JPS63206494A - シアン化合物を含まない光沢銅−亜鉛−錫合金電気めつき浴 - Google Patents

シアン化合物を含まない光沢銅−亜鉛−錫合金電気めつき浴

Info

Publication number
JPS63206494A
JPS63206494A JP3859487A JP3859487A JPS63206494A JP S63206494 A JPS63206494 A JP S63206494A JP 3859487 A JP3859487 A JP 3859487A JP 3859487 A JP3859487 A JP 3859487A JP S63206494 A JPS63206494 A JP S63206494A
Authority
JP
Japan
Prior art keywords
salt
zinc
bath
copper
salts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3859487A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0321637B2 (enrdf_load_stackoverflow
Inventor
Yutaka Fujiwara
裕 藤原
Hidehiko Enomoto
榎本 英彦
Yoshiji Shimizu
清水 芳次
Masa Mori
雅 森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimizu Co Ltd
Original Assignee
Shimizu Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimizu Co Ltd filed Critical Shimizu Co Ltd
Priority to JP3859487A priority Critical patent/JPS63206494A/ja
Publication of JPS63206494A publication Critical patent/JPS63206494A/ja
Publication of JPH0321637B2 publication Critical patent/JPH0321637B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/56Electroplating: Baths therefor from solutions of alloys
    • C25D3/58Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of copper

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
JP3859487A 1987-02-20 1987-02-20 シアン化合物を含まない光沢銅−亜鉛−錫合金電気めつき浴 Granted JPS63206494A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3859487A JPS63206494A (ja) 1987-02-20 1987-02-20 シアン化合物を含まない光沢銅−亜鉛−錫合金電気めつき浴

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3859487A JPS63206494A (ja) 1987-02-20 1987-02-20 シアン化合物を含まない光沢銅−亜鉛−錫合金電気めつき浴

Publications (2)

Publication Number Publication Date
JPS63206494A true JPS63206494A (ja) 1988-08-25
JPH0321637B2 JPH0321637B2 (enrdf_load_stackoverflow) 1991-03-25

Family

ID=12529621

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3859487A Granted JPS63206494A (ja) 1987-02-20 1987-02-20 シアン化合物を含まない光沢銅−亜鉛−錫合金電気めつき浴

Country Status (1)

Country Link
JP (1) JPS63206494A (enrdf_load_stackoverflow)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005537394A (ja) * 2002-10-11 2005-12-08 エンソーン インコーポレイテッド ブロンズ電析法
WO2007134843A3 (en) * 2006-05-24 2008-11-27 Atotech Deutschland Gmbh Metal plating composition and method for the deposition of copper-zinc-tin suitable for manufacturing thin film solar cell
JP2010053444A (ja) * 2008-07-30 2010-03-11 Bridgestone Corp 銅−亜鉛合金電気めっき浴およびスチールコード用ワイヤ
JP2011174100A (ja) * 2010-02-23 2011-09-08 Osaka Municipal Technical Research Institute 銅−亜鉛合金電気めっき液
WO2013129484A1 (ja) * 2012-02-29 2013-09-06 Ikeda Shigeru 混合結晶、混合結晶製造方法、太陽電池、太陽電池製造方法及び電析浴
CN104975315A (zh) * 2014-04-10 2015-10-14 苏州瑞可达连接系统股份有限公司 一种新型复合电镀方法
CN108486623A (zh) * 2018-03-09 2018-09-04 湘潭大学 一种分步脉冲电沉积后退火制备铜锌锡硫太阳能电池薄膜材料的方法

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005537394A (ja) * 2002-10-11 2005-12-08 エンソーン インコーポレイテッド ブロンズ電析法
WO2007134843A3 (en) * 2006-05-24 2008-11-27 Atotech Deutschland Gmbh Metal plating composition and method for the deposition of copper-zinc-tin suitable for manufacturing thin film solar cell
EP2037006A2 (en) 2006-05-24 2009-03-18 Atotech Deutschland Gmbh Metal plating composition and method for the deposition of Copper-Zinc-Tin suitable for manufacturing thin film solar cell
EP2037006A3 (en) * 2006-05-24 2009-08-05 Atotech Deutschland Gmbh Metal plating composition and method for the deposition of Copper-Zinc-Tin suitable for manufacturing thin film solar cell
JP2009537997A (ja) * 2006-05-24 2009-10-29 アトーテヒ ドイッチュラント ゲゼルシャフト ミット ベシュレンクテル ハフツング 薄膜太陽電池を製造するのに適した銅−亜鉛−錫析出のための金属メッキ組成及び方法
EP2336394A2 (en) 2006-05-24 2011-06-22 ATOTECH Deutschland GmbH Metal plating composition and method for the deposition of copper-zinc-tin suitable for manufacturing thin film solar cell
US9263609B2 (en) 2006-05-24 2016-02-16 Atotech Deutschland Gmbh Metal plating composition and method for the deposition of copper—zinc—tin suitable for manufacturing thin film solar cell
JP2010053444A (ja) * 2008-07-30 2010-03-11 Bridgestone Corp 銅−亜鉛合金電気めっき浴およびスチールコード用ワイヤ
JP2011174100A (ja) * 2010-02-23 2011-09-08 Osaka Municipal Technical Research Institute 銅−亜鉛合金電気めっき液
WO2013129484A1 (ja) * 2012-02-29 2013-09-06 Ikeda Shigeru 混合結晶、混合結晶製造方法、太陽電池、太陽電池製造方法及び電析浴
CN104975315A (zh) * 2014-04-10 2015-10-14 苏州瑞可达连接系统股份有限公司 一种新型复合电镀方法
CN108486623A (zh) * 2018-03-09 2018-09-04 湘潭大学 一种分步脉冲电沉积后退火制备铜锌锡硫太阳能电池薄膜材料的方法

Also Published As

Publication number Publication date
JPH0321637B2 (enrdf_load_stackoverflow) 1991-03-25

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