JPH0577285B2 - - Google Patents
Info
- Publication number
- JPH0577285B2 JPH0577285B2 JP61167585A JP16758586A JPH0577285B2 JP H0577285 B2 JPH0577285 B2 JP H0577285B2 JP 61167585 A JP61167585 A JP 61167585A JP 16758586 A JP16758586 A JP 16758586A JP H0577285 B2 JPH0577285 B2 JP H0577285B2
- Authority
- JP
- Japan
- Prior art keywords
- exposure
- spherical aberration
- exposure area
- semiconductor substrate
- focusing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
- G03F9/7026—Focusing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61167585A JPS6323320A (ja) | 1986-07-16 | 1986-07-16 | 縮小投影型露光装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61167585A JPS6323320A (ja) | 1986-07-16 | 1986-07-16 | 縮小投影型露光装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6323320A JPS6323320A (ja) | 1988-01-30 |
| JPH0577285B2 true JPH0577285B2 (OSRAM) | 1993-10-26 |
Family
ID=15852481
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61167585A Granted JPS6323320A (ja) | 1986-07-16 | 1986-07-16 | 縮小投影型露光装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6323320A (OSRAM) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008001998A (ja) * | 2006-06-20 | 2008-01-10 | Ichikawa Co Ltd | 抄紙用フェルトの洗浄剤及び洗浄方法 |
-
1986
- 1986-07-16 JP JP61167585A patent/JPS6323320A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6323320A (ja) | 1988-01-30 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |