JPS6323386A - Method for assemblying semiconductor laser - Google Patents

Method for assemblying semiconductor laser

Info

Publication number
JPS6323386A
JPS6323386A JP16634587A JP16634587A JPS6323386A JP S6323386 A JPS6323386 A JP S6323386A JP 16634587 A JP16634587 A JP 16634587A JP 16634587 A JP16634587 A JP 16634587A JP S6323386 A JPS6323386 A JP S6323386A
Authority
JP
Japan
Prior art keywords
laser element
semiconductor laser
width
bonding agent
heat dissipation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16634587A
Other languages
Japanese (ja)
Other versions
JPH0156555B2 (en
Inventor
Hirokazu Fukuda
福田 広和
Koji Shinohara
篠原 宏爾
Yoshio Kawabata
川端 良雄
Yoshito Nishijima
西嶋 由人
Kosaku Yamamoto
山本 功作
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP16634587A priority Critical patent/JPS6323386A/en
Publication of JPS6323386A publication Critical patent/JPS6323386A/en
Publication of JPH0156555B2 publication Critical patent/JPH0156555B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE:To prevent part of laser light from being reflected on the surface of a bonding agent by a method wherein a protrusion part having a width slightly wider than the width of a semiconductor laser element in the laser light emitting direction is formed on the upper surface of a heat dissipation substrate and the semiconductor laser element is thermally fixed by pressure on the protrusion part using the bonding agent. CONSTITUTION:A protrusion part 5, which has a width W slightly wider than the width P of a semiconductor laser element 2 and has a height of H, is formed on the upper surface of a heat dissipation substrate consisting of Cu, for example. That is, when an In piece, a little excessive in amount, to be used as a bonding agent 3 is placed on the protrusion part 5 and heated, the In piece is fused on the whole upper surface of the protrusion part, becomes highest at the central part by surface tension at that time and the form of a prescribed curved surface can be obtained. Then, the semiconductor laser element 2 is placed on the bonding agent 3 which has been formed and solidified in a protuberance with a prescribed width, and while the heat dissipation substrate 1 is heated by means of a bonding device, the laser element is buried and adhered in the bonding agent by thermocompression bonding. In this case, the pressing force of the bonding device is properly adjusted and the laser element is prevented form being buried in the bonding agent 3 so far as a part, from which laser light is emitted, in the vicinity of the luminous junction region 4 of the semiconductor laser element 2.

Description

【発明の詳細な説明】 本発明は放熱基台上に半導体レーザ素子を配設してなる
半導体レーザ装置における半導体レーザ素子の取りつけ
方法の改良に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an improvement in a method for mounting a semiconductor laser element in a semiconductor laser device in which the semiconductor laser element is disposed on a heat dissipation base.

一般に半導体レーザ装置は第1図に示すように例えば銅
(Cu)からなる放熱基台1上の端縁部に半導体レーザ
素子2を例えばインジウムun)からなる接着剤3で接
着しである。この場合、半導体レーザ素子2を接着する
には放熱基台1の表面に接着剤3を薄(のばして被着し
、その接着剤3上に半導体レーザ素子2を載置し、接着
固定する方法が採られている。このような方法で形成し
た半導体レーザ装置においては、接着剤3の表面で半導
体レーザ素子2からのレーザ光の一部が実線矢印A′の
ごとく不所望の方向に反射される不都合がある。この原
因は半導体レーザ素子2における発光接合領域4の放熱
基台1表面からの距離が極めて近いことと、レーザ光が
実線矢印A、  Bのごとく垂直方向にある拡がりをも
って出射されることによる。前者は熱放散を良くするた
めの余儀ない処置であり、後者は半導体レーザの本質に
基づくもので、いずれも不可避である。また接着剤3の
表面を光学的平面とすることは困難であるので、レーザ
光の一部は接着剤3の表面で乱反射されて散逸する可能
性もある。
Generally, as shown in FIG. 1, in a semiconductor laser device, a semiconductor laser element 2 is bonded to an edge portion of a heat dissipation base 1 made of, for example, copper (Cu) with an adhesive 3 made of, for example, indium (un). In this case, in order to adhere the semiconductor laser element 2, the method is to apply a thin layer of adhesive 3 on the surface of the heat dissipation base 1, place the semiconductor laser element 2 on the adhesive 3, and fix the semiconductor laser element 2 by adhesive. In the semiconductor laser device formed by such a method, a part of the laser light from the semiconductor laser element 2 is reflected in an undesired direction on the surface of the adhesive 3 as shown by the solid arrow A'. The reason for this is that the distance between the light emitting junction region 4 of the semiconductor laser device 2 and the surface of the heat dissipation base 1 is extremely short, and the laser light is emitted with a certain spread in the vertical direction as shown by solid arrows A and B. The former is an unavoidable measure to improve heat dissipation, and the latter is based on the nature of semiconductor lasers, and both are unavoidable.Also, making the surface of the adhesive 3 optically flat is Since this is difficult, part of the laser light may be diffusely reflected on the surface of the adhesive 3 and may be scattered.

