JPS6410624A - Projection optical device - Google Patents

Projection optical device

Info

Publication number
JPS6410624A
JPS6410624A JP62166014A JP16601487A JPS6410624A JP S6410624 A JPS6410624 A JP S6410624A JP 62166014 A JP62166014 A JP 62166014A JP 16601487 A JP16601487 A JP 16601487A JP S6410624 A JPS6410624 A JP S6410624A
Authority
JP
Japan
Prior art keywords
variation
focal point
correction
amount
magnification
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62166014A
Other languages
Japanese (ja)
Other versions
JP2590891B2 (en
Inventor
Tetsuo Taniguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP62166014A priority Critical patent/JP2590891B2/en
Publication of JPS6410624A publication Critical patent/JPS6410624A/en
Application granted granted Critical
Publication of JP2590891B2 publication Critical patent/JP2590891B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system

Landscapes

  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lasers (AREA)

Abstract

PURPOSE:To prevent an image-forming characteristic from being influenced by a variation in a wavelength by a method wherein the variation in the image-forming characteristic due to the variation in the wavelength of a light source is calculated and corrected by using a correction mechanism; in addition, to simply realize this device in a device equipped with the correction mechanism without a large-scale modification. CONSTITUTION:A controller 9 calculated an amount of variation in a wavelength of a laser beam passing through a projection lens 6 on the basis of a measured signal (the environmental information) from a measuring instrument 10; it calculates an amount of correction (an amount of variation) of a magnification and a position of a focal point on the basis of a rate of change stored in a memory. If the amount of correction against a change in the magnification is calculated, the controller 9 outputs a correction value (a target pressure value) to a pressure adjuster 11. The pressure adjuster 11 controls a pressure inside an air chamber 12 in such a way that a differential pressure cancelling the change in the magnification is generated. On the other hand, regarding the correction of the position of the focal point an amount of variation of the focal point is calculated by the controller 9 in the same manner; an offset signal by which the surface of a wafer W follows this variation in the focal point is output to a photodetector 14. By this setup, it is possible to correct the variation in an image-forming characteristic (the magnification; the position of the focal point) against the variation of a wavelength.
JP62166014A 1987-07-02 1987-07-02 Projection optical device Expired - Fee Related JP2590891B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62166014A JP2590891B2 (en) 1987-07-02 1987-07-02 Projection optical device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62166014A JP2590891B2 (en) 1987-07-02 1987-07-02 Projection optical device

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP8205566A Division JP2705694B2 (en) 1996-08-05 1996-08-05 Projection optical device

Publications (2)

Publication Number Publication Date
JPS6410624A true JPS6410624A (en) 1989-01-13
JP2590891B2 JP2590891B2 (en) 1997-03-12

Family

ID=15823305

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62166014A Expired - Fee Related JP2590891B2 (en) 1987-07-02 1987-07-02 Projection optical device

Country Status (1)

Country Link
JP (1) JP2590891B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0194617A (en) * 1987-10-06 1989-04-13 Hitachi Ltd Semiconductor exposure device
JPH06224107A (en) * 1993-01-27 1994-08-12 Nec Corp Method and device for projection aligner
CN114441142A (en) * 2021-12-30 2022-05-06 歌尔光学科技有限公司 Method and device for acquiring correction parameters of AR imaging system

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60214335A (en) * 1984-04-11 1985-10-26 Canon Inc Projection type exposing device
JPS60214334A (en) * 1984-04-11 1985-10-26 Canon Inc Projection type exposing device
JPS61181128A (en) * 1985-02-06 1986-08-13 Canon Inc Projection exposure apparatus
JPS63213928A (en) * 1987-03-03 1988-09-06 Canon Inc Exposure system

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60214335A (en) * 1984-04-11 1985-10-26 Canon Inc Projection type exposing device
JPS60214334A (en) * 1984-04-11 1985-10-26 Canon Inc Projection type exposing device
JPS61181128A (en) * 1985-02-06 1986-08-13 Canon Inc Projection exposure apparatus
JPS63213928A (en) * 1987-03-03 1988-09-06 Canon Inc Exposure system

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0194617A (en) * 1987-10-06 1989-04-13 Hitachi Ltd Semiconductor exposure device
JPH06224107A (en) * 1993-01-27 1994-08-12 Nec Corp Method and device for projection aligner
CN114441142A (en) * 2021-12-30 2022-05-06 歌尔光学科技有限公司 Method and device for acquiring correction parameters of AR imaging system

Also Published As

Publication number Publication date
JP2590891B2 (en) 1997-03-12

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees