JPS6320833B2 - - Google Patents
Info
- Publication number
- JPS6320833B2 JPS6320833B2 JP59209565A JP20956584A JPS6320833B2 JP S6320833 B2 JPS6320833 B2 JP S6320833B2 JP 59209565 A JP59209565 A JP 59209565A JP 20956584 A JP20956584 A JP 20956584A JP S6320833 B2 JPS6320833 B2 JP S6320833B2
- Authority
- JP
- Japan
- Prior art keywords
- acetone
- hexamethyldisiloxane
- dichloroethane
- azeotrope
- distillation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 110
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 claims description 39
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 claims description 27
- 238000000034 method Methods 0.000 claims description 12
- 239000011259 mixed solution Substances 0.000 claims description 10
- 239000000203 mixture Substances 0.000 description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- 238000004821 distillation Methods 0.000 description 9
- 239000007864 aqueous solution Substances 0.000 description 6
- 238000011084 recovery Methods 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 4
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000002955 isolation Methods 0.000 description 2
- 238000006884 silylation reaction Methods 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000005051 trimethylchlorosilane Substances 0.000 description 2
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 238000003811 acetone extraction Methods 0.000 description 1
- 239000008346 aqueous phase Substances 0.000 description 1
- 238000010533 azeotropic distillation Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000000895 extractive distillation Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005191 phase separation Methods 0.000 description 1
- GKABRLDKBUEEFF-UHFFFAOYSA-N propan-2-one;trimethyl(trimethylsilyloxy)silane Chemical compound CC(C)=O.C[Si](C)(C)O[Si](C)(C)C GKABRLDKBUEEFF-UHFFFAOYSA-N 0.000 description 1
- 125000006239 protecting group Chemical group 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 230000009897 systematic effect Effects 0.000 description 1
Landscapes
- Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59209565A JPS6187686A (ja) | 1984-10-05 | 1984-10-05 | ヘキサメチルジシロキサンの分離回収方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59209565A JPS6187686A (ja) | 1984-10-05 | 1984-10-05 | ヘキサメチルジシロキサンの分離回収方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6187686A JPS6187686A (ja) | 1986-05-06 |
| JPS6320833B2 true JPS6320833B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1988-04-30 |
Family
ID=16574933
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59209565A Granted JPS6187686A (ja) | 1984-10-05 | 1984-10-05 | ヘキサメチルジシロキサンの分離回収方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6187686A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2580029B2 (ja) * | 1989-03-20 | 1997-02-12 | ファナック株式会社 | 溶接ロボットにおけるピッチ可変型スポット溶接ガン装置 |
-
1984
- 1984-10-05 JP JP59209565A patent/JPS6187686A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6187686A (ja) | 1986-05-06 |
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