JPS63213928A - 露光装置 - Google Patents

露光装置

Info

Publication number
JPS63213928A
JPS63213928A JP62046752A JP4675287A JPS63213928A JP S63213928 A JPS63213928 A JP S63213928A JP 62046752 A JP62046752 A JP 62046752A JP 4675287 A JP4675287 A JP 4675287A JP S63213928 A JPS63213928 A JP S63213928A
Authority
JP
Japan
Prior art keywords
wavelength
laser
optical system
exposure
face
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62046752A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0552051B2 (enExample
Inventor
Masato Aketagawa
正人 明田川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP62046752A priority Critical patent/JPS63213928A/ja
Publication of JPS63213928A publication Critical patent/JPS63213928A/ja
Priority to US07/550,194 priority patent/US5095190A/en
Publication of JPH0552051B2 publication Critical patent/JPH0552051B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP62046752A 1987-03-03 1987-03-03 露光装置 Granted JPS63213928A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP62046752A JPS63213928A (ja) 1987-03-03 1987-03-03 露光装置
US07/550,194 US5095190A (en) 1987-03-03 1990-07-10 Exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62046752A JPS63213928A (ja) 1987-03-03 1987-03-03 露光装置

Publications (2)

Publication Number Publication Date
JPS63213928A true JPS63213928A (ja) 1988-09-06
JPH0552051B2 JPH0552051B2 (enExample) 1993-08-04

Family

ID=12756061

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62046752A Granted JPS63213928A (ja) 1987-03-03 1987-03-03 露光装置

Country Status (1)

Country Link
JP (1) JPS63213928A (enExample)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6410624A (en) * 1987-07-02 1989-01-13 Nikon Corp Projection optical device
JPH0194617A (ja) * 1987-10-06 1989-04-13 Hitachi Ltd 半導体露光装置
US4905041A (en) * 1987-10-19 1990-02-27 Canon Kabushiki Kaisha Exposure apparatus
JPH06224107A (ja) * 1993-01-27 1994-08-12 Nec Corp 投影露光方法および装置
KR100630703B1 (ko) 2004-10-15 2006-10-02 삼성전자주식회사 레이저빔의 파장 제어 시스템 및 그 제어방법
WO2022064594A1 (ja) * 2020-09-24 2022-03-31 ギガフォトン株式会社 電子デバイスの製造方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60214334A (ja) * 1984-04-11 1985-10-26 Canon Inc 投影露光装置及び投影露光方法
JPS60214335A (ja) * 1984-04-11 1985-10-26 Canon Inc 投影露光装置及び投影露光方法
JPS61181128A (ja) * 1985-02-06 1986-08-13 Canon Inc 投影露光装置及び投影露光方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60214334A (ja) * 1984-04-11 1985-10-26 Canon Inc 投影露光装置及び投影露光方法
JPS60214335A (ja) * 1984-04-11 1985-10-26 Canon Inc 投影露光装置及び投影露光方法
JPS61181128A (ja) * 1985-02-06 1986-08-13 Canon Inc 投影露光装置及び投影露光方法

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6410624A (en) * 1987-07-02 1989-01-13 Nikon Corp Projection optical device
JPH0194617A (ja) * 1987-10-06 1989-04-13 Hitachi Ltd 半導体露光装置
US4905041A (en) * 1987-10-19 1990-02-27 Canon Kabushiki Kaisha Exposure apparatus
JPH06224107A (ja) * 1993-01-27 1994-08-12 Nec Corp 投影露光方法および装置
KR100630703B1 (ko) 2004-10-15 2006-10-02 삼성전자주식회사 레이저빔의 파장 제어 시스템 및 그 제어방법
WO2022064594A1 (ja) * 2020-09-24 2022-03-31 ギガフォトン株式会社 電子デバイスの製造方法
US12406889B2 (en) 2020-09-24 2025-09-02 Gigaphoton Inc. Electronic device manufacturing method

Also Published As

Publication number Publication date
JPH0552051B2 (enExample) 1993-08-04

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