between aluminum and copper, which cannot be plated thickly, is too thin; Due to the limited current value and the long plating time, there was a drawback that the quality of the high-power hybrid integrated circuit lacked stability.

(発明が解決しようとする問題点) 本発明はかかる欠点を解決したものであシ、銅パワー用
混成集積回路としての品質が安定化し、さらに銅回路パ
ターンの幅を狭くできることよシ回路全体を小型化でき
る。さらに回路の成造工程の簡略化、製造コストの低減
にもつながるハイパワー用混成集積回路を完成するに至
った。
(Problems to be Solved by the Invention) The present invention solves these drawbacks by stabilizing the quality of the copper power hybrid integrated circuit and further reducing the width of the copper circuit pattern. Can be made smaller. Furthermore, we have completed a high-power hybrid integrated circuit that simplifies the circuit fabrication process and reduces manufacturing costs.

(問題点を解決するための手段) すなわち本発明は、 1)ベース金属上に絶縁層を介して肉厚65μmt(ラ
ム回路どをアルミニウム線で接続したことを特徴とする
ハイパワー用混成集積回路基板であシ、 た基板に半導体装置し、該半導体とアルミニウム回路と
をアルミニウム線で接続した回路基板に外部リード端子
を接続し、前記回路基板をデル状シリコン系樹脂および
エポキシ系樹脂組成物にて封止したことを特徴とするバ
イパワー用混成集積回路である。
(Means for Solving the Problems) That is, the present invention provides: 1) A high-power hybrid integrated circuit characterized by having a wall thickness of 65 μm (RAM circuits, etc.) connected to the base metal via an insulating layer with aluminum wires. A semiconductor device is mounted on a substrate, an external lead terminal is connected to a circuit board in which the semiconductor and an aluminum circuit are connected with an aluminum wire, and the circuit board is coated with a delta-shaped silicon resin and epoxy resin composition. This is a bi-power hybrid integrated circuit characterized by being sealed with

以下本発明の詳細な説明する。The present invention will be explained in detail below.

第1図(aL (t+)は、本発明の混成集積回路を表
わす実施例の平面図と断面図である。ベース金属6上に
は絶縁層5を介して異種金属接合箔からなる下層が肉厚
銅箔部1、上層が・アルミニウムボンディングポスト3
が積層さnている。また肉厚銅箔部1の局所には大電流
用としての部分的に共晶半田10によシ半導体、例えば
パワートランジスター7が載置され、その他見熱素子例
えばトランジスター、FET、  IC等、具体的には
ダイオード8が塔載さtている。さらにこれ等のパワー
トランジスター7とダイオード8は、アルミニウムワイ
ヤー9によりアルミニウムボンディングポスト3に接続
されて回路を形成している。次に第2図は第1図回路の
外部リード端子半田付部4で外部リード端子11を接続
した後、回路の周囲をパッケージ12で覆い、絶縁層5
よシ上層部をパッケージ12の上端までrル状シリコン
系樹脂13とエポキシ樹脂組成物14で封止した回路の
断面図である。
FIG. 1 (aL (t+)) is a plan view and a cross-sectional view of an embodiment showing a hybrid integrated circuit of the present invention.A lower layer made of dissimilar metal bonding foil is formed on the base metal 6 with an insulating layer 5 interposed therebetween. Thick copper foil part 1, upper layer is aluminum bonding post 3
are laminated. In addition, a semiconductor such as a power transistor 7 is placed locally on the thick copper foil portion 1 using eutectic solder 10 for large current, and other heat sensing elements such as a transistor, FET, IC, etc. Specifically, a diode 8 is installed. Furthermore, these power transistors 7 and diodes 8 are connected to aluminum bonding posts 3 by aluminum wires 9 to form a circuit. Next, in FIG. 2, after connecting the external lead terminal 11 at the external lead terminal soldering part 4 of the circuit shown in FIG.
FIG. 2 is a cross-sectional view of a circuit whose upper layer is sealed up to the upper end of the package 12 with a ripple-shaped silicone resin 13 and an epoxy resin composition 14.

本発明に用いるベース金属板としては、良熱伝導性を有
する、アルミニウム、銅、鉄やそれらの合金が用いらn
る。また熱伝導性の良い絶縁層はアルミナ、ベリリア、
ボロンナイトライド、マグネシア、シリカンよび窒化ア
ルミニウム等の良熱伝導性無機フィラーを例えば60重
量%以上含んだ熱硬化性樹脂等がちシ、その厚みも耐電
圧が許される限シ薄いものが良く、通常は20μm以上
は必要であるー。
The base metal plate used in the present invention may be made of aluminum, copper, iron, or an alloy thereof, which has good thermal conductivity.
Ru. Insulating layers with good thermal conductivity include alumina, beryllia,
Thermosetting resins containing, for example, 60% by weight or more of inorganic fillers with good thermal conductivity such as boron nitride, magnesia, silicane, and aluminum nitride, etc., are preferably thin as long as the withstand voltage is acceptable. It is necessary to have a thickness of 20 μm or more.

本発明に言う、異種金属接合箔のアルミニウムと肉厚銅
箔の両方の金属が露出した回路全形成する方式には2つ
あシ、その1つはアルミニウム銅クラツド箔又はアルミ
ニウム箔上に銅メッキして形成した箔、あるいはアルミ
ニウム箔に亜鉛もしぐはニッケルを介して銅?順次メッ
キした箔を絶縁物上に張り合せた基板をエツチングによ
シ回路形成したものである。
According to the present invention, there are two methods for forming a circuit in which both the aluminum and thick copper foil of the dissimilar metal bonding foil are exposed; one is aluminum-copper clad foil or copper plating on aluminum foil. Aluminum foil with zinc or copper through nickel? A circuit is formed by etching a substrate in which sequentially plated foils are laminated onto an insulator.

また本発明に用いる異種金属主層金箔の肉写銅箔部の肉
厚は、65μm越、好゛ましくは45μm〜600μm
1さらに好ましくは50μm〜150μmである。肉厚
が65μm以下では大電流通電容量が得られず、また上
限は別に制限はないが、コスト的に30口μm程度が限
度である。
Further, the thickness of the exposed copper foil portion of the dissimilar metal main layer gold foil used in the present invention is more than 65 μm, preferably 45 μm to 600 μm.
1 More preferably, it is 50 μm to 150 μm. If the wall thickness is 65 μm or less, a large current carrying capacity cannot be obtained, and although there is no particular upper limit, the limit is about 30 μm in terms of cost.

次に回路を制止するケ9ル状シリコン系樹脂は例えji
シリコン樹脂単独または、良熱伝導性を有する充填剤含
有シリコン樹脂のいずれでもよい。さらにエポキシ位1
脂組成物は耐湿性、低応力金持つ組成物であnば何んら
限定するものでない。
Next, the shell-shaped silicone resin that stops the circuit is, for example,
Either a silicone resin alone or a filler-containing silicone resin having good thermal conductivity may be used. Furthermore, epoxy position 1
The fat composition is not limited in any way as long as it is moisture resistant and has low stress.

すなわち本発明の混成集積回路に用いる基板はアルミニ
ウムと肉厚銅箔の両方の金属が露出した回路基板であυ
、露出したアルミニウム回路の下にも肉厚銅箔からなる
回′#5が存在するため、電流容量的に充分であり、大
電流が流せらハる。また、発熱素子全固着する部分も肉
厚銅箔となっているため、発熱素子全半田付−fnばヒ
ートスプレッダ−にもなる。
In other words, the substrate used in the hybrid integrated circuit of the present invention is a circuit board in which both aluminum and thick copper foil metals are exposed.
Since circuit #5 made of thick copper foil is also present under the exposed aluminum circuit, it has sufficient current capacity and a large current can flow through it. Furthermore, since the portion to which the heating element is completely fixed is also made of thick copper foil, it also serves as a heat spreader if the heating element is completely soldered.

その他では、発熱素子(パワー素子〕の発熱=1、サイ
ズ、基板の熱伝導率が問題となり、従って熱伝:4性の
良い絶、禄層を有する金属基板が本発明によるハイパワ
ー用混成集積回路として必要となる。
In other cases, the heat generation of the heating element (power element) = 1, the size, and the thermal conductivity of the substrate are issues.Therefore, a metal substrate with a heat conduction layer with good heat conduction properties is used for high power hybrid integration according to the present invention. Necessary as a circuit.

(実施例) 以下実施例により詳細に説明する。(Example) This will be explained in detail below using examples.

実施例 第4図taL (b)に示すごとぐ、基板は、ベース金
属板6に絶縁層5を介して120μmの銅箔と10μm
のアルミニウム箔からなる異種金属1金箔によシ構成さ
nている。まず、この基板で半田付きの必要な部分(端
子取付部、パワートランジスターやダイオードの取付部
〕にスクリーン印刷により半田ペーストを印馴した。次
に8×8×0.2簡のパワートランジスター6ケと1.
5 ×1.5×0.29のダイオード6ケを第1図に示
す個所に置き、半田リフロー炉全通して半田付けした。
Embodiment As shown in FIG. 4 (b), the substrate is made of a 120 μm thick copper foil and a 10 μm thick copper foil on a base metal plate 6 with an insulating layer 5 interposed therebetween.
It is composed of dissimilar metals consisting of aluminum foil and gold foil. First of all, on this board, the solder paste was used to be solder paste on the necessary parts (terminal mounting portion, powertresse rangster and diode mounting portion]. and 1.
Six diodes of 5 x 1.5 x 0.29 were placed at the locations shown in Figure 1 and soldered through a solder reflow oven.

次に400μmの直径を有するアルミニウム太線を用い
、このパワートランジスターからアルミニウムボンディ
ングポストに超音波振動法でワイヤーボンディングして
配線した。・同機にパワートランジスターがらダイオー
ドへもワイヤーボンディングした。
Next, using a thick aluminum wire having a diameter of 400 μm, wire bonding was performed from this power transistor to an aluminum bonding post using an ultrasonic vibration method.・Wire bonding was done to the power transistor and diode of the same machine.

次に14本の外部リード端子金半田付した後パッケージ
を回路にかぶせシリコン樹脂を第2図の様にアルミニウ
ムワイヤーやパワートランジスターがかくれるまで注入
し、硬化させゲル状にした。
Next, after soldering the 14 external lead terminals with gold, the package was placed over the circuit, and silicone resin was injected until it covered the aluminum wires and power transistors as shown in Figure 2, and was cured into a gel-like state.

その後エポキシ樹脂組成物をその±から注入し、硬化さ
せた。
Thereafter, an epoxy resin composition was injected from the positive and negative sides and cured.

以上の工程を経ることにより第6図に示す電気回路を有
する、モーター制御用大電力パワーモジュール(インバ
ーター)を完成させた。このインバーターはコレクタ絶
縁型のため取付けが簡単で許容電流全4OAにすること
が出来た。
By going through the above steps, a high-power power module (inverter) for controlling a motor was completed, having the electric circuit shown in FIG. This inverter is collector insulated, so it is easy to install and has a total allowable current of 4OA.

(比較例) 第4図の銅箔が10μmになった池は実施例と同機の基
板?用いて、第3図に示すインバーターを大造した。
(Comparative example) Is the pond in Figure 4 with a copper foil of 10 μm the same board as the example? Using this method, the inverter shown in Fig. 3 was constructed.

まず実施例と同じパワートランジスター’に16×16
x0.8JJIの銅製ヒートスプレッダ−に高温半田で
半田付した。このもの全実施例と同様に半田ペーストラ
スクリーン印刷した基板上に置き、ダイオードと共に半
田全リフローし半田付した。
First, the same power transistor as in the example, 16×16
It was soldered to a x0.8JJI copper heat spreader using high temperature solder. This product was placed on a screen-printed board with solder paste in the same manner as in all Examples, and soldered together with the diode by complete solder reflow.

以後の工程は実施例と同機にしてパンケージした完成品
?、得た。このインバーターは銅箔厚みが10μmと薄
いため、許容電流は10A以下であった。
Is the subsequent process the same machine as the example and a pan-packed finished product? ,Obtained. Since the copper foil thickness of this inverter was as thin as 10 μm, the allowable current was 10 A or less.

(発明の効果) 以上のとおり本発明はアルミニウムと肉厚銅ロ路パター
ン上に部分的にアルミニウム回路パターンを有する絶縁
金属基板において半導体等とアルミニウム回路とをアル
ミニウム線で接続した回路であシ、(1)犬′電流を流
せる様にセラミック基板における金属薄板による回路の
補強の必要がない(2)ヒートスプレッダ−全半田付す
る必要がなく、(3)アルミニウムのワイヤーボンディ
ングポスト力するため、アルミニウム線による半導体の
ワイヤーボンディングが信頼性良く出来る。特に数百μ
mの直径を有する太線のアルミワイヤーは、パワートラ
ンジスター等の大電流を流す半導体素子の詰綿には欠か
せないものであシ、この太線のアルミワイヤーがワイヤ
ーボンディング出来る利点がある。
(Effects of the Invention) As described above, the present invention is a circuit in which a semiconductor or the like and an aluminum circuit are connected by an aluminum wire in an insulated metal substrate having an aluminum circuit pattern partially on a thick copper circuit pattern. (1) There is no need to reinforce the circuit with a thin metal plate on the ceramic substrate to allow the current to flow through it. (2) There is no need to fully solder the heat spreader, and (3) there is no need for aluminum wire bonding posts, so the aluminum wire wire bonding of semiconductors can be done with high reliability. Especially several hundred μ
Thick aluminum wire with a diameter of m is indispensable for stuffing semiconductor devices such as power transistors that carry large currents, and this thick aluminum wire has the advantage of being wire bondable.

更に熱伝導性の良い絶縁層を有する金属基板を用いるこ
とによシ(4)従来のセラミック基板を用いた場合より
も熱伝導性が良くなシ、パワーモジュールの大電力化に
有利である。しかも(5)セラミック基板を用いたパワ
ーモジュールではセラミックが割れ易いため銅のニッケ
ルメッキ板等のペース金属をセラミック基板に半田付は
等で接着せねばならないが、金属基板ではペース金属が
第2図に示す、様にパッケージの下部に配置されるため
、新しくペース金属を置く必要がない等の利点がある。
Furthermore, by using a metal substrate having an insulating layer with good thermal conductivity, (4) the thermal conductivity is better than in the case of using a conventional ceramic substrate, which is advantageous for increasing the power of the power module. Moreover, (5) in a power module using a ceramic substrate, since the ceramic is easily broken, a paste metal such as a nickel-plated copper plate must be bonded to the ceramic substrate by soldering, etc., but with a metal substrate, the paste metal is Since it is placed at the bottom of the package as shown in the figure, it has the advantage that there is no need to place new paste metal.

【図面の簡単な説明】[Brief explanation of drawings]

第1図(a)、(1))は本発明のハイパワー用混成集
積回路の平面図および断面図であり、第2図は第1図の
集積回路ヲ憫脂制止した集積回路の断面図を表わす。ま
た第3図は電気回路図である。次に第4図(a)、(1
))は実装前の基板を表わす平面図と断面図である。 符号1・・・肉厚銅箔部、3・・・アルミニウムボンデ
ィングポスト、4・・・外部リード端子半田付部、5・
−・絶縁層、6・・・ベース金属板、7・・・パワート
ランジスター、8・・・ダイオード、9・・・アルミニ
ウムワイヤー、10・・・共晶半田、11・・・外部リ
ード端子、12・・・パッケージ、13−・・rル状シ
リコン系樹脂、14・・・エポキシ樹脂組成物
1(a) and (1)) are a plan view and a sectional view of a high power hybrid integrated circuit of the present invention, and FIG. 2 is a sectional view of an integrated circuit in which the integrated circuit of FIG. 1 is suppressed. represents. FIG. 3 is an electrical circuit diagram. Next, Fig. 4(a), (1
)) is a plan view and a cross-sectional view showing the board before mounting. Code 1... Thick copper foil part, 3... Aluminum bonding post, 4... External lead terminal soldering part, 5...
- Insulating layer, 6... Base metal plate, 7... Power transistor, 8... Diode, 9... Aluminum wire, 10... Eutectic solder, 11... External lead terminal, 12 ... Package, 13-... R-shaped silicone resin, 14... Epoxy resin composition