本発明は前述の点に鑑みなされたもので、その目的は放
熱基台上に所定幅の接着剤を咳幅の中央部が凸状になる
ように盛り上げて形成し、その接着剤上に半導体レーザ
素子を熱圧着で埋込み、もってレーザ光を効率的に所望
の方向に出射せしめることを図った半導体レーザ装置の
組立方法を提供することである。
The present invention has been made in view of the above-mentioned points, and its purpose is to form an adhesive of a predetermined width on a heat dissipation base so that the central part of the cough width is convex, and to apply a semiconductor on the adhesive. An object of the present invention is to provide a method for assembling a semiconductor laser device in which a laser element is embedded by thermocompression bonding, thereby efficiently emitting laser light in a desired direction.

この目的は、放熱基台上に半導体レーザ素子を配設して
なる半導体レーザ装置において、前記放熱基台上面に半
導体レーザ素子のレーザ光出射方向における幅よりわず
かに広い幅を有する凸部を形成し、該凸部上に金属ろう
を溶融してその表面が幅中央で最も高くなるよう上方に
凸な曲面とするとともに、該凸部の淵まで該金属ろうに
よって専有されるように配置した後固化し、その後、前
記放2基台を加熱しつつ固化した金属ろう中にレーザ素
子の一部を、前記レーザ素子の活性層近傍のレーザ光出
射部分が露出するように沈めた状態で熱圧着する本発明
の方法により解決される。
The purpose of this is to form a convex portion having a width slightly wider than the width of the semiconductor laser element in the laser beam emission direction on the upper surface of the heat radiation base in a semiconductor laser device in which a semiconductor laser element is disposed on a heat radiation base. Then, after melting a metal solder on the convex part to form an upwardly convex curved surface so that the surface is highest at the center of the width, and placing it so that the edge of the convex part is occupied by the metal solder. After solidifying, a part of the laser element is submerged in the solidified metal solder while heating the second base, and is thermocompression bonded with the laser element submerged so that the laser beam emitting part near the active layer of the laser element is exposed. This problem is solved by the method of the present invention.

以下本発明の実施例につき図面を参照して説明する。Embodiments of the present invention will be described below with reference to the drawings.

第2回は本発明による半導体レーザ装置の組立方法を説
明するための要部模式断面図であって、第1図と同等部
分には同一符号を付した。
The second part is a schematic sectional view of main parts for explaining the method of assembling a semiconductor laser device according to the present invention, and the same parts as in FIG. 1 are given the same reference numerals.

図において、1は例えばCuからなる放熱基台であって
、その放熱基台1上面に半導体レーザ素子2の幅Pより
わずかに広い幅Wを有し、高さHなる凸部5を形成して
いる。いま例えば半導体レーザ素子2のレーザ光出射方
向における幅、つまり実線矢印で示したA、B方向にお
ける幅Pを0゜311とした場合、凸部5の幅W3は0
.5鰭に設定している。また凸部5の高さHは例えば0
.3 ml程度である。
In the figure, reference numeral 1 denotes a heat dissipation base made of, for example, Cu, and a convex portion 5 having a width W slightly wider than the width P of the semiconductor laser element 2 and a height H is formed on the upper surface of the heat dissipation base 1. ing. For example, if the width of the semiconductor laser element 2 in the laser beam emission direction, that is, the width P in the directions A and B indicated by solid line arrows, is 0°311, then the width W3 of the convex portion 5 is 0.
.. It is set to 5 fins. Further, the height H of the convex portion 5 is, for example, 0.
.. It is about 3 ml.

