JPS57113342A - Eccentricity measurement - Google Patents
Eccentricity measurementInfo
- Publication number
- JPS57113342A JPS57113342A JP18836180A JP18836180A JPS57113342A JP S57113342 A JPS57113342 A JP S57113342A JP 18836180 A JP18836180 A JP 18836180A JP 18836180 A JP18836180 A JP 18836180A JP S57113342 A JPS57113342 A JP S57113342A
- Authority
- JP
- Japan
- Prior art keywords
- lenses
- image pickup
- pickup element
- reflected
- lens
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
- G01B11/27—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes for testing the alignment of axes
- G01B11/272—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes for testing the alignment of axes using photoelectric detection means
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
Abstract
PURPOSE:To enable the inspection of the eccentricity level of lenses and the alignment accuracy of each lens surface in the lens array optical system by detecting the intensity distribution of a laser beam reflected from the surface thereof after projected thereon. CONSTITUTION:A laser beam from a laser oscillator 1 is focused with a condenser lens 2 and made a parallel flux with a beam diameter of the same size as the size of the surface of the lenses 7 with a beam expander 3. After changed in the direction with a plane mirror 4, the beam is irradiated on lenses 7 to be inspected on a base 6 through a half mirror 5. The flux reflected and condensed on the surface of the lenses 7 is reflected and enters an image pickup element 8 with a half mirror 5. Signals indicating the intensity corresponding to the quantity of beam which enters individual photoelement as picture elements composing the image pickup element 8 are outputted to determine the eccentricity of the lenses by computing the output in a signal processing circuit. The assembly of the lenses is moved according to an alignment pitch and the quantity of beam entering the image pickup element is integrated thereby measuring the alignment accuracy of the lens assembly.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18836180A JPS57113342A (en) | 1980-12-29 | 1980-12-29 | Eccentricity measurement |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18836180A JPS57113342A (en) | 1980-12-29 | 1980-12-29 | Eccentricity measurement |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57113342A true JPS57113342A (en) | 1982-07-14 |
Family
ID=16222271
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18836180A Pending JPS57113342A (en) | 1980-12-29 | 1980-12-29 | Eccentricity measurement |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57113342A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5844670A (en) * | 1995-07-28 | 1998-12-01 | Ricoh Co., Ltd. | Method of and systems for measuring eccentricity of an aspherical lens surface |
WO2011129068A1 (en) * | 2010-04-13 | 2011-10-20 | コニカミノルタオプト株式会社 | Eccentric amount measuring method |
CN103278106A (en) * | 2013-05-16 | 2013-09-04 | 中国科学院高能物理研究所 | High-accuracy high-spatial resolution long range profile detection system |
-
1980
- 1980-12-29 JP JP18836180A patent/JPS57113342A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5844670A (en) * | 1995-07-28 | 1998-12-01 | Ricoh Co., Ltd. | Method of and systems for measuring eccentricity of an aspherical lens surface |
WO2011129068A1 (en) * | 2010-04-13 | 2011-10-20 | コニカミノルタオプト株式会社 | Eccentric amount measuring method |
US8665425B2 (en) | 2010-04-13 | 2014-03-04 | Konica Minolta Advanced Layers, Inc. | Eccentricity measuring method |
JP5582188B2 (en) * | 2010-04-13 | 2014-09-03 | コニカミノルタ株式会社 | Eccentricity measurement method |
CN103278106A (en) * | 2013-05-16 | 2013-09-04 | 中国科学院高能物理研究所 | High-accuracy high-spatial resolution long range profile detection system |
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