JPS632041B2 - - Google Patents
Info
- Publication number
- JPS632041B2 JPS632041B2 JP55075778A JP7577880A JPS632041B2 JP S632041 B2 JPS632041 B2 JP S632041B2 JP 55075778 A JP55075778 A JP 55075778A JP 7577880 A JP7577880 A JP 7577880A JP S632041 B2 JPS632041 B2 JP S632041B2
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- inspected
- fourier transform
- defect
- unit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7577880A JPS572522A (en) | 1980-06-05 | 1980-06-05 | Defect inspecting device for regular pattern |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7577880A JPS572522A (en) | 1980-06-05 | 1980-06-05 | Defect inspecting device for regular pattern |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS572522A JPS572522A (en) | 1982-01-07 |
| JPS632041B2 true JPS632041B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1988-01-16 |
Family
ID=13586007
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7577880A Granted JPS572522A (en) | 1980-06-05 | 1980-06-05 | Defect inspecting device for regular pattern |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS572522A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62220239A (ja) * | 1986-03-20 | 1987-09-28 | Hitachi Metals Ltd | アプセツト加工用アンビル |
| JPH02122061A (ja) * | 1988-10-28 | 1990-05-09 | Hitachi Koki Co Ltd | 浸炭焼入れを施した金属材料 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5191737A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1975-02-10 | 1976-08-11 | ||
| JPS54105967A (en) * | 1978-02-08 | 1979-08-20 | Toshiba Corp | Defect test system for pattern featuring directivity |
-
1980
- 1980-06-05 JP JP7577880A patent/JPS572522A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS572522A (en) | 1982-01-07 |