この凸部5上面に半導体レーザ素子2を例えばInから
なる接着剤3で接着するのであるが、その接着剤3は半
導体レーザ素子よりわずかに広い幅で、かつ中央部が最
も高くなるように盛り上げて形成される。こうするには
凸部5上に接着剤3となるべきIn片を余分目に!!2
WL、例えば160°C程度で加熱するとIn片が凸部
上面の全面に溶融して、その時の表面張力で中央部が最
も高くなり所定の曲面形状が得られる。
The semiconductor laser element 2 is bonded to the upper surface of the convex portion 5 using an adhesive 3 made of, for example, In. It is formed by To do this, place an extra piece of Indium on top of the convex portion 5, which will become the adhesive 3! ! 2
When heated at WL, for example, about 160° C., the In piece melts over the entire upper surface of the convex portion, and the surface tension at that time is highest at the center, resulting in a predetermined curved shape.

このように、接着剤3を中央部が最も高くなるような曲
面形状に塗布するのは、後述するようにレーザ素子2を
接着剤中へ熱圧着により埋め込んでマウントした場合、
レーザ素子からの出射光が接着剤表面で反射することが
ないようにするためである。
In this way, applying the adhesive 3 in a curved shape such that the center part is highest is when the laser element 2 is embedded and mounted in the adhesive by thermocompression bonding as described later.
This is to prevent the emitted light from the laser element from being reflected on the adhesive surface.

次いで、上記所定の幅で盛り上げて形成固化した接着剤
3上に半導体レーザ素子2を載置し、ボンディング’A
llを用いて放熱基台1を加熱しつつ、レーザ素子を接
着剤中へ熱圧着により埋込み接着する。この場合ボンデ
ィング装置の加圧力を適当に調整して、前記半導体レー
ザ素子20発光接合領域4近傍のレーザ光が出射する部
分まで接着剤3中に埋め込まないようにするのは勿論で
あるが、レーザ素子下面の全面が接着剤3に接触するこ
とが肝要である。
Next, the semiconductor laser element 2 is placed on the adhesive 3 which has been raised to a predetermined width and solidified, and bonding 'A' is performed.
While heating the heat dissipation base 1 using the heat sink 1, the laser element is embedded and bonded into the adhesive by thermocompression bonding. In this case, it goes without saying that the pressure of the bonding device should be adjusted appropriately so that the part of the semiconductor laser element 20 near the light-emitting bonding region 4 from which the laser beam is emitted is not buried in the adhesive 3. It is important that the entire bottom surface of the element be in contact with the adhesive 3.

このようにすれば半導体レーザ素子2の発光接合領域4
から出射したレーザ光は実線矢印A、  Bに示すよう
に半導体レーザ素子の性質で定まる角度で拡がり、従来
のようにレーザ光の一部が接着剤表面で反射されること
がなくなるので、ある方向に偏ってレーザ光の強度が強
くなるようなことがなく、また出射レーザ光が乱反射す
るようなこともなくなり、レーザ光の利用効率の高い半
導体レーザ装置を得ることができる。またレーザ素子下
面の全面がInの接着剤に接触しているので、素子の幅
方向の熱分布が均一となりレーザ特性の劣化が防止でき
る。
In this way, the light emitting junction region 4 of the semiconductor laser device 2
As shown by the solid arrows A and B, the laser light emitted from the laser beam spreads at an angle determined by the properties of the semiconductor laser element, and part of the laser light is not reflected from the adhesive surface as in the past, so it can be directed in a certain direction. There is no possibility that the intensity of the laser beam becomes stronger in a biased manner, and the emitted laser beam is also prevented from being diffusely reflected, making it possible to obtain a semiconductor laser device with high laser beam utilization efficiency. Furthermore, since the entire lower surface of the laser element is in contact with the In adhesive, the heat distribution in the width direction of the element is uniform, and deterioration of laser characteristics can be prevented.

ちなみに、凸部5の幅Wを0.6 mm以上に形成して
マウントした場合、接着剤3表面で半導体レーザ素子2
からのレーザ光の一部が不所望の方向に反射されるとい
った不都合を生じた。
By the way, when the width W of the convex portion 5 is formed to be 0.6 mm or more and the semiconductor laser element 2 is mounted on the surface of the adhesive 3.
This resulted in the inconvenience that a portion of the laser light from the laser beam was reflected in an undesired direction.

