JPS6323320A - 縮小投影型露光装置 - Google Patents

縮小投影型露光装置

Info

Publication number
JPS6323320A
JPS6323320A JP61167585A JP16758586A JPS6323320A JP S6323320 A JPS6323320 A JP S6323320A JP 61167585 A JP61167585 A JP 61167585A JP 16758586 A JP16758586 A JP 16758586A JP S6323320 A JPS6323320 A JP S6323320A
Authority
JP
Japan
Prior art keywords
focus position
semiconductor substrate
focus
exposure
spherical aberration
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61167585A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0577285B2 (OSRAM
Inventor
Takashige Nagamatsu
永松　隆重
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Kyushu Ltd
Original Assignee
NEC Kyushu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Kyushu Ltd filed Critical NEC Kyushu Ltd
Priority to JP61167585A priority Critical patent/JPS6323320A/ja
Publication of JPS6323320A publication Critical patent/JPS6323320A/ja
Publication of JPH0577285B2 publication Critical patent/JPH0577285B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP61167585A 1986-07-16 1986-07-16 縮小投影型露光装置 Granted JPS6323320A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61167585A JPS6323320A (ja) 1986-07-16 1986-07-16 縮小投影型露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61167585A JPS6323320A (ja) 1986-07-16 1986-07-16 縮小投影型露光装置

Publications (2)

Publication Number Publication Date
JPS6323320A true JPS6323320A (ja) 1988-01-30
JPH0577285B2 JPH0577285B2 (OSRAM) 1993-10-26

Family

ID=15852481

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61167585A Granted JPS6323320A (ja) 1986-07-16 1986-07-16 縮小投影型露光装置

Country Status (1)

Country Link
JP (1) JPS6323320A (OSRAM)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008001998A (ja) * 2006-06-20 2008-01-10 Ichikawa Co Ltd 抄紙用フェルトの洗浄剤及び洗浄方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008001998A (ja) * 2006-06-20 2008-01-10 Ichikawa Co Ltd 抄紙用フェルトの洗浄剤及び洗浄方法

Also Published As

Publication number Publication date
JPH0577285B2 (OSRAM) 1993-10-26

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees