JPS6320910B2 - - Google Patents
Info
- Publication number
- JPS6320910B2 JPS6320910B2 JP59122418A JP12241884A JPS6320910B2 JP S6320910 B2 JPS6320910 B2 JP S6320910B2 JP 59122418 A JP59122418 A JP 59122418A JP 12241884 A JP12241884 A JP 12241884A JP S6320910 B2 JPS6320910 B2 JP S6320910B2
- Authority
- JP
- Japan
- Prior art keywords
- container
- taper
- side wall
- evaporation
- evaporation source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59122418A JPS6017071A (ja) | 1984-06-14 | 1984-06-14 | 蒸発源用容器 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59122418A JPS6017071A (ja) | 1984-06-14 | 1984-06-14 | 蒸発源用容器 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6017071A JPS6017071A (ja) | 1985-01-28 |
| JPS6320910B2 true JPS6320910B2 (cs) | 1988-05-02 |
Family
ID=14835332
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59122418A Granted JPS6017071A (ja) | 1984-06-14 | 1984-06-14 | 蒸発源用容器 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6017071A (cs) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN209619438U (zh) * | 2019-01-17 | 2019-11-12 | 云谷(固安)科技有限公司 | 一种点蒸发源以及蒸镀设备 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5333873B2 (cs) * | 1973-03-16 | 1978-09-18 | ||
| JPS51151684A (en) * | 1975-06-23 | 1976-12-27 | Fuji Xerox Co Ltd | Evaporating source for vacuum evaporation |
-
1984
- 1984-06-14 JP JP59122418A patent/JPS6017071A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6017071A (ja) | 1985-01-28 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS6320910B2 (cs) | ||
| JPH0149786B2 (cs) | ||
| JPS6237369A (ja) | スパツタリングタ−ゲツト材 | |
| JPH0551969B2 (cs) | ||
| JPH0562186A (ja) | 磁気記録媒体の製造方法 | |
| JPH0319617B2 (cs) | ||
| JPS59141210A (ja) | 真空蒸着装置 | |
| JPH02282479A (ja) | 磁気記録媒体の製造装置 | |
| JPH0550046B2 (cs) | ||
| JP2548239B2 (ja) | 磁気記録媒体の製造方法 | |
| JPS5845375A (ja) | 蒸着による薄膜形成方法 | |
| JP3038084B2 (ja) | 軟磁性薄膜の形成方法 | |
| JPS59116374A (ja) | 蒸着装置 | |
| JPS60155670A (ja) | ハ−ス構造 | |
| JPH04328324A (ja) | 磁気記録媒体の製造方法 | |
| JPH01118219A (ja) | 磁気記録媒体の製造方法 | |
| JPS59141209A (ja) | 真空蒸着装置 | |
| JPH0888137A (ja) | 蒸着薄膜の製造方法および製造装置 | |
| JPH01227223A (ja) | 磁気記録媒体の製造方法 | |
| JPH10312536A (ja) | 磁気記録媒体の製造装置及び同装置用るつぼ | |
| JPS56148738A (en) | Production of magnetic recording medium | |
| JPH0679369B2 (ja) | 磁気記録材料およびその製造方法 | |
| JPS58118034A (ja) | 磁気記録媒体の製造方法 | |
| JPH0418373B2 (cs) | ||
| JPS63184927A (ja) | 磁気記録媒体の製造方法 |