なお、単に接着剤からの不要な反射を防ぐだけであれば
、例えば実開昭51−134377号公報に開示されて
いるような半導体レーザ素子のレーザ光出射方向におけ
る幅と同等の幅を有する凸部を放熱基台上部に形成し、
この凸部上面にレーザ素子をマウントする構成をとって
も良いが、この場合には本発明のように接着剤を上方に
凸状に盛り上げて固化した後、レーザ素子を熱圧着しよ
うとすれば素子の幅方向の両端が接着剤と接触せず浮い
た状態となり、そのため素子の幅方向に温度差が生じレ
ーザ特性を劣化させるという欠点がある。
Note that if the purpose is simply to prevent unnecessary reflection from the adhesive, a convex having a width equivalent to the width in the laser beam emission direction of a semiconductor laser element as disclosed in Japanese Utility Model Application Publication No. 51-134377, for example. part is formed on the top of the heat dissipation base,
The laser element may be mounted on the upper surface of this convex portion, but in this case, as in the present invention, if the adhesive is raised upward in a convex shape and solidified, the laser element will be bonded by thermocompression. Both ends in the width direction are not in contact with the adhesive and are in a floating state, resulting in a temperature difference in the width direction of the element, which deteriorates the laser characteristics.

以上の説明から明らかなように、本発明は要するに放熱
基台上面に半導体レーザ素子のレーザ光出射方向におけ
る幅よりわずかに広い幅を有する凸部を形成し、その凸
部上に半導体レーザ素子を接着剤で熱圧着するようにし
たもので、組み立てが容易であるとともに、レーザ光の
一部が接着剤表面で反射することもない高性能な半導体
レーザ装置を実現できる利点がある。
As is clear from the above description, the present invention basically involves forming a convex portion having a width slightly wider than the width of the semiconductor laser element in the laser beam emission direction on the upper surface of the heat dissipation base, and placing the semiconductor laser element on the convex portion. It is bonded by thermocompression using an adhesive, and has the advantage of being easy to assemble and realizing a high-performance semiconductor laser device in which no part of the laser beam is reflected on the surface of the adhesive.

本発明の方法を用いて組み立てた半導体レーザ装置を、
例えばガス分析装置の光源として用いれば光源から出射
するレーザ光の出射方向が一定な信頼度の高いガス分析
装置が実現できる。
A semiconductor laser device assembled using the method of the present invention,
For example, if used as a light source for a gas analyzer, a highly reliable gas analyzer in which the direction of laser light emitted from the light source is constant can be realized.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来の半導体レーザ装置の構造を説明するため
の模式的に示した要部断面図、第2図は本発明による半
導体レーザ装置の組立方法を説明するための模式的に示
した要部断面図である。 1:放熱基台、2:半導体レーザ素子、3:接着剤、4
:半導体レーザ素子の発光接合領域、5:放熱基台上面
に形成した凸部、A、A“5B:レーザ光、W:放熱基
台上面に形成した凸部の幅、P:半導体レーザ素子の幅
FIG. 1 is a schematic cross-sectional view of main parts for explaining the structure of a conventional semiconductor laser device, and FIG. FIG. 1: Heat dissipation base, 2: Semiconductor laser element, 3: Adhesive, 4
: Light emitting junction area of the semiconductor laser element, 5: Convex portion formed on the top surface of the heat dissipation base, A, A"5B: Laser light, W: Width of the convex portion formed on the top surface of the heat dissipation base, P: Width of the convex portion formed on the top surface of the heat dissipation base. width.

Claims (1)

【特許請求の範囲】 放熱基台(1)上に半導体レーザ素子(2)を配設して
なる半導体レーザ装置において、 前記放熱基台上面に半導体レーザ素子のレーザ光出射方
向における幅よりわずかに広い幅を有する凸部(5)を
形成し、 該凸部上に金属ろう(3)を溶融してその表面が中央部
で最も高くなるよう上方に凸な曲面とするとともに、該
凸部の淵まで該金属ろうによって専有されるように配置
した後固化し、 その後、前記放熱基台を加熱しつつ固化した金属ろう中
にレーザ素子の一部を、前記レーザ素子の活性層近傍の
レーザ光出射部分が露出するように沈めた状態で熱圧着
することを特徴とする半導体レーザ装置の組立方法。
[Scope of Claims] A semiconductor laser device comprising a semiconductor laser element (2) disposed on a heat radiation base (1), wherein a width slightly larger than the width of the semiconductor laser element in the laser beam emission direction is provided on the upper surface of the heat radiation base. A convex portion (5) having a wide width is formed, and a metal solder (3) is melted on the convex portion to form an upwardly convex curved surface so that the surface is highest at the center, and the convex portion is curved upwardly. The laser element is placed so that it is occupied by the metal solder up to the edge and then solidified, and then, while heating the heat dissipation base, a part of the laser element is placed in the solidified metal solder, and the laser beam near the active layer of the laser element is placed. A method for assembling a semiconductor laser device, characterized by thermocompression bonding in a submerged state so that an emission portion is exposed.
JP16634587A 1987-07-02 1987-07-02 Method for assemblying semiconductor laser Granted JPS6323386A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16634587A JPS6323386A (en) 1987-07-02 1987-07-02 Method for assemblying semiconductor laser

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16634587A JPS6323386A (en) 1987-07-02 1987-07-02 Method for assemblying semiconductor laser

Publications (2)

Publication Number Publication Date
JPS6323386A true JPS6323386A (en) 1988-01-30
JPH0156555B2 JPH0156555B2 (en) 1989-11-30

Family

ID=15829655

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16634587A Granted JPS6323386A (en) 1987-07-02 1987-07-02 Method for assemblying semiconductor laser

Country Status (1)

Country Link
JP (1) JPS6323386A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03108867U (en) * 1990-02-21 1991-11-08
US7781603B2 (en) 2004-09-30 2010-08-24 Toyo Boseki Kabushiki Kaisha Method for producing trimethylsilyl azide

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51134377U (en) * 1975-04-18 1976-10-29
JPS5220782A (en) * 1975-08-11 1977-02-16 Nippon Telegr & Teleph Corp <Ntt> Semi-conductor element mounting method

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51134377U (en) * 1975-04-18 1976-10-29
JPS5220782A (en) * 1975-08-11 1977-02-16 Nippon Telegr & Teleph Corp <Ntt> Semi-conductor element mounting method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03108867U (en) * 1990-02-21 1991-11-08
US7781603B2 (en) 2004-09-30 2010-08-24 Toyo Boseki Kabushiki Kaisha Method for producing trimethylsilyl azide

Also Published As

Publication number Publication date
JPH0156555B2 (en) 1989-11-30

Similar Documents

Publication Publication Date Title
JP4432275B2 (en) Light source device
TWI581450B (en) Semiconductor light emitting module and manufacturing method thereof
JP3850665B2 (en) Semiconductor light emitting emitter package
US20050230853A1 (en) Led chip mounting structure and image reader having same
US6906459B2 (en) Light emitting diode
JP2001185763A (en) Optical semiconductor package
US20090225565A1 (en) Sub-assembly and methods for forming the same
US6353202B1 (en) Apparatus and method for producing a chip-substrate connection
KR20040089459A (en) Semiconductor device using semiconductor chip
JPH11163419A (en) Light-emitting device
US20050063434A1 (en) Semiconductor laser diode having a PCB type lead frame
JP2018152465A (en) Semiconductor module
JP2003324216A (en) Light emitting diode lamp
JP2004012803A (en) Printed board unit for optical transmission, and mounting method
JP3649939B2 (en) Line light source device and manufacturing method thereof
JPH08330672A (en) Semiconductor device
JP2003046181A (en) Sub-mount, semiconductor device, and method of manufacturing sub-mount
JPS6323386A (en) Method for assemblying semiconductor laser
CN201549507U (en) LED integrated and encapsulated by multiple chips
KR100489042B1 (en) Reverse-pyramidal flip chip for high output led
WO2020031944A1 (en) Semiconductor light emission device and method for manufacturing semiconductor light emission device
JPH10190069A (en) Semiconductor light emitting device
JPS58207689A (en) Semiconductor laser apparatus
JPH0511470U (en) Heat sink for semiconductor laser
KR101841341B1 (en) Lighting source module, fabrication method therefor, and lighting device comprising the same