JPS6320013B2 - - Google Patents

Info

Publication number
JPS6320013B2
JPS6320013B2 JP7677283A JP7677283A JPS6320013B2 JP S6320013 B2 JPS6320013 B2 JP S6320013B2 JP 7677283 A JP7677283 A JP 7677283A JP 7677283 A JP7677283 A JP 7677283A JP S6320013 B2 JPS6320013 B2 JP S6320013B2
Authority
JP
Japan
Prior art keywords
mark
pattern
photomask
substrate
photoresist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP7677283A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59202632A (ja
Inventor
Takayuki Konuma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Corporate Research and Development Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Corporate Research and Development Ltd filed Critical Fuji Electric Corporate Research and Development Ltd
Priority to JP58076772A priority Critical patent/JPS59202632A/ja
Publication of JPS59202632A publication Critical patent/JPS59202632A/ja
Publication of JPS6320013B2 publication Critical patent/JPS6320013B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P95/00—

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP58076772A 1983-04-30 1983-04-30 フオトマスク Granted JPS59202632A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58076772A JPS59202632A (ja) 1983-04-30 1983-04-30 フオトマスク

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58076772A JPS59202632A (ja) 1983-04-30 1983-04-30 フオトマスク

Publications (2)

Publication Number Publication Date
JPS59202632A JPS59202632A (ja) 1984-11-16
JPS6320013B2 true JPS6320013B2 (enExample) 1988-04-26

Family

ID=13614872

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58076772A Granted JPS59202632A (ja) 1983-04-30 1983-04-30 フオトマスク

Country Status (1)

Country Link
JP (1) JPS59202632A (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4902899A (en) * 1987-06-01 1990-02-20 International Business Machines Corporation Lithographic process having improved image quality
JP2855868B2 (ja) * 1990-03-12 1999-02-10 富士通株式会社 レーザトリミング用位置合わせマーク、半導体装置及び半導体装置の製造方法

Also Published As

Publication number Publication date
JPS59202632A (ja) 1984-11-16

Similar Documents

Publication Publication Date Title
KR101140027B1 (ko) 위상 시프트 마스크의 제조방법
US5300379A (en) Method of fabrication of inverted phase-shifted reticle
JP3257593B2 (ja) 半導体装置の製造方法
KR20020072533A (ko) 하부 해상도 정렬 마크 윈도우를 구비하는 사진 식각 마스크
US6027859A (en) Semiconductor substrate having extended scribe line test structure and method of fabrication thereof
JPS6320013B2 (enExample)
JP4876357B2 (ja) 文字記号部を有する基板とその文字記号部の加工方法
US6830702B2 (en) Single trench alternating phase shift mask fabrication
JPH0276214A (ja) ホトリソグラフィー工程におけるガラスマスク
JPH06252031A (ja) 露光装置及び露光方法
JP3120345B2 (ja) 位相シフトマスク及び半導体装置
CN111856888A (zh) 一种增强密集图形光刻分辨率的方法
US20040105961A1 (en) Intra-cell mask alignment for improved overlay
JP2908649B2 (ja) 位相シフトマスクおよびその製造方法
JPS6223862B2 (enExample)
JPS60194457A (ja) ホトマスク
KR0151228B1 (ko) 고립된 다수의 패턴을 형성하기 위한 포토마스크
JPH0355815B2 (enExample)
KR100216675B1 (ko) 사진식각 공정시의 바이어스 점검 방법
KR100299520B1 (ko) 반도체 소자의 레티클 및 이를 이용한 마스크 공정
KR20000006852A (ko) 쉐도우 마스크를 이용한 웨이퍼상에 금속 패턴을 형성하는방법
JPS61270823A (ja) 半導体装置の製造方法
JP3507996B2 (ja) 一対のフォトマスクおよびそれを用いた透明基板の表裏面加工方法
KR20040006323A (ko) 레티클 제작 방법
JPH0193127A (ja) 半導体装置の製造方法