Claims (3)

【特許請求の範囲】[Claims] (1)ベース金属上に絶縁層を介して肉厚35μmを越
してなる銅回路パターンおよび該回路上に形成されたア
ルミニウム回路パターンを夫々設けた基板に半導体を配
置し、該半導体とアルミニウム回路とをアルミニウム線
で接続したことを特徴とするハイパワー用混成集積回路
基板。
(1) A semiconductor is placed on a substrate on which a copper circuit pattern with a thickness exceeding 35 μm and an aluminum circuit pattern formed on the circuit are provided on a base metal via an insulating layer, and the semiconductor and the aluminum circuit are connected to each other. A high-power hybrid integrated circuit board characterized by connecting the two with aluminum wires.
(2)絶縁層が良熱伝導性樹脂組成物であることを特徴
とする特許請求の範囲第1項記載の集積回路。
(2) The integrated circuit according to claim 1, wherein the insulating layer is made of a resin composition with good thermal conductivity.
(3)ベース金属上に絶縁層を介して肉厚55μmを越
してなる銅回路パターンおよび該回路上に形成されたア
ルミニウム回路パターンを夫々設けた基板に半導体を配
置し、該半導体とアルミニウム回路とをアルミニウム線
で接続した回路基板に外部リード端子を接続し、前記回
路基板をゲル状シリコン系樹脂およびエポキシ系樹脂組
成物にて封止したことを特徴とするハイパワー用混成集
積回路。
(3) A semiconductor is placed on a substrate on which a copper circuit pattern with a thickness exceeding 55 μm and an aluminum circuit pattern formed on the circuit are provided on a base metal via an insulating layer, and the semiconductor and the aluminum circuit are connected to each other. 1. A high-power hybrid integrated circuit, characterized in that an external lead terminal is connected to a circuit board which is connected with an aluminum wire, and the circuit board is sealed with a gel-like silicon resin and an epoxy resin composition.
JP8389487A 1987-04-07 1987-04-07 High power hybrid integrated circuit substrate and its integrated circuit Pending JPS63250164A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8389487A JPS63250164A (en) 1987-04-07 1987-04-07 High power hybrid integrated circuit substrate and its integrated circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8389487A JPS63250164A (en) 1987-04-07 1987-04-07 High power hybrid integrated circuit substrate and its integrated circuit

Publications (1)

Publication Number Publication Date
JPS63250164A true JPS63250164A (en) 1988-10-18

Family

ID=13815342

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8389487A Pending JPS63250164A (en) 1987-04-07 1987-04-07 High power hybrid integrated circuit substrate and its integrated circuit

Country Status (1)

Country Link
JP (1) JPS63250164A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS645092A (en) * 1987-06-29 1989-01-10 Denki Kagaku Kogyo Kk Circuit substrate for high power and hybrid integrated circuit thereof
US4984065A (en) * 1989-01-11 1991-01-08 Kabushiki Kaisha Toshiba Hybrid resin-sealed semiconductor device
US5408128A (en) * 1993-09-15 1995-04-18 International Rectifier Corporation High power semiconductor device module with low thermal resistance and simplified manufacturing

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5848432A (en) * 1981-09-17 1983-03-22 Denki Kagaku Kogyo Kk Manufacture of hybrid integrated circuit
JPS622587A (en) * 1985-06-28 1987-01-08 電気化学工業株式会社 Hybryd integrated circuit for high power

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5848432A (en) * 1981-09-17 1983-03-22 Denki Kagaku Kogyo Kk Manufacture of hybrid integrated circuit
JPS622587A (en) * 1985-06-28 1987-01-08 電気化学工業株式会社 Hybryd integrated circuit for high power

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS645092A (en) * 1987-06-29 1989-01-10 Denki Kagaku Kogyo Kk Circuit substrate for high power and hybrid integrated circuit thereof
US4984065A (en) * 1989-01-11 1991-01-08 Kabushiki Kaisha Toshiba Hybrid resin-sealed semiconductor device
US5408128A (en) * 1993-09-15 1995-04-18 International Rectifier Corporation High power semiconductor device module with low thermal resistance and simplified manufacturing

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