JPS63211631A - プラズマ処理装置 - Google Patents

プラズマ処理装置

Info

Publication number
JPS63211631A
JPS63211631A JP1709388A JP1709388A JPS63211631A JP S63211631 A JPS63211631 A JP S63211631A JP 1709388 A JP1709388 A JP 1709388A JP 1709388 A JP1709388 A JP 1709388A JP S63211631 A JPS63211631 A JP S63211631A
Authority
JP
Japan
Prior art keywords
substrate
plasma
potential
ions
energy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1709388A
Other languages
English (en)
Japanese (ja)
Other versions
JPH033381B2 (enrdf_load_stackoverflow
Inventor
Takashi Tsuchimoto
槌本　尚
Yoshimichi Hirobe
広部　嘉道
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP1709388A priority Critical patent/JPS63211631A/ja
Publication of JPS63211631A publication Critical patent/JPS63211631A/ja
Publication of JPH033381B2 publication Critical patent/JPH033381B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP1709388A 1988-01-29 1988-01-29 プラズマ処理装置 Granted JPS63211631A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1709388A JPS63211631A (ja) 1988-01-29 1988-01-29 プラズマ処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1709388A JPS63211631A (ja) 1988-01-29 1988-01-29 プラズマ処理装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP10916179A Division JPS5633839A (en) 1979-08-29 1979-08-29 Plasma treatment and device therefor

Publications (2)

Publication Number Publication Date
JPS63211631A true JPS63211631A (ja) 1988-09-02
JPH033381B2 JPH033381B2 (enrdf_load_stackoverflow) 1991-01-18

Family

ID=11934376

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1709388A Granted JPS63211631A (ja) 1988-01-29 1988-01-29 プラズマ処理装置

Country Status (1)

Country Link
JP (1) JPS63211631A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006274390A (ja) * 2005-03-30 2006-10-12 Yamaguchi Prefecture ＳｉＮｘＯｙＣｚ膜及び薄膜の成膜方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006274390A (ja) * 2005-03-30 2006-10-12 Yamaguchi Prefecture ＳｉＮｘＯｙＣｚ膜及び薄膜の成膜方法

Also Published As

Publication number Publication date
JPH033381B2 (enrdf_load_stackoverflow) 1991-01-18

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